loadpatents
Patent applications and USPTO patent grants for Shero; Eric J..The latest application filed is for "tritertbutyl aluminum reactants for vapor deposition".
Patent | Date |
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Tritertbutyl aluminum reactants for vapor deposition Grant 10,875,774 - Shero , et al. December 29, 2 | 2020-12-29 |
Tritertbutyl Aluminum Reactants For Vapor Deposition App 20200123013 - Shero; Eric J. ;   et al. | 2020-04-23 |
Tritertbutyl aluminum reactants for vapor deposition Grant 10,556,799 - Shero , et al. Feb | 2020-02-11 |
Tritertbutyl Aluminum Reactants For Vapor Deposition App 20180339907 - Shero; Eric J. ;   et al. | 2018-11-29 |
Tritertbutyl aluminum reactants for vapor deposition Grant 10,118,828 - Shero , et al. November 6, 2 | 2018-11-06 |
Tritertbutyl Aluminum Reactants For Vapor Deposition App 20170096345 - Shero; Eric J. ;   et al. | 2017-04-06 |
High concentration water pulses for atomic layer deposition Grant 9,117,773 - Shero , et al. August 25, 2 | 2015-08-25 |
Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species Grant 8,877,655 - Shero , et al. November 4, 2 | 2014-11-04 |
Method for minimizing contamination in semiconductor processing chamber Grant 8,759,226 - Reed , et al. June 24, 2 | 2014-06-24 |
Method For Minimizing Contamination In Semiconductor Processing Chamber App 20130004288 - Reed; Joseph C. ;   et al. | 2013-01-03 |
Method and apparatus for minimizing contamination in semiconductor processing chamber Grant 8,287,648 - Reed , et al. October 16, 2 | 2012-10-16 |
Systems And Methods For Thin-film Deposition Of Metal Oxides Using Excited Nitrogen-oxygen Species App 20110275166 - Shero; Eric J. ;   et al. | 2011-11-10 |
Reactor surface passivation through chemical deactivation Grant 7,914,847 - Verghese , et al. March 29, 2 | 2011-03-29 |
High Concentration Water Pulses For Atomic Layer Deposition App 20110053383 - Shero; Eric J. ;   et al. | 2011-03-03 |
Method And Apparatus For Growing A Thin Film Onto A Substrate App 20100266765 - White; Carl L. ;   et al. | 2010-10-21 |
Reactor surface passivation through chemical deactivation Grant 7,799,135 - Verghese , et al. September 21, 2 | 2010-09-21 |
ALD of metal silicate films Grant 7,795,160 - Wang , et al. September 14, 2 | 2010-09-14 |
Integration of high k gate dielectric Grant 7,790,556 - Pomarede , et al. September 7, 2 | 2010-09-07 |
Method And Apparatus For Minimizing Contamination In Semiconductor Processing Chamber App 20100202860 - Reed; Joseph C. ;   et al. | 2010-08-12 |
Reactant source vessel Grant D614,153 - Fondurulia , et al. April 20, 2 | 2010-04-20 |
Incorporation of nitrogen into high k dielectric film Grant 7,569,284 - Shero , et al. August 4, 2 | 2009-08-04 |
Surface preparation prior to deposition Grant 7,476,627 - Pomarede , et al. January 13, 2 | 2009-01-13 |
Incorporation Of Nitrogen Into High K Dielectric Film App 20080286589 - Shero; Eric J. ;   et al. | 2008-11-20 |
Incorporation of nitrogen into high k dielectric film Grant 7,405,453 - Shero , et al. July 29, 2 | 2008-07-29 |
ALD of metal silicate films App 20080020593 - Wang; Chang-gong ;   et al. | 2008-01-24 |
Valve Failure Detection App 20070269596 - Shero; Eric J. ;   et al. | 2007-11-22 |
Reactor Surface Passivation Through Chemical Deactivation App 20070098894 - Verghese; Mohith ;   et al. | 2007-05-03 |
Reactor Surface Passivation Through Chemical Deactivation App 20070084404 - Verghese; Mohith ;   et al. | 2007-04-19 |
Sublimation bed employing carrier gas guidance structures Grant 7,122,085 - Shero , et al. October 17, 2 | 2006-10-17 |
Reactor surface passivation through chemical deactivation Grant 7,118,779 - Verghese , et al. October 10, 2 | 2006-10-10 |
Sublimation bed employing carrier gas guidance structures App 20060216419 - Shero; Eric J. ;   et al. | 2006-09-28 |
Surface preparation prior to deposition App 20060205230 - Pomarede; Christophe F. ;   et al. | 2006-09-14 |
Surface preparation prior to deposition Grant 7,056,835 - Pomarede , et al. June 6, 2 | 2006-06-06 |
Integration of high k gate dielectric Grant 7,026,219 - Pomarede , et al. April 11, 2 | 2006-04-11 |
Reduced cross-contamination between chambers in a semiconductor processing tool Grant 7,022,613 - Pomarede , et al. April 4, 2 | 2006-04-04 |
Reaction system for growing a thin film Grant 7,020,981 - Shero , et al. April 4, 2 | 2006-04-04 |
Reaction system for growing a thin film App 20050241176 - Shero, Eric J. ;   et al. | 2005-11-03 |
Incorporation of nitrogen into high k dielectric film Grant 6,960,537 - Shero , et al. November 1, 2 | 2005-11-01 |
Surface preparation prior to deposition Grant 6,958,277 - Pomarede , et al. October 25, 2 | 2005-10-25 |
Integration of high k gate dielectric App 20050233529 - Pomarede, Christophe F. ;   et al. | 2005-10-20 |
Incorporation of nitrogen into high k dielectric film App 20050212119 - Shero, Eric J. ;   et al. | 2005-09-29 |
Sublimation bed employing carrier gas guidance structures App 20050072357 - Shero, Eric J. ;   et al. | 2005-04-07 |
Method and apparatus for vaporizing and delivering reactant App 20050000428 - Shero, Eric J. ;   et al. | 2005-01-06 |
Reactor surface passivation through chemical deactivation App 20040221807 - Verghese, Mohith ;   et al. | 2004-11-11 |
Reduced cross-contamination between chambers in a semiconductor processing tool Grant 6,797,617 - Pomarede , et al. September 28, 2 | 2004-09-28 |
Reduced cross-contamination between chambers in a semiconductor processing tool App 20040166683 - Pomarede, Christophe ;   et al. | 2004-08-26 |
Surface preparation prior to deposition App 20040147101 - Pomarede, Christophe F. ;   et al. | 2004-07-29 |
Surface preparation prior to deposition App 20040121620 - Pomarede, Christophe F. ;   et al. | 2004-06-24 |
Reduced cross-contamination between chambers in a semiconductor processing tool App 20030219977 - Pomarede, Christophe ;   et al. | 2003-11-27 |
Surface preparation prior to deposition Grant 6,613,695 - Pomarede , et al. September 2, 2 | 2003-09-02 |
Incorporation of nitrogen into high k dielectric film App 20030072975 - Shero, Eric J. ;   et al. | 2003-04-17 |
Integration of High K Gate Dielectric App 20020173130 - Pomerede , Christophe F. ;   et al. | 2002-11-21 |
Surface preparation prior to deposition App 20020098627 - Pomarede, Christophe F. ;   et al. | 2002-07-25 |
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