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name:-0.011330127716064
name:-0.0050210952758789
name:-0.0012741088867188
SHANGHAI INTEGRATED CIRCUIT RESEARCH AND DEVELOPMENT CENTER CO. LTD. Patent Filings

SHANGHAI INTEGRATED CIRCUIT RESEARCH AND DEVELOPMENT CENTER CO. LTD.

Patent Applications and Registrations

Patent applications and USPTO patent grants for SHANGHAI INTEGRATED CIRCUIT RESEARCH AND DEVELOPMENT CENTER CO. LTD..The latest application filed is for "method of fabricating pmos devices with embedded sige".

Company Profile
0.1.6
  • SHANGHAI INTEGRATED CIRCUIT RESEARCH AND DEVELOPMENT CENTER CO. LTD. - Shanghai CN
  • SHANGHAI INTEGRATED CIRCUIT RESEARCH AND DEVELOPMENT CENTER CO., LTD. - Shanghai Shanghai CN
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method Of Fabricating Pmos Devices With Embedded Sige
App 20170213897 - ZENG; Shaohai ;   et al.
2017-07-27
Method for processing an electroplated copper film in copper interconnect process
Grant 9,640,434 - Lin May 2, 2
2017-05-02
Method For Exposing Polysilicon Gates
App 20170084466 - Lin; Hong
2017-03-23
Image Sensor And Data Tranmission Method Thereof
App 20160316165 - Li; Chen ;   et al.
2016-10-27
Capacitive Silicon Microphone And Fabrication Method Thereof
App 20160286317 - Zhao; Yuhang ;   et al.
2016-09-29
Method For Processing An Electroplated Copper Film In Copper Interconnect Process
App 20160247717 - Lin; Hong
2016-08-25
Method For Repairing Damages To Sidewalls Of An Ultra-low Dielectric Constant Film
App 20150340227 - Zeng; Shaohai ;   et al.
2015-11-26

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