Patent | Date |
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Optical device for coupling light Grant 11,448,828 - Chern , et al. September 20, 2 | 2022-09-20 |
Semiconductor Pacakge, Optical Device And Method Of Fabricating The Same App 20220291449 - Shih; Chih-Tsung ;   et al. | 2022-09-15 |
Optical Device For Coupling Light App 20220269006 - Chern; Chan-Hong ;   et al. | 2022-08-25 |
Semiconductor device with heating structure Grant 11,424,175 - Shih , et al. August 23, 2 | 2022-08-23 |
Reticle enclosure for lithography systems Grant 11,415,879 - Shih , et al. August 16, 2 | 2022-08-16 |
Photodetection Device And Manufacturing Method Thereof App 20220246784 - Shih; Chih-Tsung ;   et al. | 2022-08-04 |
Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof Grant 11,392,022 - Shih , et al. July 19, 2 | 2022-07-19 |
Extreme Ultraviolet Mask And Method Of Manufacturing The Same App 20220197127 - SHIH; Chih-Tsung ;   et al. | 2022-06-23 |
Optical Waveguide Coupler App 20220128763 - Shih; Chih-Tsung ;   et al. | 2022-04-28 |
Semiconductor Device And Method Of Making App 20220093808 - SHIH; Chih-Tsung ;   et al. | 2022-03-24 |
Extreme ultraviolet mask and method of manufacturing the same Grant 11,275,301 - Shih , et al. March 15, 2 | 2022-03-15 |
Extreme Ultraviolet Lithography Method, Extreme Ultraviolet Mask And Formation Method Thereof App 20210389661 - SHIH; Chih-Tsung ;   et al. | 2021-12-16 |
EUV Lithography Mask With A Porous Reflective Multilayer Structure App 20210364907 - Shih; Chih-Tsung ;   et al. | 2021-11-25 |
Method and apparatus for collecting information used in image-error compensation Grant 11,150,561 - Cho , et al. October 19, 2 | 2021-10-19 |
Layout Modification Method For Exposure Manufacturing Process App 20210296303 - CHO; Hung-Wen ;   et al. | 2021-09-23 |
Particle prevention method in lithography exposure apparatus Grant 11,119,420 - Lee , et al. September 14, 2 | 2021-09-14 |
Reticle Backside Inspection Method App 20210256686 - CHEN; Zi-Wen ;   et al. | 2021-08-19 |
EUV lithography mask with a porous reflective multilayer structure Grant 11,086,209 - Shih , et al. August 10, 2 | 2021-08-10 |
Mask with multilayer structure and manufacturing method by using the same Grant 11,073,755 - Shih , et al. July 27, 2 | 2021-07-27 |
System And Apparatus For Lithography In Semiconductor Fabrication App 20210216015 - WU; Cheng-Kuan ;   et al. | 2021-07-15 |
Particle Prevention Method In Lithography Exposure Apparatus App 20210191283 - LEE; Yi-Wei ;   et al. | 2021-06-24 |
Semiconductor Structure And Method Of Fabricating The Same App 20210183721 - Shih; Chih-Tsung ;   et al. | 2021-06-17 |
Layout modification method for exposure manufacturing process Grant 11,024,623 - Cho , et al. June 1, 2 | 2021-06-01 |
High durability extreme ultraviolet photomask Grant 11,003,069 - Yu , et al. May 11, 2 | 2021-05-11 |
Reticle backside inspection method Grant 10,997,706 - Chen , et al. May 4, 2 | 2021-05-04 |
Method for detecting EUV pellicle rupture Grant 10,976,674 - Shih , et al. April 13, 2 | 2021-04-13 |
Method and apparatus for lithography in semiconductor fabrication Grant 10,962,881 - Wu , et al. March 30, 2 | 2021-03-30 |
Photomask With Enhanced Contamination Control And Method Of Forming The Same App 20210063869 - LAI; CHIEN-HUNG ;   et al. | 2021-03-04 |
Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning Grant 10,871,713 - Cho , et al. December 22, 2 | 2020-12-22 |
Mask with Multilayer Structure and Manufacturing Method by Using the Same App 20200379335 - Shih; Chih-Tsung ;   et al. | 2020-12-03 |
Methods and apparatus for removing contamination from lithographic tool Grant 10,852,649 - Chen , et al. December 1, 2 | 2020-12-01 |
