Sekiya; Akira

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sekiya; Akira.The latest application filed is for "method for producing a fluorocompound".

Company Profile

0.12.17

Sekiya; Akira - Ibaraki JP
Sekiya; Akira - Tsukuba-shi JP
Sekiya; Akira - Tsukuba JP
Sekiya; Akira -

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process for production of carbonyl fluoride Grant 8,513,458 - Quan , et al. August 20, 2	2013-08-20
Method For Producing A Fluorocompound App 20130158304 - Quan; Heng-dao ; et al.	2013-06-20
CVD apparatus and method of cleaning the CVD apparatus Grant 8,277,560 - Sakai , et al. October 2, 2	2012-10-02
Device for cleaning CVD device and method of cleaning CVD device Grant 8,043,438 - Sakai , et al. October 25, 2	2011-10-25
Method Of Producing Pretreated Metal Fluorides And Fluoride Crystals App 20110061587 - Ishizu; Sumito ; et al.	2011-03-17
Process For Production Of Carbonyl Fluoride App 20100191013 - Quan; Heng-dao ; et al.	2010-07-29
Fluorination catalysts, method for their preparation, and method for producing fluorinated compounds using the catalysts App 20090105510 - Quan; Heng-dao ; et al.	2009-04-23
Dry Etching Gas and Method of Dry Etching App 20080274334 - Sekiya; Akira ; et al.	2008-11-06
Process for producing carbonyl fluoride Grant 7,332,628 - Mitsui , et al. February 19, 2	2008-02-19
Method for removing harmful substance in vent gas Grant 7,326,279 - Nakazawa , et al. February 5, 2	2008-02-05
Plasma cleaning gas and plasma cleaning method Grant 7,322,368 - Sekiya , et al. January 29, 2	2008-01-29
Porous aluminum fluoride Grant 7,247,289 - Quan , et al. July 24, 2	2007-07-24
Fluorination Catalysts, Method For Their Preparation, And Method For Producing Fluorinated Compounds Using The Catalysts App 20070027348 - Quan; Heng-dao ; et al.	2007-02-01
Cleaning gas and etching gas Grant 7,138,364 - Ohira , et al. November 21, 2	2006-11-21
Device for cleaning cvd device and method of cleaning cvd device App 20060207630 - Sakai; Katsuo ; et al.	2006-09-21
Process for producing carbonyl fluoride App 20060194985 - Mitsui; Yuki ; et al.	2006-08-31
Method for removing harmful substance in bent gas App 20060032373 - Nakazawa; Yasuo ; et al.	2006-02-16
Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gas App 20050252451 - Beppu, Tatsuro ; et al.	2005-11-17
Porous calcium fluoride, its producing method, catalyst for hydrogenation reaction, and method for producing trihydrofluorocarbon App 20050080303 - Sekiya, Akira ; et al.	2005-04-14
Cvd apparatus and method of cleaning the cvd apparatus App 20040250775 - Sakai, Katsuo ; et al.	2004-12-16
Cleaning gas and etching gas App 20040173569 - Ohira, Yutaka ; et al.	2004-09-09
Cleaning gases and etching gases Grant 6,787,053 - Sekiya , et al. September 7, 2	2004-09-07
Plasma cleaning gas and plasma cleaning method App 20040016441 - Sekiya, Akira ; et al.	2004-01-29
Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon- containing compounds App 20030143846 - Sekiya, Akira ; et al.	2003-07-31
Cleaning gasses and etching gases App 20030001134 - Sekiya, Akira ; et al.	2003-01-02
Process for the preparation of fluorinated olefin Grant 6,211,420 - Sekiya , et al. April 3, 2	2001-04-03
Process for producing fluorinated alkene and fluorinated alkane Grant 5,847,243 - Sekiya , et al. December 8, 1	1998-12-08

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