| Patent | Date |
|---|
Electrostatic filter providing reduced particle generation
Grant 11,437,215 - Likhanskii , et al. September 6, 2 | 2022-09-06 |
Particle Yield Via Beam-line Pressure Control
App 20220037114 - Stacy; Thomas ; et al. | 2022-02-03 |
Ion Source With Single-slot Tubular Cathode
App 20210383995 - Koo; Bon-Woong ; et al. | 2021-12-09 |
Ion source with single-slot tubular cathode
Grant 11,127,557 - Koo , et al. September 21, 2 | 2021-09-21 |
Ion Source With Single-slot Tubular Cathode
App 20210287872 - Koo; Bon-Woong ; et al. | 2021-09-16 |
Electrostatic Filter Providing Reduced Particle Generation
App 20210183609 - Likhanskii; Alexandre ; et al. | 2021-06-17 |
In-situ plasma cleaning of process chamber components
Grant 11,037,758 - Anglin , et al. June 15, 2 | 2021-06-15 |
In-situ Plasma Cleaning Of Process Chamber Components
App 20210013001 - Anglin; Kevin ; et al. | 2021-01-14 |
Cylindrical shaped arc chamber for indirectly heated cathode ion source
Grant 10,818,469 - Perel , et al. October 27, 2 | 2020-10-27 |
Cylindrical Shaped Arc Chamber For Indirectly Heated Cathode Ion Source
App 20200194220 - Perel; Alexander S. ; et al. | 2020-06-18 |
In-situ Plasma Cleaning Of Process Chamber Components
App 20200126757 - Anglin; Kevin ; et al. | 2020-04-23 |
In-situ plasma cleaning of process chamber components
Grant 10,522,330 - Anglin , et al. Dec | 2019-12-31 |
RF clean system for electrostatic elements
Grant 10,410,844 - Anglin , et al. Sept | 2019-09-10 |
Rf Clean System For Electrostatic Elements
App 20180166261 - Anglin; Kevin ; et al. | 2018-06-14 |
Liquid immersion doping
Grant 9,805,931 - Sinclair , et al. October 31, 2 | 2017-10-31 |
Apparatus and method for in-situ cleaning in ion beam apparatus
Grant 9,761,410 - Likhanskii , et al. September 12, 2 | 2017-09-12 |
Apparatus And Method For In-situ Cleaning In Ion Beam Apparatus
App 20170221678 - Likhanskii; Alexandre ; et al. | 2017-08-03 |
Apparatus and method for contamination control in ion beam apparatus
Grant 9,685,298 - Likhanskii , et al. June 20, 2 | 2017-06-20 |
In-situ Plasma Cleaning Of Process Chamber Electrostatic Elements Having Varied Geometries
App 20170092473 - Lee; William Davis ; et al. | 2017-03-30 |
Liquid Immersion Doping
App 20170062221 - Sinclair; Frank ; et al. | 2017-03-02 |
In-situ Plasma Cleaning Of Process Chamber Components
App 20160365225 - Anglin; Kevin ; et al. | 2016-12-15 |
Flexible ion source
Grant 8,330,127 - Low , et al. December 11, 2 | 2012-12-11 |
Cold Implant For Optimized Silicide Formation
App 20110034014 - Hatem; Christopher R. ; et al. | 2011-02-10 |
Monitoring plasma ion implantation systems for fault detection and process control
Grant 7,878,145 - Fang , et al. February 1, 2 | 2011-02-01 |
Method And Apparatus For Plasma Dose Measurement
App 20100155600 - Dzengeleski; Joseph P ; et al. | 2010-06-24 |
Flexible ion source
App 20090242793 - Low; Russell J. ; et al. | 2009-10-01 |
RF electron source for ionizing gas clusters
App 20090166555 - Olson; Joseph C. ; et al. | 2009-07-02 |
Method And Apparatuses For Providing Electrical Contact For Plasma Processing Applications
App 20080160212 - Koo; Bon-Woong ; et al. | 2008-07-03 |
Monitoring plasma ion implantation systems for fault detection and process control
App 20080026133 - Fang; Ziwei ; et al. | 2008-01-31 |
Wafer platen equipped with electrostatic clamp, wafer backside gas cooling, and high voltage operation capability for plasma doping
Grant 7,126,808 - Koo , et al. October 24, 2 | 2006-10-24 |
Plasma implantation using halogenated dopant species to limit deposition of surface layers
App 20060099830 - Walther; Steven R. ; et al. | 2006-05-11 |
Reduction of source and drain parasitic capacitance in CMOS devices
App 20060043531 - Erokhin; Yuri ; et al. | 2006-03-02 |
Plasma immersion ion implantion apparatus and method
App 20050205211 - Singh, Vikram ; et al. | 2005-09-22 |
Wafer platen equipped with electrostatic clamp, wafer backside gas cooling, and high voltage operation capability for plasma doping
App 20040196616 - Koo, Bon-Woong ; et al. | 2004-10-07 |
Adjustable conductance limiting aperture for ion implanters
Grant 6,791,097 - Scheuer , et al. September 14, 2 | 2004-09-14 |
Methods and apparatus for ion implantation with variable spatial frequency scan lines
App 20020175297 - Scheuer, Jay T. ; et al. | 2002-11-28 |
Adjustable conductance limiting aperture for ion implanters
App 20020121613 - Scheuer, Jay T. ; et al. | 2002-09-05 |
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