Pellicle for EUV mask and fabrication thereof Grant 10,831,094 - Shih , et al. November 10, 2 | 2020-11-10 |
Layout Modification Method For Exposure Manufacturing Process App 20200350306 - CHO; Hung-Wen ;   et al. | 2020-11-05 |
Method And Apparatus For Collecting Information Used In Image-error Compensation App 20200348586 - CHO; Hung-Wen ;   et al. | 2020-11-05 |
Method to reduce native defect printability Grant 10,824,080 - Shih , et al. November 3, 2 | 2020-11-03 |
Semiconductor Apparatus And Method Of Operating The Same App 20200341388 - CHEN; Jui-Chieh ;   et al. | 2020-10-29 |
Interconnection structure and methods of fabrication the same Grant 10,756,016 - Chang , et al. A | 2020-08-25 |
High Durability Extreme Ultraviolet Photomask App 20200264503 - Yu; Chia-Hao ;   et al. | 2020-08-20 |
Method Of Controlling Reticle Masking Blade Positioning To Minimize Impact On Critical Dimension Uniformity And Device For Contr App 20200264515 - CHO; Hung-Wen ;   et al. | 2020-08-20 |
Mask with multilayer structure and manufacturing method by using the same Grant 10,747,097 - Shih , et al. A | 2020-08-18 |
Layout modification method for exposure manufacturing process Grant 10,720,419 - Cho , et al. | 2020-07-21 |
Method and apparatus for collecting information used in image-error compensation Grant 10,712,651 - Cho , et al. | 2020-07-14 |
Methods And Apparatus For Removing Contamination From Lithographic Tool App 20200150550 - CHEN; Zi-Wen ;   et al. | 2020-05-14 |
High durability extreme ultraviolet photomask Grant 10,642,148 - Yu , et al. | 2020-05-05 |
Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning Grant 10,642,158 - Cho , et al. | 2020-05-05 |
Method Of Reducing Undesired Light Influence In Extreme Ultraviolet Exposure App 20200133127 - SHIH; Chih-Tsung ;   et al. | 2020-04-30 |
Method To Reduce Native Defect Printability App 20200133141 - SHIH; Chih-Tsung ;   et al. | 2020-04-30 |
Interconnection Structure and Methods of Fabrication the Same App 20200126914 - Chang; Shih-Ming ;   et al. | 2020-04-23 |
Extreme Ultraviolet Mask And Method Of Manufacturing The Same App 20200073225 - SHIH; Chih-Tsung ;   et al. | 2020-03-05 |
Method For Detecting Euv Pellicle Rupture App 20200057383 - SHIH; Chih-Tsung ;   et al. | 2020-02-20 |
Pellicle for EUV Mask and Fabrication Thereof App 20200050100 - Shih; Chih-Tsung ;   et al. | 2020-02-13 |
Methods and apparatus for removing contamination from lithographic tool Grant 10,534,279 - Chen , et al. Ja | 2020-01-14 |
Interconnection structure and methods of fabrication the same Grant 10,522,464 - Chang , et al. Dec | 2019-12-31 |
Pellicle for EUV mask and fabrication thereof Grant 10,520,806 - Shih , et al. Dec | 2019-12-31 |
Methods and apparatus for removing contamination from lithographic tool Grant 10,509,334 - Chen , et al. Dec | 2019-12-17 |
Layout Modification Method For Exposure Manufacturing Process App 20190348409 - CHO; Hung-Wen ;   et al. | 2019-11-14 |
Layout modification method for exposure manufacturing process Grant 10,366,973 - Cho , et al. July 30, 2 | 2019-07-30 |
Method Of Controlling Reticle Masking Blade Positioning To Minimize Impact On Critical Dimension Uniformity And Device For Contr App 20190163046 - CHO; Hung-Wen ;   et al. | 2019-05-30 |
Method And Apparatus For Lithography In Semiconductor Fabrication App 20190146349 - WU; Cheng-Kuan ;   et al. | 2019-05-16 |
Method And Apparatus For Collecting Information Used In Image-error Compensation App 20190137866 - CHO; Hung-Wen ;   et al. | 2019-05-09 |
Layout Modification Method For Exposure Manufacturing Process App 20190131290 - CHO; Hung-Wen ;   et al. | 2019-05-02 |
