Shibata; Yukinobu
Patent Applications and Registrations
Patent applications and USPTO patent grants for Shibata; Yukinobu.The latest application filed is for "exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus".
- Shibata; Yukinobu - Juuou-machi JP
- Shibata; Yukinobu - Ibaraki JP
| Patent | Date |
|---|---|
| Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus Grant 5,557,314 - Okamoto , et al. September 17, 1 | 1996-09-17 |
| Charged particle beam exposure apparatus Grant 5,424,550 - Kawano , et al. June 13, 1 | 1995-06-13 |
| Electron beam lithography using an aperture having an array of repeated unit patterns Grant 5,250,812 - Murai , et al. October 5, 1 | 1993-10-05 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 