| Patent | Date |
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Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration
Grant 8,040,573 - Shi , et al. October 18, 2 | 2011-10-18 |
Method of two dimensional feature model calibration and optimization
Grant 7,820,341 - Laidig , et al. October 26, 2 | 2010-10-26 |
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
Grant 7,735,052 - Shi , et al. June 8, 2 | 2010-06-08 |
Method of optical proximity correction design for contact hole mask
Grant 7,594,199 - Socha , et al. September 22, 2 | 2009-09-22 |
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
Grant 7,550,235 - Shi , et al. June 23, 2 | 2009-06-23 |
Method for performing transmission tuning of a mask pattern to improve process latitude
Grant 7,514,183 - Hsu , et al. April 7, 2 | 2009-04-07 |
Feature optimization using interference mapping lithography
Grant 7,506,299 - Socha , et al. March 17, 2 | 2009-03-17 |
Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
Grant 7,440,082 - Shi , et al. October 21, 2 | 2008-10-21 |
Method for performing full-chip manufacturing reliability checking and correction
Grant 7,434,195 - Hsu , et al. October 7, 2 | 2008-10-07 |
Eigen decomposition based OPC model
Grant 7,398,508 - Shi , et al. July 8, 2 | 2008-07-08 |
Method, program product and apparatus for generating assist features utilizing an image field map
Grant 7,376,930 - Wampler , et al. May 20, 2 | 2008-05-20 |
Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration
App 20080068668 - Shi; Xuelong ; et al. | 2008-03-20 |
Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model
Grant 7,342,646 - Shi , et al. March 11, 2 | 2008-03-11 |
Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
App 20070247610 - Shi; Xuelong ; et al. | 2007-10-25 |
Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model
Grant 7,242,459 - Shi , et al. July 10, 2 | 2007-07-10 |
Method of two dimensional feature model calibration and optimization
App 20070117030 - Laidig; Thomas ; et al. | 2007-05-24 |
Method of two dimensional feature model calibration and optimization
Grant 7,175,940 - Laidig , et al. February 13, 2 | 2007-02-13 |
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
App 20060277522 - Shi; Xuelong ; et al. | 2006-12-07 |
Automatic optical proximity correction (OPC) rule generation
Grant 7,124,395 - Shi , et al. October 17, 2 | 2006-10-17 |
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
Grant 7,100,145 - Shi , et al. August 29, 2 | 2006-08-29 |
Method for performing full-chip manufacturing reliability checking and correction
App 20060080633 - Hsu; Michael ; et al. | 2006-04-13 |
Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model
App 20050210437 - Shi, Xuelong ; et al. | 2005-09-22 |
Method for performing transmission tuning of a mask pattern to improve process latitude
App 20050196682 - Hsu, Stephen D. ; et al. | 2005-09-08 |
Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
App 20050179886 - Shi, Xuelong ; et al. | 2005-08-18 |
Eigen decomposition based OPC model
App 20050149902 - Shi, Xuelong ; et al. | 2005-07-07 |
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
App 20050142449 - Shi, Xuelong ; et al. | 2005-06-30 |
Feature optimization using interference mapping lithography
App 20050142470 - Socha, Robert John ; et al. | 2005-06-30 |
Method, program product and apparatus for generating assist features utilizing an image field map
App 20050053848 - Wampler, Kurt E. ; et al. | 2005-03-10 |
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
App 20050034096 - Shi, Xuelong ; et al. | 2005-02-10 |
Method of optical proximity correction design for contact hole mask
App 20040229133 - Socha, Robert John ; et al. | 2004-11-18 |
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
Grant 6,792,591 - Shi , et al. September 14, 2 | 2004-09-14 |
Automatic optical proximity correction (OPC) rule generation
App 20040139418 - Shi, Xuelong ; et al. | 2004-07-15 |
Method of two dimensional feature model calibration and optimization
App 20030082463 - Laidig, Thomas ; et al. | 2003-05-01 |
Method and apparatus for minimizing optical proximity effects
Grant 6,519,760 - Shi , et al. February 11, 2 | 2003-02-11 |
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
App 20020157081 - Shi, Xuelong ; et al. | 2002-10-24 |
Method and apparatus for minimizing optical proximity effects
App 20020152451 - Shi, Xuelong ; et al. | 2002-10-17 |
Photo-assisted post exposure bake for chemically amplified photoresist process
Grant 6,245,491 - Shi June 12, 2 | 2001-06-12 |
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