EUV pellicle fabrication methods and structures thereof Grant 10,274,819 - Hsu , et al. | 2019-04-30 |
Method for integrated circuit patterning Grant 10,276,372 - Shih , et al. | 2019-04-30 |
Mask with Multilayer Structure and Manufacturing Method by Using the Same App 20190113835 - Shih; Chih-Tsung ;   et al. | 2019-04-18 |
Methods And Apparatus For Removing Containmination From Lithographic Tool App 20190101838 - Chen; Zi-Wen ;   et al. | 2019-04-04 |
Reticle Backside Inspection Method App 20190102875 - CHEN; Zi-Wen ;   et al. | 2019-04-04 |
Mask with multilayer structure and manufacturing method by using the same Grant 10,168,611 - Shih , et al. J | 2019-01-01 |
High Durability Extreme Ultraviolet Photomask App 20180373138 - YU; CHIA-HAO ;   et al. | 2018-12-27 |
Pellicle For Euv Mask And Fabrication Thereof App 20180341174 - Shih; Chih-Tsung ;   et al. | 2018-11-29 |
Euv Lithography Mask With A Porous Reflective Multilayer Structure App 20180314144 - Shih; Chih-Tsung ;   et al. | 2018-11-01 |
High durability extreme ultraviolet photomask Grant 10,061,191 - Yu , et al. August 28, 2 | 2018-08-28 |
Pellicle for EUV mask and fabrication thereof Grant 10,031,411 - Shih , et al. July 24, 2 | 2018-07-24 |
Extreme ultraviolet lithography process and mask Grant 10,007,174 - Shih , et al. June 26, 2 | 2018-06-26 |
Apparatus for single-molecule detection Grant 9,995,683 - Chiou , et al. June 12, 2 | 2018-06-12 |
Interconnection Structure and Methods of Fabrication the Same App 20180047672 - Chang; Shih-Ming ;   et al. | 2018-02-15 |
Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process Grant 9,886,543 - Chung , et al. February 6, 2 | 2018-02-06 |
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof Grant 9,869,928 - Huang , et al. January 16, 2 | 2018-01-16 |
High Durability Extreme Ultraviolet Photomask App 20170351169 - YU; CHIA-HAO ;   et al. | 2017-12-07 |
Mask With Multilayer Structure And Manufacturing Method By Using The Same App 20170343892 - Shih; Chih-Tsung ;   et al. | 2017-11-30 |
Method for Integrated Circuit Patterning App 20170338103 - Shih; Chih-Tsung ;   et al. | 2017-11-23 |
EUV focus monitoring systems and methods Grant 9,823,585 - Shih , et al. November 21, 2 | 2017-11-21 |
Interconnection structure and methods of fabrication the same Grant 9,786,602 - Chang , et al. October 10, 2 | 2017-10-10 |
Single molecule detection system and methods Grant 9,777,321 - Chiou , et al. October 3, 2 | 2017-10-03 |
Mask with multilayer structure and manufacturing method by using the same Grant 9,766,536 - Shih , et al. September 19, 2 | 2017-09-19 |
Via definition scheme Grant 9,748,133 - Lu , et al. August 29, 2 | 2017-08-29 |
Method Providing For Asymmetric Pupil Configuration For An Extreme Ultraviolet Lithography Process App 20170228490 - Chung; Chia-Chun ;   et al. | 2017-08-10 |
Method to define multiple layer patterns with a single exposure by charged particle beam lithography Grant 9,726,983 - Lu , et al. August 8, 2 | 2017-08-08 |
Method of semiconductor integrated circuit fabrication Grant 9,728,408 - Lee , et al. August 8, 2 | 2017-08-08 |
EUV mask and manufacturing method by using the same Grant 9,709,884 - Shih , et al. July 18, 2 | 2017-07-18 |
Photomask for forming multiple layer patterns with a single exposure Grant 9,685,367 - Lu , et al. June 20, 2 | 2017-06-20 |
Method for forming different patterns in a semiconductor structure using a single mask Grant 9,679,803 - Huang , et al. June 13, 2 | 2017-06-13 |
Method of making an extreme ultraviolet pellicle Grant 9,664,999 - Shih , et al. May 30, 2 | 2017-05-30 |
Photomask For Forming Multiple Layer Patterns With A Single Exposure App 20170110366 - LU; Yen-Cheng ;   et al. | 2017-04-20 |
