Seshadri; Indira P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Seshadri; Indira P..The latest application filed is for "removal of trilayer resist without damage to underlying structure".

Company Profile

3.7.7

Seshadri; Indira P. - Troy NY
Seshadri; Indira P. - Niskayuna NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Removal of trilayer resist without damage to underlying structure Grant 10,957,536 - Sankarapandian , et al. March 23, 2	2021-03-23
Removal Of Trilayer Resist Without Damage To Underlying Structure App 20200066519 - Sankarapandian; Muthumanickam ; et al.	2020-02-27
Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning Grant 10,254,652 - De Silva , et al.	2019-04-09
Photoresist Patterning On Silicon Nitride App 20190101829 - Seshadri; Indira P. ; et al.	2019-04-04
Separate N and P fin etching for reduced CMOS device leakage Grant 10,229,910 - Chu , et al.	2019-03-12
Approach To Lowering Extreme Ultraviolet Exposure Dose For Inorganic Hardmasks For Extreme Ultraviolet Patterning App 20180348636 - De Silva; Ekmini A. ; et al.	2018-12-06
Removal Of Trilayer Resist Without Damage To Underlying Structure App 20180286680 - Sankarapandian; Muthumanickam ; et al.	2018-10-04
Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning Grant 10,082,736 - De Silva , et al. September 25, 2	2018-09-25
Removal Of Trilayer Resist Without Damage To Underlying Structure App 20180233360 - Sankarapandian; Muthumanickam ; et al.	2018-08-16
Removal of trilayer resist without damage to underlying structure Grant 10,049,876 - Sankarapandian , et al. August 14, 2	2018-08-14
Approach To Lowering Extreme Ultraviolet Exposure Dose For Inorganic Hardmasks For Extreme Ultraviolet Patterning App 20180203355 - De Silva; Ekmini A. ; et al.	2018-07-19
Separate N And P Fin Etching For Reduced Cmos Device Leakage App 20180097002 - Chu; Isabel C. ; et al.	2018-04-05
Application of titanium-oxide as a patterning hardmask Grant 9,799,534 - Arceo de la Pena , et al. October 24, 2	2017-10-24
Separate N and P fin etching for reduced CMOS device leakage Grant 9,711,507 - Chu , et al. July 18, 2	2017-07-18

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