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Patent applications and USPTO patent grants for Senoo; Masahide.The latest application filed is for "positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film".
Patent | Date |
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Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film Grant 7,374,856 - Suwa , et al. May 20, 2 | 2008-05-20 |
Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film App 20060115766 - Suwa; Mitsuhito ;   et al. | 2006-06-01 |
Positive type radiation-sensitive composition and process for producing pattern with the same Grant 6,919,157 - Niwa , et al. July 19, 2 | 2005-07-19 |
Positive type radiation-sensitive composition and process for processing for producing pattern with the same App 20030003392 - Niwa, Hiroyuki ;   et al. | 2003-01-02 |
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