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Patent applications and USPTO patent grants for Sendler; Michael.The latest application filed is for "method for depositing a coating having a relatively high dielectric constant onto a substrate".
Patent | Date |
---|---|
Method for depositing a coating having a relatively high dielectric constant onto a substrate App 20060110531 - Chang; Jane P. ;   et al. | 2006-05-25 |
Method for depositing a coating having a relatively high dielectric constant onto a substrate Grant 6,884,719 - Chang , et al. April 26, 2 | 2005-04-26 |
Method for depositing a coating having a relatively high dielectric constant onto a substrate App 20030031793 - Chang, Jane P. ;   et al. | 2003-02-13 |
Method of monitoring emissivity Grant 6,177,127 - Weimer , et al. January 23, 2 | 2001-01-23 |
Method of forming polysilicon having a desired surface roughness Grant 5,962,065 - Weimer , et al. October 5, 1 | 1999-10-05 |
Method of forming hemispherical grained silicon Grant 5,759,262 - Weimer , et al. June 2, 1 | 1998-06-02 |
Method for forming hemispherical grained silicon Grant 5,634,974 - Weimer , et al. June 3, 1 | 1997-06-03 |
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