Structure and method for reflective-type mask Grant 9,612,523 - Shih , et al. April 4, 2 | 2017-04-04 |
Photomask pellicle Grant 9,588,417 - Chung , et al. March 7, 2 | 2017-03-07 |
Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof Grant 9,588,419 - Lu , et al. March 7, 2 | 2017-03-07 |
Interconnection Structure and Methods of Fabrication the Same App 20170053870 - Chang; Shih-Ming ;   et al. | 2017-02-23 |
Method To Define Multiple Layer Patterns With A Single Exposure By Charged Particle Beam Lithography App 20170045827 - Lu; Yen-Cheng ;   et al. | 2017-02-16 |
Assist feature for a photolithographic process Grant 9,557,649 - Huang , et al. January 31, 2 | 2017-01-31 |
Mask With Multilayer Structure And Manufacturing Method By Using The Same App 20170017147 - Shih; Chih-Tsung ;   et al. | 2017-01-19 |
Single-molecule Detection System And Methods App 20170009286 - Chiou; Chung-Fan ;   et al. | 2017-01-12 |
Photomask with three states for forming multiple layer patterns with a single exposure Grant 9,535,316 - Lu , et al. January 3, 2 | 2017-01-03 |
Extreme ultraviolet lithography process and mask Grant 9,529,249 - Shih , et al. December 27, 2 | 2016-12-27 |
Method Of Making An Extreme Ultraviolet Pellicle App 20160363857 - Shih; Chih-Tsung ;   et al. | 2016-12-15 |
Photomask Pellicle App 20160349609 - Chung; Chia-Chun ;   et al. | 2016-12-01 |
Via Definition Scheme App 20160329240 - Lu; Yen-Cheng ;   et al. | 2016-11-10 |
Single-molecule detection system and methods Grant 9,482,615 - Chiou , et al. November 1, 2 | 2016-11-01 |
EUV focus monitoring systems and methods App 20160291482 - Shih; Chih-Tsung ;   et al. | 2016-10-06 |
Method of making an extreme ultraviolet pellicle Grant 9,442,368 - Shih , et al. September 13, 2 | 2016-09-13 |
Method for integrated circuit patterning Grant 9,418,862 - Huang , et al. August 16, 2 | 2016-08-16 |
Euv Pellicle Fabrication Methods And Structures Thereof App 20160231647 - Hsu; Pei-Cheng ;   et al. | 2016-08-11 |
Via definition scheme Grant 9,412,647 - Lu , et al. August 9, 2 | 2016-08-09 |
Extreme Ultraviolet Light (EUV) Photomasks, and Fabrication Methods Thereof App 20160223900 - Huang; Tao-Min ;   et al. | 2016-08-04 |
Extreme Ultraviolet Lithography Process and Mask App 20160223899 - SHIH; CHIH-TSUNG ;   et al. | 2016-08-04 |
Method to define multiple layer patterns with a single exposure by charged particle beam lithography Grant 9,405,195 - Lu , et al. August 2, 2 | 2016-08-02 |
Photoresist having improved extreme-ultraviolet lithography imaging performance Grant 9,389,506 - Chang , et al. July 12, 2 | 2016-07-12 |
Assist Feature for a Photolithographic Process App 20160195812 - HUANG; TAO-MIN ;   et al. | 2016-07-07 |
Method of Semiconductor Integrated Circuit Fabrication App 20160172196 - LEE; Chung-Ju ;   et al. | 2016-06-16 |
Extreme ultraviolet lithography process and mask Grant 9,354,507 - Shih , et al. May 31, 2 | 2016-05-31 |
Pellicle For Euv Mask And Fabrication Thereof App 20160147137 - Shih; Chih-Tsung ;   et al. | 2016-05-26 |
Euv Mask And Manufacturing Method By Using The Same App 20160147138 - Shih; Chih-Tsung ;   et al. | 2016-05-26 |
Method Of Making An Extreme Ultraviolet Pellicle App 20160109798 - Shih; Chih-Tsung ;   et al. | 2016-04-21 |
Extreme ultraviolet lithography process and mask Grant 9,316,900 - Shih , et al. April 19, 2 | 2016-04-19 |
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof Grant 9,310,675 - Huang , et al. April 12, 2 | 2016-04-12 |
Assist feature for a photolithographic process Grant 9,285,673 - Huang , et al. March 15, 2 | 2016-03-15 |
Method of fabricating mask Grant 9,280,046 - Yen , et al. March 8, 2 | 2016-03-08 |
