Scholl; Richard A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Scholl; Richard A..The latest application filed is for "dual anode ac supply for continuous deposition of a cathode material".

Company Profile

0.17.2

Scholl; Richard A. - Fort Collins CO
Scholl; Richard A. - Palo Alto CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Dual anode AC supply for continuous deposition of a cathode material Grant 7,211,179 - Seymour , et al. May 1, 2	2007-05-01
Dual anode AC supply for continuous deposition of a cathode material App 20060131170 - Seymour; Eric ; et al.	2006-06-22
Inductively coupled plasma source using induced eddy currents App 20050194099 - Jewett, Russell F. JR. ; et al.	2005-09-08
Method and apparatus for substrate biasing in multiple electrode sputtering systems Grant 6,818,103 - Scholl , et al. November 16, 2	2004-11-16
System for plasma ignition by fast voltage rise Grant 6,633,017 - Drummond , et al. October 14, 2	2003-10-14
Periodically clearing thin film plasma processing system Grant 6,521,099 - Drummond , et al. February 18, 2	2003-02-18
Adjustable energy quantum thin film plasma processing system Grant 6,368,477 - Scholl April 9, 2	2002-04-09
Plasma generator pulsed direct current supply in a bridge configuration Grant 6,222,321 - Scholl , et al. April 24, 2	2001-04-24
Periodically clearing thin film plasma processing system Grant 6,217,717 - Drummond , et al. April 17, 2	2001-04-17
AC powered system for continuous deposition of a cathode material Grant 6,183,605 - Schatz , et al. February 6, 2	2001-02-06
Enhanced reactive DC sputtering system Grant 6,024,844 - Drummond , et al. February 15, 2	2000-02-15
Adjustable energy quantum thin film plasma processing system Grant 6,007,879 - Scholl December 28, 1	1999-12-28
Enhanced reactive DC sputtering system Grant 6,001,224 - Drummond , et al. December 14, 1	1999-12-14
Pulsed direct current power supply configurations for generating plasmas Grant 5,917,286 - Scholl , et al. June 29, 1	1999-06-29
Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages Grant 5,897,753 - Schatz , et al. April 27, 1	1999-04-27
Enhanced reactive DC sputtering system Grant 5,718,813 - Drummond , et al. February 17, 1	1998-02-17
Thermocouple vacuum gauge Grant 4,633,717 - Scholl January 6, 1	1987-01-06
Method for circumferential dimension measuring and control in crystal rod pulling Grant 4,350,557 - Scholl , et al. September 21, 1	1982-09-21
Circumferential error signal apparatus for crystal rod pulling Grant 4,207,293 - Scholl , et al. June 10, 1	1980-06-10

Company Registrations

SEC

0001228900

SCHOLL RICHARD A

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