loadpatents
name:-0.0075070858001709
name:-0.014955043792725
name:-0.00055313110351562
SHEALY; James R. Patent Filings

SHEALY; James R.

Patent Applications and Registrations

Patent applications and USPTO patent grants for SHEALY; James R..The latest application filed is for "vertical field effect transistor device and method of fabrication".

Company Profile
0.16.7
  • SHEALY; James R. - Ithaca NY
  • Shealy; James R. - Clifton Park NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Vertical Field Effect Transistor Device And Method Of Fabrication
App 20220140130 - SHEALY; James R. ;   et al.
2022-05-05
Vertical field effect transistor device and method of fabrication
Grant 11,251,295 - Shealy , et al. February 15, 2
2022-02-15
Method for forming III-V semiconductor structures including aluminum-silicon nitride passivation
Grant 9,991,360 - Shealy , et al. June 5, 2
2018-06-05
III-V semiconductor structures including aluminum-silicon nitride passivation
Grant 9,306,050 - Shealy , et al. April 5, 2
2016-04-05
Gated III-V semiconductor structure and method
Grant 9,299,821 - Shealy , et al. March 29, 2
2016-03-29
Chemical vapor deposition process for aluminum silicon nitride
Grant 8,791,034 - Shealy , et al. July 29, 2
2014-07-29
Gated Iii-v Semiconductor Structure And Method
App 20130153963 - Shealy; James R. ;   et al.
2013-06-20
Method For Forming Iii-v Semiconductor Structures Including Aluminum-silicon Nitride Passivation
App 20120156836 - Shealy; James R. ;   et al.
2012-06-21
Iii-v Semiconductor Structures Including Aluminum-silicon Nitride Passivation
App 20120153301 - Shealy; James R. ;   et al.
2012-06-21
Chemical Vapor Deposition Process For Aluminum Silicon Nitride
App 20120156895 - Shealy; James R. ;   et al.
2012-06-21
Single step, high temperature nucleation process for a lattice mismatched substrate
Grant 7,250,360 - Shealy , et al. July 31, 2
2007-07-31
Single step, high temperature nucleation process for a lattice mismatched substrate
App 20060199364 - Shealy; James R. ;   et al.
2006-09-07
Single step process for epitaxial lateral overgrowth of nitride based materials
Grant 6,478,871 - Shealy , et al. November 12, 2
2002-11-12
Process for synthesis of cubic GaN on GaAs using NH.sub.3 in an RF plasma process
Grant 5,834,379 - Shealy , et al. November 10, 1
1998-11-10
High power (1,4 W)AlGaInP graded-index separate confinement heterostructure visible (.lambda.-658 nm) laser
Grant 5,003,548 - Bour , et al. March 26, 1
1991-03-26
Method and apparatus for improved gettering for reactant gases
Grant 4,564,509 - Shealy , et al. January 14, 1
1986-01-14
Vertical channel field effect transistor
Grant 4,343,015 - Baliga , et al. August 3, 1
1982-08-03
Vertical field effect transistor with improved gate and channel structure
Grant 4,262,296 - Shealy , et al. April 14, 1
1981-04-14

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