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Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device
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Polishing Endpoint Detection Method And Polishing Endpoint Detection Apparatus
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Processing End Point Detection Method, Polishing Method, And Polishing Apparatus
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Polishing endpoint detection apparatus
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Processing end point detection method, polishing method, and polishing apparatus
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Method For Fabricating Semiconductor Device
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Chemical mechanical polishing method and method of manufacturing semiconductor device
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Method of manufacturing semiconductor device
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Method of fabricating semiconductor device
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Polishing Endpoint Detection Method And Polishing Endpoint Detection Apparatus
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Method Of Manufacturing Semiconductor Device
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Substrate Processing Method And Substrate Processing Apparatus
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Semiconductor Memory Device
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Substrate processing method and substrate processing apparatus
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Polishing apparatus and polishing method
Grant 7,744,445 - Kubota , et al. June 29, 2 | 2010-06-29 |
Substrate Polishing Apparatus
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Method of manufacturing a semiconductor device
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Method Of Fabricating Semiconductor Device
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Processing end point detection method, polishing method,and polishing apparatus
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Peripheral processing method and method of manufacturing a semiconductor device
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Chemical Mechanical Polishing Method And Method Of Manufacturing Semiconductor Device
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Chemical Mechanical Polishing Slurry And Semiconductor Device Manufacturing Method
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Method Of Manufacturing Semiconductor Device
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Substrate Treating Method And Substrate Treating Apparatus
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Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device
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Polishing apparatus and polishing method
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Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device
Grant 7,452,819 - Matsui , et al. November 18, 2 | 2008-11-18 |
Substrate Processing Method
App 20080254719 - SHIGETA; Atsushi ; et al. | 2008-10-16 |
Method of manufacturing semiconductor device
Grant 7,435,682 - Matsui , et al. October 14, 2 | 2008-10-14 |
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Method of manufacturing semiconductor device
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Method for chemically mechanically polishing organic film, method of manufacturing semiconductor device, and program therefor
Grant 7,402,521 - Matsui , et al. July 22, 2 | 2008-07-22 |
Polishing method for semiconductor wafer and polishing apparatus for semiconductor wafer
App 20080113590 - Kubota; Takeo ; et al. | 2008-05-15 |
Substrate processing method and substrate processing apparatus
App 20070287364 - Shigeta; Atsushi ; et al. | 2007-12-13 |
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App 20070264822 - Kubota; Takeo ; et al. | 2007-11-15 |
Polishing apparatus and polishing method
App 20070239309 - Tada; Mitsuo ; et al. | 2007-10-11 |
Method for manufacturing semiconductor device
App 20070224760 - Matsui; Yukiteru ; et al. | 2007-09-27 |
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App 20070178701 - Toyota; Gen ; et al. | 2007-08-02 |
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Chemical Mechanical Polishing Method And Method Of Manufacturing Semiconductor Device
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Methods for manufacturing semiconductor devices
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Grant 7,217,662 - Toyota , et al. May 15, 2 | 2007-05-15 |
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Substrate processing method and semiconductor device manufacturing method
App 20070000873 - Kubota; Takeo ; et al. | 2007-01-04 |
Method for chemically mechanically polishing organic film, method of manufacturing semiconductor device, and program therefor
App 20070000872 - Matsui; Yukiteru ; et al. | 2007-01-04 |
Projection-type display apparatus
Grant 7,092,045 - Haruna , et al. August 15, 2 | 2006-08-15 |
Polishing apparatus
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Substrate processing method and substrate processing apparatus
Grant 7,014,529 - Kubota , et al. March 21, 2 | 2006-03-21 |
Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishing
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Polishing apparatus and a method of polishing and cleaning and drying a wafer
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Substrate processing method and substrate processing apparatus
App 20060019417 - Shigeta; Atsushi ; et al. | 2006-01-26 |
Method of judging residual film by optical measurement
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Method of manufacturing semiconductor device
App 20050266355 - Matsui, Yukiteru ; et al. | 2005-12-01 |
Method of processing a substrate
App 20050245174 - Toyota, Gen ; et al. | 2005-11-03 |
Method of processing a substrate
App 20050221615 - Toyota, Gen ; et al. | 2005-10-06 |
Method of manufacturing semiconductor device
App 20050176253 - Shigeta, Atsushi ; et al. | 2005-08-11 |
Substrate polishing apparatus
App 20050142991 - Nakao, Hidetaka ; et al. | 2005-06-30 |
Method of manufacturing a semiconductor device
App 20050106874 - Matsui, Yukiteru ; et al. | 2005-05-19 |
Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device
App 20040253822 - Matsui, Yukiteru ; et al. | 2004-12-16 |
Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishing
App 20040132305 - Nishimoto, Kazuo ; et al. | 2004-07-08 |
Method of inspecting process for manufacturing semiconductor device and method of manufacturing semiconductor device
Grant 6,743,645 - Kubota , et al. June 1, 2 | 2004-06-01 |
Projection-type display apparatus
App 20040070694 - Haruna, Fumio ; et al. | 2004-04-15 |
Method of judging residual film by optical measurement
App 20030197859 - Kubota, Takeo ; et al. | 2003-10-23 |
Polishing apparatus and a method of polishing and cleaning and drying a wafer
App 20030040261 - Nishi, Toyomi ; et al. | 2003-02-27 |
Method of inspecting process for manufacturing semiconductor device and method of manufacturing semiconductor device
App 20020142498 - Kubota, Takeo ; et al. | 2002-10-03 |
Polishing apparatus and method for planarizing layer on a semiconductor wafer
Grant 5,948,205 - Kodera , et al. September 7, 1 | 1999-09-07 |
Polishing apparatus and method for planarizing layer on a semiconductor wafer
Grant 5,914,275 - Kodera , et al. June 22, 1 | 1999-06-22 |
Method of and apparatus for cleaning workpiece
Grant 5,860,181 - Maekawa , et al. January 19, 1 | 1999-01-19 |
Method for planarizing a semiconductor body by CMP method and an apparatus for manufacturing a semiconductor device using the method
Grant 5,695,601 - Kodera , et al. December 9, 1 | 1997-12-09 |
Polishing aparatus and method
Grant 5,679,059 - Nishi , et al. October 21, 1 | 1997-10-21 |
Polishing apparatus
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Semiconductor planarizing apparatus
Grant 5,597,341 - Kodera , et al. January 28, 1 | 1997-01-28 |
Method for planarizing a semiconductor device having a amorphous layer
Grant 5,445,996 - Kodera , et al. August 29, 1 | 1995-08-29 |
Method and apparatus for polishing a workpiece
Grant 5,398,459 - Okumura , et al. March 21, 1 | 1995-03-21 |
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