Seki; Akihiro
Patent Applications and Registrations
Patent applications and USPTO patent grants for Seki; Akihiro.The latest application filed is for "cooling method for workpiece".
- Seki; Akihiro - Echizen JP
- SEKI; Akihiro - Echizen-shi JP
- Seki; Akihiro - Joetsu-shi JP
- Seki; Akihiro - Joetsu JP
- SEKI; Akihiro - Yokohama JP
- SEKI; Akihiro - Jyoetsu JP
- Seki; Akihiro - Niigata-ken JP
- Seki; Akihiro - Nakakubiki-gun JP
| Patent | Date |
|---|---|
| Mold, mold apparatus, and cooling method for workpiece Grant 11,104,971 - Seki , et al. August 31, 2 | 2021-08-31 |
| Cooling Method For Workpiece App 20210222264 - SEKI; Akihiro ; et al. | 2021-07-22 |
| Positive Resist Composition And Patterning Process App 20200285152 - Matsui; Yoshinori ; et al. | 2020-09-10 |
| Mold, Mold Apparatus, And Cooling Method For Workpiece App 20190100816 - SEKI; Akihiro ; et al. | 2019-04-04 |
| Patterning process and resist composition Grant 9,551,932 - Funatsu , et al. January 24, 2 | 2017-01-24 |
| Movement Assisting Device, Movement Assisting Method, And Computer Program Product App 20160080644 - UCHIYAMA; Hideaki ; et al. | 2016-03-17 |
| Positive Resist Composition And Patterning Process App 20150268555 - FUNATSU; Kenji ; et al. | 2015-09-24 |
| Sulfonium salt, resist composition and patterning process Grant 9,122,155 - Ohashi , et al. September 1, 2 | 2015-09-01 |
| Sulfonium salt, resist composition, and patterning process Grant 8,956,803 - Ohashi , et al. February 17, 2 | 2015-02-17 |
| Positive resist composition and patterning process Grant 8,871,427 - Taniguchi , et al. October 28, 2 | 2014-10-28 |
| Patterning Process And Resist Composition App 20140212808 - Funatsu; Kenji ; et al. | 2014-07-31 |
| Sulfonium Salt, Resist Composition And Patterning Process App 20140199630 - OHASHI; Masaki ; et al. | 2014-07-17 |
| Sulfonium Salt, Resist Composition, And Patterning Process App 20140199629 - OHASHI; Masaki ; et al. | 2014-07-17 |
| Patterning process Grant 8,722,321 - Kobayashi , et al. May 13, 2 | 2014-05-13 |
| Positive Resist Composition And Patterning Process App 20130045444 - TANIGUCHI; Ryosuke ; et al. | 2013-02-21 |
| Patterning Process App 20120270159 - Kobayashi; Tomohiro ; et al. | 2012-10-25 |
| Positive resist compositions and patterning process Grant 7,638,260 - Seki , et al. December 29, 2 | 2009-12-29 |
| Positive resist compositions and patterning process Grant 7,618,764 - Tanaka , et al. November 17, 2 | 2009-11-17 |
| Photoacid generators, chemically amplified resist compositions, and patterning process Grant 7,494,760 - Ohsawa , et al. February 24, 2 | 2009-02-24 |
| Positive resist compositions and patterning process App 20080268370 - Tanaka; Shigeo ; et al. | 2008-10-30 |
| Positive resist compositions and patterning process App 20080124653 - Seki; Akihiro ; et al. | 2008-05-29 |
| Positive resist compositions and patterning process App 20080118863 - Tanaka; Shigeo ; et al. | 2008-05-22 |
| Fine contact hole forming method employing thermal flow process Grant 7,344,827 - Takemura , et al. March 18, 2 | 2008-03-18 |
| Photoacid generators, chemically amplified resist compositions, and patterning process App 20070287096 - Ohsawa; Youichi ; et al. | 2007-12-13 |
| Nitrogen-containing organic compound, resist composition and patterning process Grant 7,252,925 - Watanabe , et al. August 7, 2 | 2007-08-07 |
| Nitrogen-containing organic compound, resist composition and patterning process App 20050095533 - Watanabe, Takeru ; et al. | 2005-05-05 |
| Chemical amplification, positive resist compositions Grant 6,838,224 - Ohsawa , et al. January 4, 2 | 2005-01-04 |
| Fine contact hole forming method employing thermal flow process App 20040224513 - Takemura, Katsuya ; et al. | 2004-11-11 |
| Chemical amplification resist compositions Grant 6,737,214 - Takeda , et al. May 18, 2 | 2004-05-18 |
| Chemical amplification, positive resist compositions Grant 6,682,869 - Ohsawa , et al. January 27, 2 | 2004-01-27 |
| Resist compositions and patterning process Grant 6,395,446 - Seki , et al. May 28, 2 | 2002-05-28 |
| Chemical amplification, positive resist compositions App 20010038971 - Ohsawa, Youichi ; et al. | 2001-11-08 |
| Chemical amplification, positive resist compositions App 20010033994 - Ohsawa, Youichi ; et al. | 2001-10-25 |
| Chemical amplification resist compositions App 20010031421 - Takeda, Takanobu ; et al. | 2001-10-18 |
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