loadpatents
Patent applications and USPTO patent grants for Shamouilian; Shamouil.The latest application filed is for "abatement of fluorine gas from effluent".
Patent | Date |
---|---|
In situ application of etch back for improved deposition into high-aspect-ratio features Grant 7,399,707 - Krishnaraj , et al. July 15, 2 | 2008-07-15 |
Multi-core transformer plasma source Grant 7,363,876 - Lai , et al. April 29, 2 | 2008-04-29 |
Abatement of fluorine gas from effluent App 20070022958 - Shamouilian; Shamouil ;   et al. | 2007-02-01 |
In situ application of etch back for improved deposition into high-aspect-ratio features App 20050124166 - Krishnaraj, Padmanabhan ;   et al. | 2005-06-09 |
In situ application of etch back for improved deposition into high-aspect-ratio features Grant 6,869,880 - Krishnaraj , et al. March 22, 2 | 2005-03-22 |
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas Grant 6,863,019 - Shamouilian , et al. March 8, 2 | 2005-03-08 |
Heated catalytic treatment of an effluent gas from a substrate fabrication process Grant 6,824,748 - Kaushal , et al. November 30, 2 | 2004-11-30 |
Multi-core transformer plasma source App 20040226658 - Lai, Canfeng ;   et al. | 2004-11-18 |
Multi-core transformer plasma source App 20040226511 - Lai, Canfeng ;   et al. | 2004-11-18 |
Multi-core transformer plasma source App 20040226512 - Lai, Canfeng ;   et al. | 2004-11-18 |
Electrostatic chuck having dielectric member with stacked layers and manufacture App 20040190215 - Weldon, Edwin C. ;   et al. | 2004-09-30 |
Multi-core transformer plasma source App 20040182517 - Lai, Canfeng ;   et al. | 2004-09-23 |
Multi-core transformer plasma source App 20040185610 - Lai, Canfeng ;   et al. | 2004-09-23 |
Multi-core transformer plasma source Grant 6,755,150 - Lai , et al. June 29, 2 | 2004-06-29 |
Ceramic substrate support Grant 6,730,175 - Yudovsky , et al. May 4, 2 | 2004-05-04 |
RF power delivery for plasma processing using modulated power signal Grant 6,726,804 - Wang , et al. April 27, 2 | 2004-04-27 |
Electrostatic chuck having composite dielectric layer and method of manufacture Grant 6,721,162 - Weldon , et al. April 13, 2 | 2004-04-13 |
Toroidal plasma source for plasma processing Grant 6,712,020 - Cox , et al. March 30, 2 | 2004-03-30 |
Abatement of hazardous gases in effluent Grant 6,689,252 - Shamouilian , et al. February 10, 2 | 2004-02-10 |
Process chamber having a corrosion-resistant wall and method Grant 6,682,627 - Shamouilian , et al. January 27, 2 | 2004-01-27 |
Treatment of hazardous gases in effluent Grant 6,673,323 - Bhatnagar , et al. January 6, 2 | 2004-01-06 |
Multi-layer ceramic electrostatic chuck with integrated channel Grant 6,639,783 - Shamouilian , et al. October 28, 2 | 2003-10-28 |
Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment Grant 6,635,144 - Cui , et al. October 21, 2 | 2003-10-21 |
Ceramic substrate support App 20030136520 - Yudovsky, Joseph ;   et al. | 2003-07-24 |
In situ application of etch back for improved deposition into high-aspect-ratio features App 20030136332 - Krishnaraj, Padmanabhan ;   et al. | 2003-07-24 |
Fabricating an electrostatic chuck having plasma resistant gas conduits Grant 6,581,275 - Narendrnath , et al. June 24, 2 | 2003-06-24 |
Multi-core transformer plasma source App 20030085205 - Lai, Canfeng ;   et al. | 2003-05-08 |
