loadpatents
Patent applications and USPTO patent grants for SEOK; Dong Chan.The latest application filed is for "method for water-repellent treatment of boron nitride powder and water-repellent-treated boron nitride".
Patent | Date |
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Method For Water-repellent Treatment Of Boron Nitride Powder And Water-repellent-treated Boron Nitride App 20220112084 - JUNG; Yong Ho ;   et al. | 2022-04-14 |
Atomic layer polishing method and device therefor Grant 11,268,191 - Choi , et al. March 8, 2 | 2022-03-08 |
Point Etching Module Using Annular Surface Dielectric Barrier Discharge Apparatus And Method For Control Etching Profile Of Point Etching Module App 20200402810 - SEOK; Dong Chan ;   et al. | 2020-12-24 |
Atomic Layer Polishing Method And Device Therefor App 20200216954 - CHOI; Yong Sup ;   et al. | 2020-07-09 |
Plasma equipment for treating powder Grant 10,418,227 - Seok , et al. Sept | 2019-09-17 |
Plasma equipment for treating powder Grant 10,056,234 - Seok , et al. August 21, 2 | 2018-08-21 |
Plasma Equipment For Treating Powder App 20180090302 - SEOK; Dong Chan ;   et al. | 2018-03-29 |
Plasma Equipment For Treating Powder App 20180019105 - SEOK; Dong Chan ;   et al. | 2018-01-18 |
Apparatus for medical sterilization using plasma Grant 9,855,354 - Lho , et al. January 2, 2 | 2018-01-02 |
Plasma Equipment For Treating Powder App 20150348760 - SEOK; Dong Chan ;   et al. | 2015-12-03 |
Plasma Equipment For Treating Powder App 20150187543 - Seok; Dong Chan ;   et al. | 2015-07-02 |
Liquid medium plasma discharge generating apparatus Grant 8,926,914 - Seok , et al. January 6, 2 | 2015-01-06 |
Apparatus For Medical Sterilization Using Plasma App 20140241953 - Lho; Tai Hyeop ;   et al. | 2014-08-28 |
Liquid Medium Plasma Discharge Generating Apparatus App 20120160692 - Seok; Dong Chan ;   et al. | 2012-06-28 |
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