Shimazu; Tadashi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shimazu; Tadashi.The latest application filed is for "plasma processing method and plasma processing system".

Company Profile

0.11.14

Shimazu; Tadashi - Kobe JP
Shimazu; Tadashi - Tokyo JP
Shimazu; Tadashi - Takasago N/A JP
Shimazu; Tadashi - Kobe-shi JP
Shimazu; Tadashi - Minato-ku JP
Shimazu; Tadashi - Hyogo JP
Shimazu; Tadashi - Takasago-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma processing apparatus and plasma processing method Grant 9,011,634 - Matsuda , et al. April 21, 2	2015-04-21
Method and apparatus for producing silicon nitride film Grant 8,889,568 - Nishikawa , et al. November 18, 2	2014-11-18
Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition method Grant 8,662,010 - Matsuda , et al. March 4, 2	2014-03-04
Plasma Processing Method And Plasma Processing System App 20140057459 - Shimazu; Tadashi ; et al.	2014-02-27
Plasma processing apparatus and plasma processing method Grant 8,480,912 - Matsuda , et al. July 9, 2	2013-07-09
Method And Apparatus For Producing Silicon Nitride Film App 20130109154 - Nishikawa; Seiji ; et al.	2013-05-02
Plasma Processing Apparatus And Plasma Processing Method App 20130025790 - Matsuda; Ryuichi ; et al.	2013-01-31
Seasoning method for film-forming apparatus Grant 8,337,960 - Shimazu , et al. December 25, 2	2012-12-25
Insulating film for semiconductor device, process and apparatus for producing insulating film for semiconductor device, semiconductor device, and process for producing the semiconductor device Grant 8,288,294 - Kafuku , et al. October 16, 2	2012-10-16
Insulating Film For Semiconductor Device, Process And Apparatus For Producing Insulating Film For Semiconductor Device, Semiconductor Device, And Process For Producing The Semiconductor Device App 20110266660 - Kafuku; Hidetaka ; et al.	2011-11-03
Plasma treatment method and plasma treatment device Grant 7,972,946 - Shimazu , et al. July 5, 2	2011-07-05
Plasma Processing Method And Plasma Processing System App 20100310791 - Shimazu; Tadashi ; et al.	2010-12-09
Plasma Film Forming Apparatus App 20100236482 - Kafuku; Hidetaka ; et al.	2010-09-23
Seasoning Method For Film-forming Apparatus App 20090242511 - Shimazu; Tadashi ; et al.	2009-10-01
Plasma Treatment Method And Plasma Treatment Device App 20090176380 - Shimazu; Tadashi ; et al.	2009-07-09
Plasma Processing Apparatus And Plasma Processing Method App 20090127227 - Matsuda; Ryuichi ; et al.	2009-05-21
Plasma CVD apparatus Grant 7,314,525 - Shimazu , et al. January 1, 2	2008-01-01
Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition method App 20070224364 - Matsuda; Ryuichi ; et al.	2007-09-27
Plasma processing apparatus App 20070107843 - Kawano; Yuichi ; et al.	2007-05-17
Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method App 20050202183 - Matsuda, Ryuichi ; et al.	2005-09-15
Plasma CVD apparatus App 20030145788 - Shimazu, Tadashi ; et al.	2003-08-07

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