loadpatents
name:-0.0044741630554199
name:-0.0039541721343994
name:-0.001021146774292
Seger; Lawrence Patent Filings

Seger; Lawrence

Patent Applications and Registrations

Patent applications and USPTO patent grants for Seger; Lawrence.The latest application filed is for "norbornene-type monomers and polymers containing pendent lactone or sultone groups".

Company Profile
0.3.3
  • Seger; Lawrence - Gates Mills OH
  • Seger, Lawrence - Sliver Lake OH
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Dissolution rate modifiers for photoresist compositions
Grant 7,422,836 - Rhodes , et al. September 9, 2
2008-09-09
Norbornene-type monomers and polymers containing pendent lactone or sultone groups
Grant 7,341,818 - Wu , et al. March 11, 2
2008-03-11
Norbornene-type monomers and polymers containing pendent lactone or sultone groups
Grant 7,101,654 - Wu , et al. September 5, 2
2006-09-05
Norbornene-type monomers and polymers containing pendent lactone or sultone groups
App 20050153233 - Wu, Xiaoming ;   et al.
2005-07-14
Norbornene-type monomers and polymers containing pendent lactone or sultone groups
App 20050153240 - Wu, Xiaoming ;   et al.
2005-07-14
Dissolution rate modifiers for photoresist compositions
App 20040219452 - Rhodes, Larry F. ;   et al.
2004-11-04

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