| Patent | Date |
|---|
Method for structuring a substrate using a metal mask layer formed using a galvanization process
Grant 7,928,011 - Elian , et al. April 19, 2 | 2011-04-19 |
Method for Structuring a Substrate
App 20090174077 - Elian; Klaus ; et al. | 2009-07-09 |
Method of forming a patterned resist layer for patterning a semiconductor product
App 20080203386 - Klostermann; Ulrich ; et al. | 2008-08-28 |
Resist for electron beam lithography and a process for producing photomasks using electron beam lithography
Grant 7,220,531 - Elian , et al. May 22, 2 | 2007-05-22 |
Lithographic process for reducing the lateral chromium structure loss in photomask production using chemically amplified resists
Grant 7,157,189 - Elian , et al. January 2, 2 | 2007-01-02 |
Method and apparatus for a post exposure bake of a resist
App 20060269879 - Elian; Klaus ; et al. | 2006-11-30 |
Resist for photolithography having reactive groups for subsequent modification of the resist structures
Grant 7,125,640 - Rottstegge , et al. October 24, 2 | 2006-10-24 |
Apparatus and method for proof of outgassing products
Grant 7,078,709 - Herbst , et al. July 18, 2 | 2006-07-18 |
Silicon-containing resist for photolithography
Grant 7,052,820 - Rottstegge , et al. May 30, 2 | 2006-05-30 |
Method for forming a lithography mask
App 20060105274 - Kragler; Karl ; et al. | 2006-05-18 |
Process for silylating photoresists in the UV range
Grant 7,045,273 - Ferbitz , et al. May 16, 2 | 2006-05-16 |
Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography
Grant 7,041,426 - Eschbaumer , et al. May 9, 2 | 2006-05-09 |
Process for the production of photomasks for structuring semiconductor substrates by optical lithography
App 20060083993 - Kirch; Oliver ; et al. | 2006-04-20 |
Process for producing hard masks
Grant 7,018,748 - Sebald , et al. March 28, 2 | 2006-03-28 |
Silicon resist for photolithography at short exposure wavelengths and process for making photoresists
Grant 6,974,655 - Rottstegge , et al. December 13, 2 | 2005-12-13 |
Negative resist process with simultaneous development and aromatization of resist structures
Grant 6,946,236 - Rottstegge , et al. September 20, 2 | 2005-09-20 |
Process for modifying resist structures and resist films from the aqueous phase
Grant 6,899,997 - Yip , et al. May 31, 2 | 2005-05-31 |
Apparatus and method for verification of outgassing products
App 20050109954 - Herbst, Waltraud ; et al. | 2005-05-26 |
Process for sidewall amplification of resist structures and for the production of structures having reduced structure size
Grant 6,893,972 - Rottstegge , et al. May 17, 2 | 2005-05-17 |
Apparatus and method for proof of outgassing products
App 20050092936 - Herbst, Waltraud ; et al. | 2005-05-05 |
Method for structuring a photoresist layer
Grant 6,887,653 - Richter , et al. May 3, 2 | 2005-05-03 |
Photoresist compound and method for structuring a photoresist layer
Grant 6,841,332 - Falk , et al. January 11, 2 | 2005-01-11 |
Chemically Amplified Photoresist And Process For Structuring Substituents Using Transparency Enhancement Of Resist Copolymers For 157 Nm Photolithography Through The Use Of Fluorinated Cinnamic Acid Derivatives
Grant 6,806,027 - Hohle , et al. October 19, 2 | 2004-10-19 |
Method for experimentally verifying imaging errors in photomasks
Grant 6,800,407 - Czech , et al. October 5, 2 | 2004-10-05 |
Optical device for use with a lithography method
App 20040169834 - Richter, Ernst-Christian ; et al. | 2004-09-02 |
Negative resist process with simultaneous development and silylation
Grant 6,770,423 - Rottstegge , et al. August 3, 2 | 2004-08-03 |
Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers
Grant 6,759,184 - Rottstegge , et al. July 6, 2 | 2004-07-06 |
Method of structuring a photoresist layer
Grant 6,746,821 - Richter , et al. June 8, 2 | 2004-06-08 |
Process for structuring a photoresist layer
Grant 6,746,827 - Richter , et al. June 8, 2 | 2004-06-08 |
Process for structuring a photoresist layer
Grant 6,746,828 - Richter , et al. June 8, 2 | 2004-06-08 |
Method for structuring a photoresist layer
Grant 6,743,572 - Richter , et al. June 1, 2 | 2004-06-01 |
Method for structuring a photoresist layer
Grant 6,740,475 - Richter , et al. May 25, 2 | 2004-05-25 |
Process and control device for the planarization of a semiconductor sample
App 20040077180 - Sebald, Michael | 2004-04-22 |
Method for producing resist structures
Grant 6,703,190 - Elian , et al. March 9, 2 | 2004-03-09 |
Method for experimentally verifying imaging errors in optical exposure units
Grant 6,696,208 - Czech , et al. February 24, 2 | 2004-02-24 |
Process for modifying resist structures and resist films from the aqueous phase
App 20030211422 - Yip, Siew Siew ; et al. | 2003-11-13 |
Process for producing hard masks
App 20030203314 - Sebald, Michael ; et al. | 2003-10-30 |
Lithographic process for reducing the lateral chromium structure loss in photomask production using chemically amplified resists
App 20030165751 - Elian, Klaus ; et al. | 2003-09-04 |
Resist for electron beam lithography and a process for producing photomasks using electron beam lithography
App 20030165752 - Elian, Klaus ; et al. | 2003-09-04 |
Silicon resist for photolithography at short exposure wavelengths and process for making photoresists
App 20030148219 - Rottstegge, Jorg ; et al. | 2003-08-07 |
Resist for photolithography having reactive groups for subsequent modification of the resist structures
App 20030143484 - Rottstegge, Jorg ; et al. | 2003-07-31 |
Process for silylating photoresists in the UV range
App 20030124468 - Ferbitz, Jens ; et al. | 2003-07-03 |
Silicon-containing resist for photolithography
App 20030108812 - Rottstegge, Jorg ; et al. | 2003-06-12 |
Chemically amplified photoresist and process for structuring substituents using transparency enhancement of resist copolymers for 157 NM photolithography through the use of fluorinated cinnamic acid derivatives
App 20030096190 - Hohle, Christoph ; et al. | 2003-05-22 |
Silylating process for photoresists in the UV region
App 20030096194 - Rottstegge, Jorg ; et al. | 2003-05-22 |
Process for sidewall amplification of resist structures and for the production of structures having reduced structure size
App 20030091936 - Rottstegge, Jorg ; et al. | 2003-05-15 |
Chemically amplified photoresist and process for structuring substrates having resist copolymers with enhanced transparency resulting from fluorinating the photochemically cleavable leaving groups and being applicable to 157 nm photolithography
App 20030082483 - Hohle, Christoph ; et al. | 2003-05-01 |
Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography
App 20030082480 - Eschbaumer, Christian ; et al. | 2003-05-01 |
Negative resist process with simultaneous development and silylation
App 20030082488 - Rottstegge, Jorg ; et al. | 2003-05-01 |
Negative resist process with simultaneous development and aromatization of resist structures
App 20030073037 - Rottstegge, Jorg ; et al. | 2003-04-17 |
Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers
App 20030073043 - Rottstegge, Jorg ; et al. | 2003-04-17 |
Method for experimentally verifying imaging errors in optical exposure units
App 20030054268 - Czech, Gunther ; et al. | 2003-03-20 |
Photoresist compound and method for structuring a photoresist layer
App 20030022111 - Falk, Gertrud ; et al. | 2003-01-30 |
Method for experimentally verifying imaging errors in photomasks
App 20030013022 - Czech, Gunther ; et al. | 2003-01-16 |
Method for producing resist structures
App 20030008240 - Elian, Klaus ; et al. | 2003-01-09 |
Method for structuring a photoresist layer
App 20020187436 - Richter, Ernst Christian ; et al. | 2002-12-12 |
Process for structuring a photoresist layer
App 20020160315 - Richter, Ernst-Christian ; et al. | 2002-10-31 |
Method for structuring a photoresist layer
App 20020160318 - Richter, Ernst-Christian ; et al. | 2002-10-31 |
Process for structuring a photoresist layer
App 20020160316 - Richter, Ernst-Christian ; et al. | 2002-10-31 |
Method for structuring a photoresist layer
App 20020160317 - Richter, Ernst-Christian ; et al. | 2002-10-31 |
Method of structuring a photoresist layer
App 20020058425 - Richter, Ernst-Christian ; et al. | 2002-05-16 |
Radiation-sensitive mixture and its use
Grant 6,063,543 - Hien , et al. May 16, 2 | 2000-05-16 |
Dry-developable positive resist
Grant 5,733,706 - Sezi , et al. March 31, 1 | 1998-03-31 |
Process for producing a diffusion region adjacent to a recess in a substrate
Grant 5,726,094 - Schwalke , et al. March 10, 1 | 1998-03-10 |
Mixed polymers
Grant 5,703,186 - Sezi , et al. December 30, 1 | 1997-12-30 |
Production of photolithographic structures
Grant 5,384,220 - Sezi , et al. January 24, 1 | 1995-01-24 |
Method for the production of a bottom resist
Grant 5,368,901 - Leuschner , et al. November 29, 1 | 1994-11-29 |
Method for producing a resist structure
Grant 5,262,283 - Sezi , et al. * November 16, 1 | 1993-11-16 |
Photostructuring process
Grant 5,250,375 - Sebald , et al. October 5, 1 | 1993-10-05 |
Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development
Grant 5,234,793 - Sebald , et al. August 10, 1 | 1993-08-10 |
Etch-resistant deep ultraviolet resist process having an aromatic treating step after development
Grant 5,173,393 - Sezi , et al. December 22, 1 | 1992-12-22 |
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