loadpatents
name:-0.00062394142150879
name:-0.034379959106445
name:-0.00052809715270996
Shepard; Joseph F. Patent Filings

Shepard; Joseph F.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shepard; Joseph F..The latest application filed is for "shallow trench isolation with self aligned psg layer".

Company Profile
0.30.0
  • Shepard; Joseph F. - Hopewell Junction NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Shallow trench isolation with self aligned PSG layer
Grant 5,729,043 - Shepard March 17, 1
1998-03-17
Packing density for flash memories
Grant 5,622,881 - Acocella , et al. April 22, 1
1997-04-22
Shallow trench isolation with self aligned PSG layer
Grant 5,616,513 - Shepard April 1, 1
1997-04-01
Method of making thin film transistor with a self-aligned bottom gate using diffusion from a dopant source layer
Grant 5,573,964 - Hsu , et al. November 12, 1
1996-11-12
Isolation structure using liquid phase oxide deposition
Grant 5,516,721 - Galli , et al. May 14, 1
1996-05-14
Method of making a DRAM cell with trench capacitor
Grant 5,395,786 - Hsu , et al. March 7, 1
1995-03-07
Method of forming integrated interconnect for very high density DRAMs
Grant 5,389,559 - Hsieh , et al. February 14, 1
1995-02-14
Method for forming a DRAM trench cell capacitor having a strap connection
Grant 5,384,277 - Hsu , et al. January 24, 1
1995-01-24
Method for forming capacitors with roughened single crystal plates
Grant 5,384,152 - Chu , et al. January 24, 1
1995-01-24
Semiconductor device and wafer structure having a planar buried interconnect by wafer bonding
Grant 5,382,832 - Buti , et al. January 17, 1
1995-01-17
Method of fabricating a semiconductor device with raised diffusions and isolation
Grant 5,376,578 - Hsu , et al. December 27, 1
1994-12-27
Method for thinning SOI films having improved thickness uniformity
Grant 5,318,663 - Buti , et al. June 7, 1
1994-06-07
Semiconductor device and wafer structure having a planar buried interconnect by wafer bonding
Grant 5,260,233 - Buti , et al. November 9, 1
1993-11-09
Capacitors with roughened single crystal plates
Grant 5,245,206 - Chu , et al. September 14, 1
1993-09-14
Inverse T-gate FET transistor with lightly doped source and drain region
Grant 5,241,203 - Hsu , et al. August 31, 1
1993-08-31
Method of forming an inverse T-gate FET transistor
Grant 5,120,668 - Hsu , et al. June 9, 1
1992-06-09
High performance sidewall emitter transistor
Grant 4,916,083 - Monkowski , et al. April 10, 1
1990-04-10
Mask using lithographic image size reduction
Grant 4,871,630 - Giammarco , et al. October 3, 1
1989-10-03
Lithographic image size reduction
Grant 4,707,218 - Giammarco , et al. November 17, 1
1987-11-17
Method for making submicron mask openings using sidewall and lift-off techniques
Grant 4,654,119 - Cook , et al. March 31, 1
1987-03-31
Self-aligned lateral bipolar transistors
Grant 4,641,170 - Ogura , et al. February 3, 1
1987-02-03
Submicron FET structure and method of making
Grant 4,636,834 - Shepard January 13, 1
1987-01-13
Method for forming recessed isolated regions
Grant 4,506,435 - Pliskin , et al. March 26, 1
1985-03-26
Method of making dense vertical FET's
Grant 4,407,058 - Fatula, Jr. , et al. October 4, 1
1983-10-04
Formation of bit lines for ram device
Grant 4,403,394 - Shepard , et al. September 13, 1
1983-09-13
Method of manufacturing a metal-insulator-semiconductor device utilizing a graded deposition of polycrystalline silicon
Grant 4,354,309 - Gardiner , et al. October 19, 1
1982-10-19
Method for making an electrical contact to a silicon substrate through a relatively thin layer of silicon dioxide on the surface of the substrate
Grant 4,341,009 - Bartholomew , et al. July 27, 1
1982-07-27
Method for forming semiconductor structure with improved isolation between two layers of polycrystalline silicon
Grant 4,251,571 - Garbarino , et al. February 17, 1
1981-02-17
Method of manufacturing a metal-insulator-semiconductor utilizing a multiple stage deposition of polycrystalline layers
Grant 4,249,968 - Gardiner , et al. February 10, 1
1981-02-10
Making semiconductor structure with improved phosphosilicate glass isolation
Grant 4,191,603 - Garbarino , et al. March 4, 1
1980-03-04

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed