Schuster; Mark Josef

Patent Applications and Registrations

Patent applications and USPTO patent grants for Schuster; Mark Josef.The latest application filed is for "patterning device support, lithographic apparatus, and method of controlling patterning device temperature".

Company Profile

1.11.11

Schuster; Mark Josef - Fairfield CT

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Lithographic apparatus Grant 10,788,763 - Westerlaken , et al. September 29, 2	2020-09-29
Gas flow optimization in reticle stage environment Grant 10,031,428 - Cuypers , et al. July 24, 2	2018-07-24
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature Grant 9,977,351 - Ebert , et al. May 22, 2	2018-05-22
Patterning device manipulating system and lithographic apparatuses Grant 9,910,368 - Valentin , et al. March 6, 2	2018-03-06
Patterning Device Support, Lithographic Apparatus, And Method Of Controlling Patterning Device Temperature App 20170307986 - EBERT; Earl William ; et al.	2017-10-26
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature Grant 9,766,557 - Ebert , et al. September 19, 2	2017-09-19
Patterning device support and lithographic apparatus Grant 9,740,112 - Sinharoy , et al. August 22, 2	2017-08-22
Patterning Device Support, Lithographic Apparatus, And Method Of Controlling Patterning Device Temperature App 20170160652 - EBERT; Earl William ; et al.	2017-06-08
Real-time reticle curvature sensing Grant 9,632,429 - Ward , et al. April 25, 2	2017-04-25
Reticle cooling system in a lithographic apparatus Grant 9,632,434 - Ebert, Jr. , et al. April 25, 2	2017-04-25
Patterning device support, lithographic apparatus, and method of controlling patterning device temperature Grant 9,632,433 - Ebert, Jr. , et al. April 25, 2	2017-04-25
Lithographic Apparatus App 20170068175 - WESTERLAKEN; Jan Steven Christiaan ; et al.	2017-03-09
Lithographic apparatus Grant 9,513,568 - Westerlaken , et al. December 6, 2	2016-12-06
Determining position and curvature information directly from a surface of a patterning device Grant 9,377,700 - Schuster , et al. June 28, 2	2016-06-28
Gas Flow Optimization in Reticle Stage Environment App 20150355557 - CUYPERS; Koen ; et al.	2015-12-10
Patterning Device Support, Lithographic Apparatus, And Method Of Controlling Patterning Device Temperature App 20150301456 - EBERT, JR.; Earl William ; et al.	2015-10-22
Patterning Device Manipulating System and Lithographic Apparatuses App 20150277241 - Valentin; Christiaan Louis ; et al.	2015-10-01
Patterning Device Support and Lithographic Apparatus App 20150277240 - Sinharoy; Arindam ; et al.	2015-10-01
Reticle Cooling System In A Lithographic Apparatus App 20150241796 - EBERT, JR.; Earl William ; et al.	2015-08-27
Real-Time Reticle Curvature Sensing App 20150220005 - Ward; Christopher Charles ; et al.	2015-08-06
Lithographic Apparatus App 20150168854 - Westerlaken; Jan Steven Christiaan ; et al.	2015-06-18
Determining Position And Curvature Information Directly From A Surface Of A Patterning Device App 20140307246 - Schuster; Mark Josef ; et al.	2014-10-16

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