| Patent | Date |
|---|
Method for Improved Critical Dimension Uniformity in a Semiconductor Device Fabrication Process
App 20220223428 - Hung; Chi-Cheng ; et al. | 2022-07-14 |
Fine Line Patterning Methods
App 20220157605 - HUANG; Shih-Chun ; et al. | 2022-05-19 |
System And Method For Multiple Step Directional Patterning
App 20220102139 - YANG; Chih-Kai ; et al. | 2022-03-31 |
Etch Apparatus For Compensating Shifted Overlayers
App 20220102118 - Chang; Chun-Yen ; et al. | 2022-03-31 |
Directional processing to remove a layer or a material formed over a substrate
Grant 11,289,332 - Huang , et al. March 29, 2 | 2022-03-29 |
Method for improved critical dimension uniformity in a semiconductor device fabrication process
Grant 11,289,338 - Hung , et al. March 29, 2 | 2022-03-29 |
Fine line patterning methods
Grant 11,239,078 - Huang , et al. February 1, 2 | 2022-02-01 |
Method Of Manufacturing Semiconductor Devices Using Directional Process
App 20210375639 - YEH; Ya-Wen ; et al. | 2021-12-02 |
Directional Deposition for Semiconductor Fabrication
App 20210358752 - Huang; Shih-Chun ; et al. | 2021-11-18 |
Pattern fidelity enhancement with directional patterning technology
Grant 11,158,509 - Shen , et al. October 26, 2 | 2021-10-26 |
Method OF FORMING METAL FEATURES
App 20210272807 - Chang; Po-Chin ; et al. | 2021-09-02 |
Method of manufacturing semiconductor devices using directional process
Grant 11,094,556 - Yeh , et al. August 17, 2 | 2021-08-17 |
Directional deposition for semiconductor fabrication
Grant 11,075,079 - Huang , et al. July 27, 2 | 2021-07-27 |
Directional patterning method
Grant 11,043,381 - Chang , et al. June 22, 2 | 2021-06-22 |
Pattern Fidelity Enhancement
App 20210118674 - Shen; Yu-Tien ; et al. | 2021-04-22 |
Method Of Manufacturing Semiconductor Devices
App 20210096473 - LIU; Ru-Gun ; et al. | 2021-04-01 |
Pattern fidelity enhancement
Grant 10,861,698 - Shen , et al. December 8, 2 | 2020-12-08 |
Method for Improved Critical Dimension Uniformity in a Semiconductor Device Fabrication Process
App 20200343097 - Hung; Chi-Cheng ; et al. | 2020-10-29 |
Fine Line Patterning Methods
App 20200335340 - HUANG; Shih-Chun ; et al. | 2020-10-22 |
Pattern Fidelity Enhancement with Directional Patterning Technology
App 20200279743 - Shen; Yu-Tien ; et al. | 2020-09-03 |
Directional Patterning Method
App 20200243336 - Chang; Po-Chin ; et al. | 2020-07-30 |
Methods for improved critical dimension uniformity in a semiconductor device fabrication process
Grant 10,714,357 - Hung , et al. | 2020-07-14 |
Fine line patterning methods
Grant 10,707,081 - Huang , et al. | 2020-07-07 |
Pattern fidelity enhancement with directional patterning technology
Grant 10,658,184 - Shen , et al. | 2020-05-19 |
Method Of Manufacturing Semiconductor Devices Using Directional Process
App 20200006085 - YEH; Ya-Wen ; et al. | 2020-01-02 |
Directional Processing To Remove A Layer Or A Material Formed Over A Substrate
App 20190341254 - HUANG; Shih-Chun ; et al. | 2019-11-07 |
Directional processing to remove a layer or a material formed over a substrate
Grant 10,354,874 - Huang , et al. July 16, 2 | 2019-07-16 |
Method Of Patterning
App 20190164772 - TSENG; Chin-Yuan ; et al. | 2019-05-30 |
Directional Deposition for Semiconductor Fabrication
App 20190157084 - Huang; Shih-Chun ; et al. | 2019-05-23 |
Directional Processing To Remove A Layer Or A Material Formed Over A Substrate
App 20190148145 - Huang; Shih-Chun ; et al. | 2019-05-16 |
Fine Line Patterning Methods
App 20190148147 - Huang; Shih-Chun ; et al. | 2019-05-16 |
Pattern Fidelity Enhancement
App 20190067000 - Shen; Yu-Tien ; et al. | 2019-02-28 |
Methods for Improved Critical Dimension Uniformity in a Semiconductor Device Fabrication Process
App 20180330960 - Hung; Chi-Cheng ; et al. | 2018-11-15 |
Methods for improved critical dimension uniformity in a semiconductor device fabrication process
Grant 10,032,639 - Hung , et al. July 24, 2 | 2018-07-24 |
Pattern Fidelity Enhancement with Directional Patterning Technology
App 20180174853 - Shen; Yu-Tien ; et al. | 2018-06-21 |
Methods For Improved Critical Dimension Uniformity In A Semiconductor Device Fabrication Process
App 20170345670 - Hung; Chi-Cheng ; et al. | 2017-11-30 |
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