SERIZAWA; Ryuichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for SERIZAWA; Ryuichi.The latest application filed is for "composition, film, method of forming film, method of forming pattern, method of forming organic-underlayer-film reverse pattern, and method of producing composition".

Company Profile

5.4.9

SERIZAWA; Ryuichi - Tokyo JP
- Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition, Film, Method Of Forming Film, Method Of Forming Pattern, Method Of Forming Organic-underlayer-film Reverse Pattern, And Method Of Producing Composition App 20220204535 - OOTSUBO; Yuusuke ; et al.	2022-06-30
Film-forming Composition, Resist Underlayer Film, Method Of Forming Film, Method Of Forming Resist Pattern, Method Of Forming Organic-underlayer-film Reverse Pattern, Method Of Producing Film-forming Composition, And Method Of Forming Metal-containing Film Pattern App 20220075267 - OOTSUBO; Yuusuke ; et al.	2022-03-10
Patterned Substrate-producing Method App 20200333706 - SERIZAWA; Ryuichi ; et al.	2020-10-22
Resist Pattern-forming Method And Substrate-treating Method App 20200218161 - SERIZAWA; Ryuichi ; et al.	2020-07-09
Metal-containing Film-forming Composition, Metal-containing Film And Pattern-forming Method App 20200159121 - SERIZAWA; Ryuichi ; et al.	2020-05-21
Composition For Forming Silicon-containing Film For Euv Lithography, Silicon-containing Film For Euv Lithography, And Pattern-forming Method App 20180292753 - TANAKA; Hiromitsu ; et al.	2018-10-11
Radiation-sensitive resin composition Grant 08921027 -	2014-12-30
Radiation-sensitive resin composition Grant 8,921,027 - Serizawa , et al. December 30, 2	2014-12-30
Radiation-sensitive resin composition, polymer, and compound Grant 8,507,575 - Matsumura , et al. August 13, 2	2013-08-13
Photoresist Composition, Method For Producing Photoresist Composition, And Method For Forming Resist Pattern App 20130078571 - SERIZAWA; Ryuichi ; et al.	2013-03-28
Radiation-sensitive Resin Composition App 20120082936 - Serizawa; Ryuichi ; et al.	2012-04-05
Radiation-sensitive Resin Composition, Polymer, And Compound App 20120065291 - Matsumura; Nobuji ; et al.	2012-03-15

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