Shiba; Masataka
Patent Applications and Registrations
Patent applications and USPTO patent grants for Shiba; Masataka.The latest application filed is for "exposure apparatus and method".
- Shiba; Masataka - Yokohama JP
- Shiba, Masataka - Yokohama-shi JP
- Shiba; Masataka - Kanagawa JP
- Shiba; Masataka - Izumi-ku Yokohama JP
| Patent | Date |
|---|---|
| Exposure apparatus and method Grant 7,604,925 - Noguchi , et al. October 20, 2 | 2009-10-20 |
| Exposure apparatus and method Grant 7,598,020 - Noguchi , et al. October 6, 2 | 2009-10-06 |
| Exposure apparatus and method Grant 7,277,155 - Noguchi , et al. October 2, 2 | 2007-10-02 |
| Exposure apparatus and method Grant 7,012,671 - Noguchi , et al. March 14, 2 | 2006-03-14 |
| Exposure apparatus and method App 20050196705 - Noguchi, Minori ; et al. | 2005-09-08 |
| Exposure apparatus and method App 20050196713 - Noguchi, Minori ; et al. | 2005-09-08 |
| Exposure apparatus and method App 20050191583 - Noguchi, Minori ; et al. | 2005-09-01 |
| Process management system Grant 6,757,621 - Mizuno , et al. June 29, 2 | 2004-06-29 |
| Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same system Grant 6,650,409 - Noguchi , et al. November 18, 2 | 2003-11-18 |
| Process management system App 20030130806 - Mizuno, Fumio ; et al. | 2003-07-10 |
| Exposure apparatus and method App 20030073045 - Noguchi, Minori ; et al. | 2003-04-17 |
| Process control system Grant 6,542,830 - Mizuno , et al. April 1, 2 | 2003-04-01 |
| Exposure apparatus and method Grant 6,485,891 - Noguchi , et al. November 26, 2 | 2002-11-26 |
| Method and apparatus for processing inspection data Grant 6,456,951 - Maeda , et al. September 24, 2 | 2002-09-24 |
| Method of determining lethality of defects in circuit pattern inspection, method of selecting defects to be reviewed, and inspection system of circuit patterns involved with the methods App 20020042682 - Yoshitake, Yasuhiro ; et al. | 2002-04-11 |
| Exposure apparatus and method Grant 6,016,187 - Noguchi , et al. January 18, 2 | 2000-01-18 |
| System for quality control where inspection frequency of inspection apparatus is reset to minimize expected total loss based on derived frequency function and loss value Grant 6,002,989 - Shiba , et al. December 14, 1 | 1999-12-14 |
| Exposure apparatus and method Grant 5,767,949 - Noguchi , et al. June 16, 1 | 1998-06-16 |
| Exposure apparatus and method Grant 5,329,333 - Noguchi , et al. July 12, 1 | 1994-07-12 |
| Method and apparatus for detecting focal plane Grant 5,153,916 - Inagaki , et al. October 6, 1 | 1992-10-06 |
| Foreign particle detecting method and apparatus Grant RE33,991 - Shiba , et al. July 14, 1 | 1992-07-14 |
| Information detecting system of scanning type Grant 5,121,449 - Shiba , et al. June 9, 1 | 1992-06-09 |
| Optical integrated circuit and optical apparatus Grant 5,070,488 - Fukushima , et al. December 3, 1 | 1991-12-03 |
| Exposure method and apparatus Grant 5,008,702 - Tanaka , et al. April 16, 1 | 1991-04-16 |
| Method and apparatus for pattern detection Grant 4,993,837 - Oshida , et al. February 19, 1 | 1991-02-19 |
| Illumination apparatus for exposure Grant 4,819,033 - Yoshitake , et al. April 4, 1 | 1989-04-04 |
| Reduction projection type aligner Grant 4,795,261 - Nakata , et al. January 3, 1 | 1989-01-03 |
| Pattern position detecting method and apparatus for detecting the position of an alignment direction of a wafer target pattern Grant 4,777,374 - Nakata , et al. October 11, 1 | 1988-10-11 |
| Alignment method and apparatus for reduction projection type aligner Grant 4,725,737 - Nakata , et al. February 16, 1 | 1988-02-16 |
| Semiconductor exposure apparatus and alignment method therefor Grant 4,701,050 - Oshida , et al. October 20, 1 | 1987-10-20 |
| Exposure apparatus with foreign particle detector Grant 4,676,637 - Uto , et al. June 30, 1 | 1987-06-30 |
| Foreign particle detecting method and apparatus Grant 4,669,875 - Shiba , et al. June 2, 1 | 1987-06-02 |
| Exposure apparatus and method of aligning exposure mask with workpiece Grant 4,668,089 - Oshida , et al. May 26, 1 | 1987-05-26 |
| Reflection type optical focusing apparatus Grant 4,458,302 - Shiba , et al. July 3, 1 | 1984-07-03 |
| Voiced instruction identification system Grant 4,178,472 - Funakubo , et al. December 11, 1 | 1979-12-11 |
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