Method for Integrated Circuit Patterning App 20160064240 - Huang; Tsung-Min ;   et al. | 2016-03-03 |
Method for Integrated Circuit Patterning App 20160064239 - Shih; Chih-Tsung ;   et al. | 2016-03-03 |
Method of making an extreme ultraviolet pellicle Grant 9,256,123 - Shih , et al. February 9, 2 | 2016-02-09 |
Method of semiconductor integrated circuit fabrication Grant 9,257,282 - Shih , et al. February 9, 2 | 2016-02-09 |
Metal and via definition scheme Grant 9,252,048 - Lu , et al. February 2, 2 | 2016-02-02 |
Assist Feature for a Photolithographic Process App 20160011501 - HUANG; Tao-Min ;   et al. | 2016-01-14 |
Reflective mask and method of making same Grant 9,213,232 - Hsu , et al. December 15, 2 | 2015-12-15 |
Extreme Ultraviolet Light (EUV) Photomasks and Fabrication Methods Thereof App 20150331307 - Lu; Yen-Cheng ;   et al. | 2015-11-19 |
Method for integrated circuit patterning Grant 9,184,054 - Huang , et al. November 10, 2 | 2015-11-10 |
Method of Semiconductor Integrated Circuit Fabrication App 20150318173 - Shih; Chih-Tsung ;   et al. | 2015-11-05 |
Method for Integrated Circuit Patterning App 20150311075 - Huang; Tsung-Min ;   et al. | 2015-10-29 |
Method Of Making An Extreme Ultraviolet Pellicle App 20150309405 - Shih; Chih-Tsung ;   et al. | 2015-10-29 |
Method to Define Multiple Layer Patterns with a Single Exposure by Charged Particle Beam Lithography App 20150287596 - Lu; Yen-Cheng ;   et al. | 2015-10-08 |
Photoresist Having Improved Extreme-Ultraviolet Lithography Imaging Performance App 20150286138 - Chang; Shu-Hao ;   et al. | 2015-10-08 |
Structure and Method for Reflective-Type Mask App 20150261082 - SHIH; CHIH-TSUNG ;   et al. | 2015-09-17 |
Extreme ultraviolet (EUV) mask and method of fabricating the EUV mask Grant 9,134,604 - Shih , et al. September 15, 2 | 2015-09-15 |
Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof Grant 9,091,947 - Lu , et al. July 28, 2 | 2015-07-28 |
Method For Forming Different Patterns In A Semiconductor Structure Using A Single Mask App 20150200130 - HUANG; Tsung-Min ;   et al. | 2015-07-16 |
Extreme ultraviolet (EUV) mask, method of fabricating the EUV mask and method of inspecting the EUV mask Grant 9,081,288 - Shih , et al. July 14, 2 | 2015-07-14 |
Photoresist having improved extreme-ultraviolet lithography imaging performance Grant 9,081,280 - Chang , et al. July 14, 2 | 2015-07-14 |
Method to define multiple layer patterns with a single exposure by E-beam lithography Grant 9,081,312 - Lu , et al. July 14, 2 | 2015-07-14 |
Structure and method for reflective-type mask Grant 9,046,781 - Shih , et al. June 2, 2 | 2015-06-02 |
Extreme Ultraviolet Lithography Process and Mask App 20150138524 - Shih; Chih-Tsung ;   et al. | 2015-05-21 |
Reflective Mask And Method Of Making Same App 20150104736 - HSU; Pei-Cheng ;   et al. | 2015-04-16 |
Extreme Ultraviolet Lithography Process and Mask App 20150104734 - Shih; Chih-Tsung ;   et al. | 2015-04-16 |
Metal and Via Definition Scheme App 20150072519 - Lu; Yen-Cheng ;   et al. | 2015-03-12 |
Via Definition Scheme App 20150069622 - Lu; Yen-Cheng ;   et al. | 2015-03-12 |
Extreme Ultraviolet (Euv) Mask And Method Of Fabricating The Euv Mask App 20150064611 - Shih; Chih-Tsung ;   et al. | 2015-03-05 |
Extreme Ultraviolet (EUV) Mask, Method Of Fabricating The EUV Mask And Method Of Inspecting The EUV Mask App 20150037712 - Shih; Chih-Tsung ;   et al. | 2015-02-05 |
Extreme Ultraviolet Light (euv) Photomasks And Fabrication Methods Thereof App 20150024305 - Lu; Yen-Cheng ;   et al. | 2015-01-22 |
Apparatus For Single-Molecule Detection App 20140367589 - Chiou; Chung-Fan ;   et al. | 2014-12-18 |
Photomask With Three States For Forming Multiple Layer Patterns With A Single Exposure App 20140342564 - Lu; Yen-Cheng ;   et al. | 2014-11-20 |
