Selbrede; Steven C.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Selbrede; Steven C..The latest application filed is for "system for depositing a film onto a substrate using a low vapor pressure gas precursor".
- Selbrede; Steven C. - San Jose CA
| Patent | Date |
|---|---|
| System for Depositing a Film Onto a Substrate Using a Low Vapor Pressure Gas Precursor App 20100190331 - Selbrede; Steven C. ; et al. | 2010-07-29 |
| Systems and methods for remote plasma clean Grant 6,835,278 - Selbrede , et al. December 28, 2 | 2004-12-28 |
| Effluent pressure control for use in a processing system App 20040247787 - Mackie, Neil M. ; et al. | 2004-12-09 |
| System for depositing a film onto a substrate using a low pressure gas precursor App 20040025787 - Selbrede, Steven C. ; et al. | 2004-02-12 |
| Inductive plasma reactor Grant 6,551,447 - Savas , et al. April 22, 2 | 2003-04-22 |
| Systems and methods for remote plasma clean App 20020020429 - Selbrede, Steven C. ; et al. | 2002-02-21 |
| Inductive plasma reactor Grant 6,143,129 - Savas , et al. November 7, 2 | 2000-11-07 |
| Purge gas in wafer coating area selection Grant 5,447,570 - Schmitz , et al. September 5, 1 | 1995-09-05 |
| Differential pressure CVD chuck Grant 5,383,971 - Selbrede * January 24, 1 | 1995-01-24 |
| Differential pressure CVD chuck Grant 5,094,885 - Selbrede March 10, 1 | 1992-03-10 |
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