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Tin Oxide Films In Semiconductor Device Manufacturing
App 20220270877 - Yu; Jengyi ; et al. | 2022-08-25 |
Extreme Ultraviolet (euv) Lithography Using An Intervening Layer Or A Multi-layer Stack With Varying Mean Free Paths For Secondary Electron Generation
App 20220197147 - LIANG; Andrew ; et al. | 2022-06-23 |
Tin Oxide Films In Semiconductor Device Manufacturing
App 20220165571 - Yu; Jengyi ; et al. | 2022-05-26 |
Tin oxide films in semiconductor device manufacturing
Grant 11,322,351 - Yu , et al. May 3, 2 | 2022-05-03 |
Eliminating Yield Impact Of Stochastics In Lithography
App 20220122846 - Shamma; Nader ; et al. | 2022-04-21 |
Eliminating yield impact of stochastics in lithography
Grant 11,257,674 - Shamma , et al. February 22, 2 | 2022-02-22 |
Tin Oxide Films In Semiconductor Device Manufacturing
App 20210265163 - Yu; Jengyi ; et al. | 2021-08-26 |
Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer program
Grant 11,048,174 - Kubis , et al. June 29, 2 | 2021-06-29 |
Modification of SNO.sub.2 surface for EUV lithography
Grant 11,031,244 - Singhal , et al. June 8, 2 | 2021-06-08 |
Eliminating Yield Impact Of Stochastics In Lithography
App 20200402801 - Shamma; Nader ; et al. | 2020-12-24 |
Eliminating yield impact of stochastics in lithography
Grant 10,796,912 - Shamma , et al. October 6, 2 | 2020-10-06 |
Method Of Controlling A Patterning Process, Lithographic Apparatus, Metrology Apparatus Lithographic Cell And Associated Compute
App 20200233311 - KUBIS; Michael ; et al. | 2020-07-23 |
Etching substrates using ALE and selective deposition
Grant 10,685,836 - Tan , et al. | 2020-06-16 |
Tin Oxide Films In Semiconductor Device Manufacturing
App 20200083044 - Yu; Jengyi ; et al. | 2020-03-12 |
Modification Of Sno2 Surface For Euv Lithography
App 20200058492 - Singhal; Akhil ; et al. | 2020-02-20 |
Tin oxide films in semiconductor device manufacturing
Grant 10,546,748 - Yu , et al. Ja | 2020-01-28 |
Low roughness EUV lithography
Grant 10,438,807 - Wise , et al. O | 2019-10-08 |
Etching Substrates Using Ale And Selective Deposition
App 20190244805 - Tan; Samantha ; et al. | 2019-08-08 |
Etching substrates using ale and selective deposition
Grant 10,269,566 - Tan , et al. | 2019-04-23 |
Soft landing nanolaminates for advanced patterning
Grant 10,192,742 - Pasquale , et al. Ja | 2019-01-29 |
Image reversal with AHM gap fill for multiple patterning
Grant 10,192,759 - Shamma , et al. Ja | 2019-01-29 |
Eliminating Yield Impact Of Stochastics In Lithography
App 20180337046 - Shamma; Nader ; et al. | 2018-11-22 |
Tin Oxide Films In Semiconductor Device Manufacturing
App 20180240667 - Yu; Jengyi ; et al. | 2018-08-23 |
Low Roughness Euv Lithography
App 20180190503 - Wise; Richard ; et al. | 2018-07-05 |
Soft Landing Nanolaminates For Advanced Patterning
App 20180158683 - Pasquale; Frank L. ; et al. | 2018-06-07 |
Low roughness EUV lithography
Grant 9,922,839 - Wise , et al. March 20, 2 | 2018-03-20 |
Soft landing nanolaminates for advanced patterning
Grant 9,905,423 - Pasquale , et al. February 27, 2 | 2018-02-27 |
Etching Substrates Using Ale And Selective Deposition
App 20170316935 - Tan; Samantha ; et al. | 2017-11-02 |
PECVD films for EUV lithography
Grant 9,618,846 - Shamma , et al. April 11, 2 | 2017-04-11 |
Low Roughness Euv Lithography
App 20160379824 - Wise; Richard ; et al. | 2016-12-29 |
Soft Landing Nanolaminates For Advanced Patterning
App 20160293418 - Pasquale; Frank L. ; et al. | 2016-10-06 |
Image Reversal With Ahm Gap Fill For Multiple Patterning
App 20160254171 - Shamma; Nader ; et al. | 2016-09-01 |
Soft landing nanolaminates for advanced patterning
Grant 9,390,909 - Pasquale , et al. July 12, 2 | 2016-07-12 |
Pecvd Films For Euv Lithography
App 20160179005 - Shamma; Nader ; et al. | 2016-06-23 |
Method for forming a mask by etching conformal film on patterned ashable hardmask
Grant 9,362,133 - Shamma , et al. June 7, 2 | 2016-06-07 |
PECVD films for EUV lithography
Grant 9,304,396 - Shamma , et al. April 5, 2 | 2016-04-05 |
Soft Landing Nanolaminates For Advanced Patterning
App 20150126042 - Pasquale; Frank L. ; et al. | 2015-05-07 |
Pecvd Films For Euv Lithography
App 20140239462 - Shamma; Nader ; et al. | 2014-08-28 |
Image Reversal With Ahm Gap Fill For Multiple Patterning
App 20140170853 - Shamma; Nader ; et al. | 2014-06-19 |
Measurement of thin film properties using plasmons
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Method and apparatus for determining a feature-forming variant of a lithographic system
Grant 5,331,370 - Rosner , et al. July 19, 1 | 1994-07-19 |
Method of making a mask for proximity effect correction in projection lithography
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