SHIH; Ding-Kang
Patent Applications and Registrations
Patent applications and USPTO patent grants for SHIH; Ding-Kang.The latest application filed is for "epitaxial structure for source/drain contact".
Company Profile
14.22.28
- SHIH; Ding-Kang - New Taipei City TW
- Shih; Ding-Kang - New Taipei TW
- Shih; Ding-Kang - Kaohsiung TW
Patent Activity
| Patent | Date |
|---|---|
| Epitaxial Structure For Source/drain Contact App 20220293760 - HUNG; Tsungyu ; et al. | 2022-09-15 |
| Epitaxial layers in source/drain contacts and methods of forming the same Grant 11,410,890 - Shih , et al. August 9, 2 | 2022-08-09 |
| Spacer Structure For Semiconductor Device App 20220190137 - Wang; Chen-Han ; et al. | 2022-06-16 |
| Wrap-around contact on FinFET Grant 11,362,000 - Wang , et al. June 14, 2 | 2022-06-14 |
| Field Effect Transistors With Dual Silicide Contact Structures App 20220181464 - CHU; Peng-Wei ; et al. | 2022-06-09 |
| Spacer structure for semiconductor device Grant 11,264,485 - Wang , et al. March 1, 2 | 2022-03-01 |
| Field effect transistors with dual silicide contact structures Grant 11,233,134 - Chu , et al. January 25, 2 | 2022-01-25 |
| Epitaxial Backside Contact App 20210399099 - Chu; Chia-Hung ; et al. | 2021-12-23 |
| Selective epitaxy Grant 11,133,223 - Shih , et al. September 28, 2 | 2021-09-28 |
| Wrap-Around Contact on FinFET App 20210272849 - Wang; Sung-Li ; et al. | 2021-09-02 |
| Source/Drain Feature to Contact Interfaces App 20210210608 - Shih; Ding-Kang ; et al. | 2021-07-08 |
| Field Effect Transistors With Dual Silicide Contact Structures App 20210193816 - Chu; Peng-Wei ; et al. | 2021-06-24 |
| Spacer Structure For Semiconductor Device App 20210126106 - WANG; Chen-Han ; et al. | 2021-04-29 |
| Complimentary metal-oxide-semiconductor (CMOS) with low contact resistivity and method of forming same Grant 10,978,451 - Wann , et al. April 13, 2 | 2021-04-13 |
| Source/drain feature to contact interfaces Grant 10,937,876 - Shih , et al. March 2, 2 | 2021-03-02 |
| Selective Epitaxy App 20210020522 - Shih; Ding-Kang ; et al. | 2021-01-21 |
| Wrap-Around Contact on FinFET App 20200258784 - A1 | 2020-08-13 |
| Wrap-around contact on FinFET Grant 10,651,091 - Wang , et al. | 2020-05-12 |
| Source/Drain Feature to Contact Interfaces App 20200135874 - Shih; Ding-Kang ; et al. | 2020-04-30 |
| Complimentary Metal-Oxide-Semiconductor (CMOS) with Low Contact Resistivity and Method of Forming Same App 20200119013 - Wann; Clement Hsingjen ; et al. | 2020-04-16 |
| Epitaxial Layers in Source/Drain Contacts and Methods of Forming the Same App 20200006159 - Shih; Ding-Kang ; et al. | 2020-01-02 |
| Complimentary metal-oxide-semiconductor (CMOS) with low contact resistivity and method of forming same Grant 10,510,754 - Wann , et al. Dec | 2019-12-17 |
| Wrap-Around Contact on FinFET App 20190252261 - Wang; Sung-Li ; et al. | 2019-08-15 |
| Complimentary metal-oxide-semiconductor (CMOS) with low contact resistivity and method of forming same Grant 10,304,826 - Wann , et al. | 2019-05-28 |
| FinFET low resistivity contact formation method Grant 10,269,628 - Wang , et al. | 2019-04-23 |
| Wrap-around contact on FinFET Grant 10,269,649 - Wang , et al. | 2019-04-23 |
| Complimentary Metal-Oxide-Semiconductor (CMOS) with Low Contact Resistivity and Method of Forming Same App 20190096885 - Wann; Clement Hsingjen ; et al. | 2019-03-28 |
| Wrap-Around Contact on FinFET App 20180219077 - Wang; Sung-Li ; et al. | 2018-08-02 |
| Wrap-around contact on FinFET Grant 9,941,367 - Wang , et al. April 10, 2 | 2018-04-10 |
| FinFET low resistivity contact formation method Grant 9,899,521 - Wang , et al. February 20, 2 | 2018-02-20 |
| FinFet Low Resistivity Contact Formation Method App 20170170061 - Wang; Sung-Li ; et al. | 2017-06-15 |
| Contact structure of semiconductor device Grant 9,589,838 - Wang , et al. March 7, 2 | 2017-03-07 |
| Wrap-Around Contact on FinFET App 20160343815 - Wang; Sung-Li ; et al. | 2016-11-24 |
| Wrap-around contact Grant 9,443,769 - Wang , et al. September 13, 2 | 2016-09-13 |
| FinFET Low Resistivity Contact Formation Method App 20160190321 - Wang; Sung-Li ; et al. | 2016-06-30 |
| FinFET low resistivity contact formation method Grant 9,287,138 - Wang , et al. March 15, 2 | 2016-03-15 |
| Wrap-Around Contact App 20150303118 - Wang; Sung-Li ; et al. | 2015-10-22 |
| Contact Structure of Semiconductor Device App 20150303106 - Wang; Sung-Li ; et al. | 2015-10-22 |
| Contact structure of semiconductor device Grant 9,105,490 - Wang , et al. August 11, 2 | 2015-08-11 |
| Contact structure of semiconductor device Grant 9,099,494 - Wang , et al. August 4, 2 | 2015-08-04 |
| Contact Structure of Semiconductor Device App 20150140763 - Wang; Sung-Li ; et al. | 2015-05-21 |
| Contact structure of semiconductor device priority claim Grant 8,969,201 - Wang , et al. March 3, 2 | 2015-03-03 |
| FinFET Low Resistivity Contact Formation Method App 20150041854 - Wang; Sung-Li ; et al. | 2015-02-12 |
| Contact Structure of Semiconductor Device Priority Claim App 20140363943 - Wang; Sung-Li ; et al. | 2014-12-11 |
| Contact structure of semiconductor device Grant 8,823,065 - Wang , et al. September 2, 2 | 2014-09-02 |
| Complimentary Metal-Oxide-Semiconductor (CMOS) With Low Contact Resistivity and Method of Forming Same App 20140183645 - Wann; Clement Hsingjen ; et al. | 2014-07-03 |
| Contact Structure of Semiconductor Device App 20140124842 - Wang; Sung-Li ; et al. | 2014-05-08 |
| Contact Structure Of Semiconductor Device App 20140084340 - Wang; Sung-Li ; et al. | 2014-03-27 |
| Microcrystalline silicon thin film transistor and method for manufacturing the same Grant 8,039,844 - Tsai , et al. October 18, 2 | 2011-10-18 |
| Microcrystalline Silicon Thin Film Transistor And Method For Manufacturing The Same App 20090184321 - TSAI; Cheng-Ju ; et al. | 2009-07-23 |
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