Shimatani; Satoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shimatani; Satoshi.The latest application filed is for "composition for nanoimprint, cured product, pattern forming method, and article having pattern".

Company Profile

0.11.13

Shimatani; Satoshi - Tokyo JP
Shimatani; Satoshi - Kanagawa JP
Shimatani; Satoshi - Kawasaki JP
SHIMATANI; Satoshi - Kawasaki-shi Kanagawa
Shimatani; Satoshi - Yokohama JP
Shimatani, Satoshi - Yokohama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition for nanoimprint, cured product, pattern forming method, and article having pattern Grant 10,678,129 - Shimatani	2020-06-09
Semiconductor light emitting element and method for producing the same Grant 9,929,311 - Kashima , et al. March 27, 2	2018-03-27
Deep ultraviolet LED and method for manufacturing the same Grant 9,929,317 - Kashima , et al. March 27, 2	2018-03-27
Deep ultraviolet LED and method for manufacturing the same Grant 9,806,229 - Kashima , et al. October 31, 2	2017-10-31
Composition For Nanoimprint, Cured Product, Pattern Forming Method, And Article Having Pattern App 20160363858 - SHIMATANI; Satoshi	2016-12-15
Deep Ultraviolet Led And Method For Manufacturing The Same App 20160133785 - KASHIMA; Yukio ; et al.	2016-05-12
Semiconductor Light Emitting Element And Method For Producing The Same App 20160042102 - KASHIMA; Yukio ; et al.	2016-02-11
Chemically amplified positive photo resist composition and method for forming resist pattern Grant 7,358,028 - Maruyama , et al. April 15, 2	2008-04-15
Chemical amplified positive photo resist composition and method for forming resist pattern Grant 7,329,478 - Nakagawa , et al. February 12, 2	2008-02-12
Chemical Amplification Type Positive Photoresist Composition And Resist Pattern Forming Method App 20070117045 - Maruyama; Kenji ; et al.	2007-05-24
Positive resist composition and method of forming resist pattern using same Grant 7,192,687 - Nitta , et al. March 20, 2	2007-03-20
Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device Grant 7,150,956 - Nitta , et al. December 19, 2	2006-12-19
Chemical amplified positive photo resist composition and method for forming resist pattern App 20060003260 - Nakagawa; Yusuke ; et al.	2006-01-05
Chemically amplified positive photo resist composition and method for forming resist pattern App 20050244740 - Maruyama, Kenji ; et al.	2005-11-03
Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device Grant 6,921,621 - Nitta , et al. July 26, 2	2005-07-26
Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device App 20050112498 - Nitta, Kazuyuki ; et al.	2005-05-26
Positive resist composition and method of forming resist pattern using same App 20050079445 - Nitta, Kazuyuki ; et al.	2005-04-14
Method for forming fine resist pattern App 20050037291 - Nitta, Kazuyuki ; et al.	2005-02-17
Positive-working photoresist composition and resist patterning method using same Grant 6,787,290 - Nitta , et al. September 7, 2	2004-09-07
Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device App 20030190550 - Nitta, Kazuyuki ; et al.	2003-10-09
Positive photoresist composition and process for synthesizing polyphenol compound Grant 6,620,978 - Shimatani , et al. September 16, 2	2003-09-16
Positive photoresist composition and process for synthesizing polyphenol compound App 20030054283 - Shimatani, Satoshi ; et al.	2003-03-20
Method for forming a hole-patterned photoresist layer App 20020106580 - Nitta, Kazuyuki ; et al.	2002-08-08
Positive-working photoresist composition and resist patterning method using same App 20020045130 - Nitta, Kazuyuki ; et al.	2002-04-18

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