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name:-0.20692110061646
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Shibutami; Tetsuo Patent Filings

Shibutami; Tetsuo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shibutami; Tetsuo.The latest application filed is for "gallium nitride sintered body or gallium nitride molded article, and method for producing same".

Company Profile
0.21.21
  • Shibutami; Tetsuo - Kanagawa JP
  • Shibutami; Tetsuo - Ayase JP
  • Shibutami; Tetsuo - Sagamihara JP
  • SHIBUTAMI; Tetsuo - Ayase-shi JP
  • SHIBUTAMI; Tetsuo - Sagamihara-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Gallium nitride sintered body or gallium nitride molded article, and method for producing same
Grant 11,168,393 - Mesuda , et al. November 9, 2
2021-11-09
Cylindrical sputtering target and process for producing the same
Grant 10,366,870 - Todoko , et al. July 30, 2
2019-07-30
Gallium Nitride Sintered Body Or Gallium Nitride Molded Article, And Method For Producing Same
App 20190106784 - MESUDA; Masami ;   et al.
2019-04-11
Gallium nitride sintered body or gallium nitride molded article, and method for producing same
Grant 10,174,419 - Mesuda , et al. J
2019-01-08
Sintered body, sputtering target and molding die, and process for producing sintered body employing the same
Grant 9,920,420 - Itoh , et al. March 20, 2
2018-03-20
Complex oxide sintered body, sputtering target, transparent conductive oxide film, and method for producing same
Grant 9,418,771 - Kuramochi , et al. August 16, 2
2016-08-16
Sintered oxide material, method for manufacturing same, sputtering target, oxide transparent electrically conductive film, method for manufacturing same, and solar cell
Grant 9,399,815 - Kuramochi , et al. July 26, 2
2016-07-26
Zinc oxide sintered compact, sputtering target, and zinc oxide thin film
Grant 9,396,830 - Mesuda , et al. July 19, 2
2016-07-19
Cylindrical Sputtering Target And Process For Producing The Same
App 20160141159 - TODOKO; Shigehisa ;   et al.
2016-05-19
Sintered Body, Sputtering Target And Molding Die, And Process For Producing Sintered Body Employing The Same
App 20150368791 - ITOH; Kenichi ;   et al.
2015-12-24
Cylindrical sputtering target, and method for manufacturing same
Grant 9,127,352 - Itoh , et al. September 8, 2
2015-09-08
Sintered composite oxide, manufacturing method therefor, sputtering target, transparent conductive oxide film, and manufacturing method therefor
Grant 9,111,663 - Kuramochi , et al. August 18, 2
2015-08-18
Complex Oxide Sintered Body, Sputtering Target, Transparent Conductive Oxide Film, And Method For Producing Same
App 20140332735 - Kuramochi; Hideto ;   et al.
2014-11-13
Cylindrical sputtering target
Grant 8,828,198 - Todoko , et al. September 9, 2
2014-09-09
Sintered Oxide Material, Method For Manufacturing Same, Sputtering Target, Oxide Transparent Electrically Conductive Film, Method For Manufacturing Same, And Solar Cell
App 20130276879 - Kuramochi; Hideto ;   et al.
2013-10-24
Gallium Nitride Sintered Body Or Gallium Nitride Molded Article, And Method For Producing Same
App 20130273346 - Mesuda; Masami ;   et al.
2013-10-17
Sintered Body, Sputtering Target And Molding Die, And Process For Producing Sintered Body Employing The Same
App 20130213801 - ITOH; Kenichi ;   et al.
2013-08-22
Zinc Oxide Sintered Compact, Sputtering Target, And Zinc Oxide Thin Film
App 20130214215 - Mesuda; Masami ;   et al.
2013-08-22
Sintered Composite Oxide, Manufacturing Method Therefor, Sputtering Target, Transparent Conductive Oxide Film, And Manufacturing Method Therefor
App 20130181173 - Kuramochi; Hideto ;   et al.
2013-07-18
Sintered body, sputtering target and molding die, and process for producing sintered body employing the same
Grant 8,419,400 - Itoh , et al. April 16, 2
2013-04-16
Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body
Grant 8,206,561 - Itoh , et al. June 26, 2
2012-06-26
Cylindrical Sputtering Target, And Method For Manufacturing Same
App 20110240467 - Itoh; Kenichi ;   et al.
2011-10-06
Cylindrical Sputtering Target And Process For Producing The Same
App 20110100808 - Todoko; Shigehisa ;   et al.
2011-05-05
Cylindrical Sputtering Target
App 20100326823 - Todoko; Shigehisa ;   et al.
2010-12-30
Sintered Body, Sputtering Target and Molding Die, and Process for Producing Sintered Body Employing the Same
App 20080274351 - Itoh; Kenichi ;   et al.
2008-11-06
Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body
App 20060151321 - Itoh; Kenichi ;   et al.
2006-07-13
Ruthenium complex, process for producing the same and process for producing thin film
Grant 6,605,735 - Kawano , et al. August 12, 2
2003-08-12
Ruthenium Complex, Process For Producing The Same And Process For Producing Thin Film
App 20030088116 - Kawano, Kazuhisa ;   et al.
2003-05-08

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