Method of fabricating an electrostatic chuck Grant 6,557,248 - Shamouilian , et al. May 6, 2 | 2003-05-06 |
Process chamber having a corrosion-resistant wall and method App 20030056897 - Shamouilian, Shamouil ;   et al. | 2003-03-27 |
Electrostatic chuck having heater and method Grant 6,538,872 - Wang , et al. March 25, 2 | 2003-03-25 |
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas App 20030036272 - Shamouilian, Shamouil ;   et al. | 2003-02-20 |
Substrate support having bonded sections and method Grant 6,503,368 - Kholodenko , et al. January 7, 2 | 2003-01-07 |
Abatement of fluorine gas from effluent App 20020192129 - Shamouilian, Shamouil ;   et al. | 2002-12-19 |
Plasma chamber support with coupled electrode Grant 6,494,958 - Shamouilian , et al. December 17, 2 | 2002-12-17 |
Heated catalytic treatment of an effluent gas from a substrate fabrication process App 20020182131 - Kaushal, Tony S. ;   et al. | 2002-12-05 |
Support for supporting a substrate in a process chamber Grant 6,490,144 - Narendrnath , et al. December 3, 2 | 2002-12-03 |
Electrostatic chuck bonded to base with a bond layer and method Grant 6,490,146 - Wang , et al. December 3, 2 | 2002-12-03 |
Plasma chamber support having dual electrodes Grant 6,478,924 - Shamouilian , et al. November 12, 2 | 2002-11-12 |
Toroidal plasma source for plasma processing App 20020157793 - Cox, Michael S. ;   et al. | 2002-10-31 |
Abatement of fluorine gas from effluent Grant 6,468,490 - Shamouilian , et al. October 22, 2 | 2002-10-22 |
Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment App 20020151186 - Cui, Zhenjiang ;   et al. | 2002-10-17 |
Electrostatic chuck having improved electrical connector and method Grant 6,462,928 - Shamouilian , et al. October 8, 2 | 2002-10-08 |
Electrostatic chuck having composite dielectric layer and method of manufacture App 20020135969 - Weldon, Edwin C. ;   et al. | 2002-09-26 |
Process chamber having improved temperature control Grant 6,440,221 - Shamouilian , et al. August 27, 2 | 2002-08-27 |
Method and apparatus for supplying electricity uniformly to a workpiece Grant 6,432,282 - Shamouilian , et al. August 13, 2 | 2002-08-13 |
RF power delivery for plasma processing using modulated power signal App 20020096257 - Wang, Liang-Guo ;   et al. | 2002-07-25 |
Fabricating an electrostatic chuck having plasma resistant gas conduits App 20020095782 - Narendrnath, Kadthala R. ;   et al. | 2002-07-25 |
Toroidal plasma source for plasma processing Grant 6,418,874 - Cox , et al. July 16, 2 | 2002-07-16 |
Electrostatic chuck bonded to base with a bond layer and method App 20020075624 - Wang, You ;   et al. | 2002-06-20 |
Method and apparatus for supplying electricity uniformly to a workpiece App 20020066664 - Shamouilian, Shamouil ;   et al. | 2002-06-06 |
Erosion resistant gas energizer Grant 6,391,146 - Bhatnagar , et al. May 21, 2 | 2002-05-21 |
Porous ceramic liner for a plasma source Grant 6,367,412 - Ramaswamy , et al. April 9, 2 | 2002-04-09 |
Electrostatic Chuck Having Composite Base And Method App 20020036881 - SHAMOUILIAN, SHAMOUIL ;   et al. | 2002-03-28 |
Process Chamber Having Improved Temperature Control App 20010042594 - SHAMOUILIAN, SHAMOUIL ;   et al. | 2001-11-22 |
Chuck having pressurized zones of heat transfer gas Grant 6,320,736 - Shamouilian , et al. November 20, 2 | 2001-11-20 |
