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Patent applications and USPTO patent grants for Seymour; Adam.The latest application filed is for "reduction of sicl4 in the presence of bcl3".
Patent | Date |
---|---|
Reduction of SiCl4 in the presence of BCl3 Grant 10,010,853 - Raynor , et al. July 3, 2 | 2018-07-03 |
Reduction of SiCl4 in the presence of BCl3 Grant 9,669,378 - Raynor , et al. June 6, 2 | 2017-06-06 |
REDUCTION OF SiCl4 IN THE PRESENCE OF BCl3 App 20150266744 - Raynor; Mark W. ;   et al. | 2015-09-24 |
REDUCTION OF SiCl4 IN THE PRESENCE OF BCl3 App 20150265996 - Raynor; Mark W. ;   et al. | 2015-09-24 |
NF.sub.3 chamber clean additive Grant 8,623,148 - Mitchell , et al. January 7, 2 | 2014-01-07 |
Removal Of Gallium And Gallium Containing Materials App 20110073136 - Torres, JR.; Robert ;   et al. | 2011-03-31 |
High Aspect Ratio Silicon Oxide Etch App 20110059617 - Mitchell; Glenn ;   et al. | 2011-03-10 |
Nf3 Chamber Clean Additive App 20110056515 - Mitchell; Glenn ;   et al. | 2011-03-10 |
Laminating System and Method App 20100159187 - Seymour; Lindsey Brenda ;   et al. | 2010-06-24 |
Volt probe Grant D501,415 - Seymour February 1, 2 | 2005-02-01 |
Housing for refrigerant recovery system Grant D482,373 - Seymour , et al. November 18, 2 | 2003-11-18 |
Housing for refrigerant recovery system Grant D474,209 - Seymour , et al. May 6, 2 | 2003-05-06 |
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