Method to Define Multiple Layer Patterns With a Single Exposure by E-Beam Lithography App 20140342272 - Lu; Yen-Cheng ;   et al. | 2014-11-20 |
Reflective mask and method of making same Grant 8,877,409 - Hsu , et al. November 4, 2 | 2014-11-04 |
Apparatus for single-molecule detection Grant 8,865,077 - Chiou , et al. October 21, 2 | 2014-10-21 |
Apparatus for single-molecule detection Grant 8,865,078 - Chiou , et al. October 21, 2 | 2014-10-21 |
Method Of Fabricating Mask App 20140272683 - Yen; Anthony ;   et al. | 2014-09-18 |
Structure and Method for Reflective-Type Mask App 20140272678 - Shih; Chih-Tsung ;   et al. | 2014-09-18 |
Extreme Ultraviolet Light (EUV) Photomasks, and Fabrication Methods Thereof App 20140272681 - Huang; Tao-Min ;   et al. | 2014-09-18 |
Extreme Ultraviolet Lithography Process and Mask App 20140272682 - Shih; Chih-Tsung ;   et al. | 2014-09-18 |
Method to define multiple layer patterns using a single exposure Grant 8,791,024 - Lu , et al. July 29, 2 | 2014-07-29 |
Phase Shift Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same App 20140038086 - Shih; Chih-Tsung ;   et al. | 2014-02-06 |
Reflective Mask And Method Of Making Same App 20130280643 - Hsu; Pei-Cheng ;   et al. | 2013-10-24 |
LED structure, manufacturing method thereof and LED module Grant 8,304,785 - Shih , et al. November 6, 2 | 2012-11-06 |
Bonding system for optical alignment Grant 8,265,436 - Shih , et al. September 11, 2 | 2012-09-11 |
Photoresist Having Improved Extreme-ultraviolet Lithography Imaging Performance App 20120219897 - Chang; Shu-Hao ;   et al. | 2012-08-30 |
Light-emitting diode package having electrostatic discharge protection function and method of fabricating the same Grant 8,129,726 - Shih , et al. March 6, 2 | 2012-03-06 |
Apparatus for single-molecule detection App 20110306039 - Chiou; Chung-Fan ;   et al. | 2011-12-15 |
Apparatus for single-molecule detection App 20110306143 - Chiou; Chung-Fan ;   et al. | 2011-12-15 |
Bonding System For Optical Alignment App 20110280511 - Shih; Chih-Tsung ;   et al. | 2011-11-17 |
Single-molecule Detection System And Methods App 20110223590 - CHIOU; Chung-Fan ;   et al. | 2011-09-15 |
Method for driving a light source and a backing light source Grant 7,800,578 - Shih , et al. September 21, 2 | 2010-09-21 |
Electro-optical modulator with curving resonator Grant 7,720,320 - Shih , et al. May 18, 2 | 2010-05-18 |
LED Structure, Manufacturing Method Thereof and LED Module App 20100084958 - Shih; Chih-Tsung ;   et al. | 2010-04-08 |
Integrated Circuit And Photonic Board Thereof App 20090317033 - Shih; Chih-Tsung ;   et al. | 2009-12-24 |
Light-emitting Diode Package Having Electrostatic Discharge Protection Function And Method Of Fabricating The Same App 20090290273 - Shih; Chih-Tsung ;   et al. | 2009-11-26 |
Electro-optical Modulator With Curving Resonantor App 20090010587 - Shih; Chih-Tsung ;   et al. | 2009-01-08 |
Electro-optical modulator with curving resonator Grant 7,447,387 - Shih , et al. November 4, 2 | 2008-11-04 |
Method For Driving A Light Source And A Backing Light Source App 20080129224 - Shih; Chih Tsung ;   et al. | 2008-06-05 |
Electro-optical Modulator With Curving Resonantor App 20080056636 - Shih; Chih-Tsung ;   et al. | 2008-03-06 |
Power polarization beam combiner and its applications in fiber communication Grant 7,295,373 - Shih , et al. November 13, 2 | 2007-11-13 |
Power polarization beam combiner and its applications in fiber communication App 20050141893 - Shih, Chih-Tsung ;   et al. | 2005-06-30 |
Tunable filter with a wide free spectral range App 20050052746 - Shih, Chih-Tsung ;   et al. | 2005-03-10 |