Electrostatic chuck having gas cavity and method Grant 6,310,755 - Kholodenko , et al. October 30, 2 | 2001-10-30 |
Compliant bond structure for joining ceramic to metal Grant 6,280,584 - Kumar , et al. August 28, 2 | 2001-08-28 |
Electrostatic chuck with improved temperature control and puncture resistance Grant 6,278,600 - Shamouilian , et al. August 21, 2 | 2001-08-21 |
Substrate support for plasma processing Grant 6,273,958 - Shamouilian , et al. August 14, 2 | 2001-08-14 |
Substrate Support For Plasma Processing App 20010003298 - SHAMOUILIAN, SHAMOUIL ;   et al. | 2001-06-14 |
Connectors for an electrostatic chuck and combination thereof Grant 6,151,203 - Shamouilian , et al. November 21, 2 | 2000-11-21 |
Electrostatic chuck having improved gas conduits Grant 6,108,189 - Weldon , et al. August 22, 2 | 2000-08-22 |
High density plasma process chamber Grant 6,095,084 - Shamouilian , et al. August 1, 2 | 2000-08-01 |
Polymer chuck with heater and method of manufacture Grant 6,094,334 - Bedi , et al. July 25, 2 | 2000-07-25 |
Multi-electrode electrostatic chuck having fuses in hollow cavities Grant 6,055,150 - Clinton , et al. April 25, 2 | 2000-04-25 |
Electrostatic chuck with improved erosion resistance Grant 6,023,405 - Shamouilian , et al. February 8, 2 | 2000-02-08 |
Method of forming an electrostatic chuck suitable for magnetic flux processing Grant 5,996,218 - Shamouilian , et al. December 7, 1 | 1999-12-07 |
Puncture resistant electrostatic chuck Grant 5,986,875 - Donde , et al. November 16, 1 | 1999-11-16 |
Electrostatic chuck with fluid flow regulator Grant 5,883,778 - Sherstinsky , et al. March 16, 1 | 1999-03-16 |
Electrostatic chuck capable of rapidly dechucking a substrate Grant 5,880,924 - Kumar , et al. March 9, 1 | 1999-03-09 |
Electrostatic chuck with improved erosion resistance Grant 5,822,171 - Shamouilian , et al. October 13, 1 | 1998-10-13 |
Electrostatic chuck having a unidirectionally conducting coupler layer Grant 5,801,915 - Kholodenko , et al. September 1, 1 | 1998-09-01 |
Method of making electrostatic chuck with conformal insulator film Grant 5,753,132 - Shamouilian , et al. May 19, 1 | 1998-05-19 |
Multielectrode electrostatic chuck with fuses Grant 5,751,537 - Kumar , et al. May 12, 1 | 1998-05-12 |
Electrostatic chuck with conformal insulator film Grant 5,745,331 - Shamouilian , et al. April 28, 1 | 1998-04-28 |
Puncture resistant electrostatic chuck Grant 5,729,423 - Donde , et al. March 17, 1 | 1998-03-17 |
Electrostatic chuck Grant 5,671,117 - Sherstinsky , et al. September 23, 1 | 1997-09-23 |
Multi-electrode electrostatic chuck Grant 5,646,814 - Shamouilian , et al. July 8, 1 | 1997-07-08 |
Method of making a dielectric chuck Grant 5,634,266 - Sherstinsky , et al. June 3, 1 | 1997-06-03 |
Electrostatic chuck having improved erosion resistance Grant 5,606,485 - Shamouilian , et al. February 25, 1 | 1997-02-25 |
Electrostatic chuck for magnetic flux processing Grant 5,592,358 - Shamouilian , et al. January 7, 1 | 1997-01-07 |
Chemical-mechanical polishing pad providing polishing unformity Grant 5,533,923 - Shamouilian , et al. July 9, 1 | 1996-07-09 |
Corrosion resistant electrostatic chuck Grant 5,486,975 - Shamouilian , et al. January 23, 1 | 1996-01-23 |
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