Semmler; Armin

Patent Applications and Registrations

Patent applications and USPTO patent grants for Semmler; Armin.The latest application filed is for "method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomask".

Company Profile

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Semmler; Armin - Munich DE
Semmler; Armin - Munchen DE
Semmler; Armin - Muenchen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for producing a mask layout avoiding imaging errors for a mask Grant 7,346,885 - Semmler March 18, 2	2008-03-18
Method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomask App 20060190850 - Kohle; Roderick ; et al.	2006-08-24
Method for producing a mask layout avoiding imaging errors for a mask App 20060183028 - Meyne; Christian ; et al.	2006-08-17
Method for producing a mask layout avoiding imaging errors for a mask App 20060070018 - Semmler; Armin	2006-03-30
Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools Grant 7,011,936 - Nolscher , et al. March 14, 2	2006-03-14
Method for producing a mask layout avoiding imaging errors for a mask App 20050125764 - Semmler, Armin	2005-06-09
Method for producing for a mask a mask layout which avoids aberrations App 20050120326 - Semmler, Armin ; et al.	2005-06-02
Exposure mask with repaired dummy structure and method of repairing an exposure mask Grant 6,756,164 - Franke , et al. June 29, 2	2004-06-29
Generating mask layout data for simulation of lithographic processes Grant 6,631,511 - Haffner , et al. October 7, 2	2003-10-07
Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools App 20030143470 - Nolscher, Christoph ; et al.	2003-07-31
Exposure mask with repaired dummy structure and method of repairing an exposure mask App 20030003377 - Franke, Torsten ; et al.	2003-01-02
Generating mask layout data for simulation of lithographic processes App 20020083408 - Haffner, Henning ; et al.	2002-06-27

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