Senda; Shinichiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Senda; Shinichiro.The latest application filed is for "tungsten target".

Company Profile

4.14.17

Senda; Shinichiro - Ibaraki JP
Senda; Shinichiro - Kitaibaraki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Tantalum sputtering target, and production method therefor Grant 10,658,163 - Nagatsu , et al.	2020-05-19
Tantalum sputtering target, and production method therefor Grant 10,570,505 - Nagatsu , et al. Feb	2020-02-25
Tungsten Target App 20200016660 - Dasai; Takafumi ; et al.	2020-01-16
Tantalum sputtering target and method for producing same Grant 10,490,393 - Senda , et al. Nov	2019-11-26
Tantalum sputtering target and method for producing same Grant 10,407,766 - Senda , et al. Sept	2019-09-10
Sputtering target-backing plate assembly Grant 10,354,846 - Nagatsu , et al. July 16, 2	2019-07-16
Tantalum Sputtering Target, And Production Method Therefor App 20180105926 - Nagatsu; Kotaro ; et al.	2018-04-19
Tantalum sputtering target, method for manufacturing same, and barrier film for semiconductor wiring formed by using target Grant 9,890,452 - Nagatsu , et al. February 13, 2	2018-02-13
Tantalum sputtering target and production method therefor Grant 9,859,104 - Senda , et al. January 2, 2	2018-01-02
Tantalum Sputtering Target, And Production Method Therefor App 20170372879 - Nagatsu; Kotaro ; et al.	2017-12-28
Tantalum sputtering target Grant 9,845,528 - Fukushima , et al. December 19, 2	2017-12-19
Sputtering Target-backing Plate Assembly App 20160086777 - Nagatsu; Kotaro ; et al.	2016-03-24
Tantalum Sputtering Target And Production Method Therefor App 20150348765 - Senda; Shinichiro ; et al.	2015-12-03
Tantalum Sputtering Target And Method For Producing Same App 20150329959 - Senda; Shinichiro ; et al.	2015-11-19
Tantalum Sputtering Target And Method For Producing Same App 20150279637 - Senda; Shinichiro ; et al.	2015-10-01
Tantalum sputtering target Grant 9,085,819 - Senda , et al. July 21, 2	2015-07-21
Barrier film for semiconductor wiring, sintered compact sputtering target and method of producing the sputtering target Grant 9,051,645 - Senda , et al. June 9, 2	2015-06-09
Tantalum Sputtering Target, Method For Manufacturing Same, And Barrier Film For Semiconductor Wiring Formed By Using Target App 20150064056 - Nagatsu; Kotaro ; et al.	2015-03-05
Tantalum Sputtering Target and Method for Manufacturing Same App 20140242401 - Senda; Shinichiro ; et al.	2014-08-28
Tantalum Sputtering Target App 20130098759 - Senda; Shinichiro ; et al.	2013-04-25
Tantalum Sputtering Target App 20130092534 - Senda; Shinichiro ; et al.	2013-04-18
Plated product having copper thin film formed thereon by electroless plating Grant 8,283,051 - Ito , et al. October 9, 2	2012-10-09
Tantalum Sputtering Target App 20120037501 - Fukushima; Atsushi ; et al.	2012-02-16
Tantalum Sputtering Target App 20120031756 - Fukushima; Atsushi ; et al.	2012-02-09
Barrier Film for Semiconductor Wiring, Sintered Compact Sputtering Target and Method of Producing the Sputtering Target App 20110155570 - Senda; Shinichiro ; et al.	2011-06-30
Plated Product Having Copper Thin Film Formed Thereon By Electroless Plating App 20110129688 - Ito; Junichi ; et al.	2011-06-02

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