Seitz; Holger

Patent Applications and Registrations

Patent applications and USPTO patent grants for Seitz; Holger.The latest application filed is for "method and apparatus for characterizing a microlithographic mask".

Company Profile

11.15.15

Seitz; Holger - Jena DE
Seitz; Holger - Jene DE
Seitz; Holger - Meiningen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method And Apparatus For Characterizing A Microlithographic Mask App 20220075272 - Matejka; Ulrich ; et al.	2022-03-10
Inspection Device For Masks For Semiconductor Lithography And Method App 20210156809 - Seitz; Holger ; et al.	2021-05-27
Inspection device for masks for semiconductor lithography and method Grant 10,928,332 - Seitz , et al. February 23, 2	2021-02-23
Method and appliance for predicting the imaging result obtained with a mask when a lithography process is carried out Grant 10,788,748 - Thaler , et al. September 29, 2	2020-09-29
Method and device for characterizing a mask for microlithography Grant 10,698,318 - Seitz , et al.	2020-06-30
Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit Grant 10,578,881 - Frank , et al.	2020-03-03
Method and device for determining an OPC model Grant 10,539,865 - Seitz , et al. Ja	2020-01-21
Illumination Optical Unit For A Metrology System And Metrology System Comprising Such An Illumination Optical Unit App 20190121145 - Frank; Thomas ; et al.	2019-04-25
Method And Appliance For Predicting The Imaging Result Obtained With A Mask When A Lithography Process Is Carried Out App 20190107776 - Thaler; Thomas ; et al.	2019-04-11
Inspection Device For Masks For Semiconductor Lithography And Method App 20190011376 - Seitz; Holger ; et al.	2019-01-10
Method And Device For Characterizing A Mask For Microlithography App 20190011839 - Seitz; Holger ; et al.	2019-01-10
Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit Grant 10,168,539 - Frank , et al. J	2019-01-01
Illumination Optical Unit For A Metrology System And Metrology System Comprising Such An Illumination Optical Unit App 20180173001 - Frank; Thomas ; et al.	2018-06-21
Method And Device For Determining An Opc Model App 20180095358 - Seitz; Holger ; et al.	2018-04-05
Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit Grant 9,904,060 - Frank , et al. February 27, 2	2018-02-27
Emulation of reproduction of masks corrected by local density variations Grant 9,535,244 - Seitz , et al. January 3, 2	2017-01-03
Microscope and method for characterizing structures on an object Grant 9,268,124 - Seitz , et al. February 23, 2	2016-02-23
Method for characterizing a feature on a mask and device for carrying out the method Grant 9,222,897 - Seitz December 29, 2	2015-12-29
Emulation Of Reproduction Of Masks Corrected By Local Density Variations App 20150198798 - Seitz; Holger ; et al.	2015-07-16
Mask inspection microscope with variable illumination setting Grant 8,970,951 - Matejka , et al. March 3, 2	2015-03-03
Illumination Optical Unit For A Metrology System And Metrology System Comprising Such An Illumination Optical Unit App 20150001408 - Frank; Thomas ; et al.	2015-01-01
Method and apparatus for measuring of masks for the photo-lithography Grant 8,730,474 - Scheruebl , et al. May 20, 2	2014-05-20
Microscope And Method For Characterizing Structures On An Object App 20130321609 - Seitz; Holger ; et al.	2013-12-05
Mask Inspection Microscope With Variable Illumination Setting App 20120162755 - Stroessner; Ulrich ; et al.	2012-06-28
Method For Characterizing A Feature On A Mask And Device For Carrying Out The Method App 20120075456 - Seitz; Holger	2012-03-29
Method And Apparatus For Measuring Of Masks For The Photo-lithography App 20110016437 - Scherubl; Thomas ; et al.	2011-01-20
Method for analysis of objects in microlithography App 20060269117 - Seitz; Holger ; et al.	2006-11-30

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