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Patent applications and USPTO patent grants for Shimane; Yoshimitsu.The latest application filed is for "method for manufacturing magnetoresistive element".
Patent | Date |
---|---|
Reactive sputtering apparatus Grant 9,905,401 - Yamaguchi , et al. February 27, 2 | 2018-02-27 |
Oxidation process apparatus, oxidation method, and method for manufacturing electronic device Grant 9,905,441 - Shimane , et al. February 27, 2 | 2018-02-27 |
Method for manufacturing magnetoresistive element Grant 9,865,805 - Seino , et al. January 9, 2 | 2018-01-09 |
Substrate processing apparatus Grant 9,779,921 - Shimane , et al. October 3, 2 | 2017-10-03 |
Method For Manufacturing Magnetoresistive Element App 20160005958 - Seino; Takuya ;   et al. | 2016-01-07 |
Oxidation Process Apparatus, Oxidation Method, And Method For Manufacturing Electronic Device App 20150318466 - Shimane; Yoshimitsu ;   et al. | 2015-11-05 |
Substrate Processing Apparatus App 20150294845 - SHIMANE; Yoshimitsu ;   et al. | 2015-10-15 |
Reactive Sputtering Apparatus App 20150206714 - YAMAGUCHI; NOBUO ;   et al. | 2015-07-23 |
Reactive sputtering apparatus Grant 9,034,152 - Yamaguchi , et al. May 19, 2 | 2015-05-19 |
Reactive Sputtering Apparatus App 20120152736 - Yamaguchi; Nobuo ;   et al. | 2012-06-21 |
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