loadpatents
name:-0.022770881652832
name:-0.017282962799072
name:-0.0097758769989014
Sheu; Ben-Li Patent Filings

Sheu; Ben-Li

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sheu; Ben-Li.The latest application filed is for "light-emitting diode display pixels with microlens stacks over light-emitting diodes".

Company Profile
11.14.19
  • Sheu; Ben-Li - Sunnyvale CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Light-Emitting Diode Display Pixels with Microlens Stacks over Light-Emitting Diodes
App 20210391513 - Choi; Jaein ;   et al.
2021-12-16
Doping Control of Metal Nitride Films
App 20210159118 - Lakshmanan; Annamalai ;   et al.
2021-05-27
Doping control of metal nitride films
Grant 10,910,263 - Lakshmanan , et al. February 2, 2
2021-02-02
Integration of ALD copper with high temperature PVD copper deposition for BEOL interconnect
Grant 10,892,186 - Sheu , et al. January 12, 2
2021-01-12
Seed layers for copper interconnects
Grant 10,847,463 - Wu , et al. November 24, 2
2020-11-24
Apparatus And Methods For Asymmetric Deposition Of Metal On High Aspect Ratio Nanostructures
App 20200219720 - SHEU; BEN-LI ;   et al.
2020-07-09
Cobalt manganese vapor phase deposition
Grant 10,665,542 - Yu , et al.
2020-05-26
Methods for asymmetric deposition of metal on high aspect ratio nanostructures
Grant 10,636,655 - Sheu , et al.
2020-04-28
Doping Control Of Metal Nitride Films
App 20190378754 - Lakshmanan; Annamalai ;   et al.
2019-12-12
Doping control of metal nitride films
Grant 10,431,493 - Lakshmanan , et al. O
2019-10-01
Apparatus And Methods For Asymmetric Deposition Of Metal On High Aspect Ratio Nanostructures
App 20190287791 - SHEU; BEN-LI ;   et al.
2019-09-19
Precursors of manganese and manganese-based compounds for copper diffusion barrier layers and methods of use
Grant 10,283,352 - Liu , et al.
2019-05-07
Integration Of ALD Copper With High Temperature PVD Copper Deposition For BEOL Interconnect
App 20190115254 - Sheu; Ben-Li ;   et al.
2019-04-18
Seed Layers For Copper Interconnects
App 20190067201 - WU; Zhiyuan ;   et al.
2019-02-28
Doping Control of Metal Nitride Films
App 20180277428 - Lakshmanan; Annamalai ;   et al.
2018-09-27
Cobalt Manganese Vapor Phase Deposition
App 20180240755 - Yu; Sang Ho ;   et al.
2018-08-23
Precursors Of Manganese And Manganese-Based Compounds For Copper Diffusion Barrier Layers And Methods Of Use
App 20180204721 - Liu; Feng Q. ;   et al.
2018-07-19
Doping control of metal nitride films
Grant 10,008,412 - Lakshmanan , et al. June 26, 2
2018-06-26
Methods of depositing cobalt manganese films
Grant 9,953,926 - Yu , et al. April 24, 2
2018-04-24
Precursors of manganese and manganese-based compounds for copper diffusion barrier layers and methods of use
Grant 9,916,975 - Liu , et al. March 13, 2
2018-03-13
Doping Control of Metal Nitride Films
App 20170256448 - Lakshmanan; Annamalai ;   et al.
2017-09-07
Doping control of metal nitride films
Grant 9,659,814 - Lakshmanan , et al. May 23, 2
2017-05-23
Precursors Of Manganese And Manganese-Based Compounds For Copper Diffusion Barrier Layers And Methods Of Use
App 20160181150 - Liu; Feng Q. ;   et al.
2016-06-23
High Through-put And Low Temperature Ald Copper Deposition And Integration
App 20160032455 - Liu; Feng Q. ;   et al.
2016-02-04
Cobalt Manganese Vapor Phase Deposition
App 20150194384 - Yu; Sang Ho ;   et al.
2015-07-09
Doping Control of Metal Nitride Films
App 20140220772 - Lakshmanan; Annamalai ;   et al.
2014-08-07
Wiggling control for pseudo-hardmask
Grant 8,470,126 - Sheu , et al. June 25, 2
2013-06-25
Wiggling Control For Pseudo-hardmask
App 20130020026 - Sheu; Ben-Li ;   et al.
2013-01-24
Method for reducing line width roughness with plasma pre-etch treatment on photoresist
Grant 8,329,585 - Sheu , et al. December 11, 2
2012-12-11
Wiggling control for pseudo-hardmask
Grant 8,304,262 - Sheu , et al. November 6, 2
2012-11-06
Wiggling Control For Pseudo-hardmask
App 20120214310 - Sheu; Ben-Li ;   et al.
2012-08-23
Method For Reducing Line Width Roughness With Plasma Pre-etch Treatment On Photoresist
App 20110117749 - SHEU; Ben-Li ;   et al.
2011-05-19

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