| Patent | Date |
|---|
Chemical Amplification Methods And Techniques For Developable Bottom Anti-reflective Coatings And Dyed Implant Resists
App 20180315596 - Scheer; Steven ; et al. | 2018-11-01 |
Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
Grant 10,020,195 - Scheer , et al. July 10, 2 | 2018-07-10 |
Line Pattern Collapse Mitigation Through Gap-fill Material Application
App 20160363868 - SOMERVELL; Mark H. ; et al. | 2016-12-15 |
Line pattern collapse mitigation through gap-fill material application
Grant 9,454,081 - Somervell , et al. September 27, 2 | 2016-09-27 |
Methods and heat treatment apparatus for uniformly heating a substrate during a bake process
Grant 9,383,138 - Scheer , et al. July 5, 2 | 2016-07-05 |
Chemical Amplification Methods and Techniques for Developable Bottom Anti-reflective Coatings and Dyed Implant Resists
App 20150241782 - SCHEER; Steven ; et al. | 2015-08-27 |
Method and system for controlling a spike anneal process
Grant 9,085,045 - Scheer , et al. July 21, 2 | 2015-07-21 |
Line Pattern Collapse Mitigation Through Gap-fill Material Application
App 20150125791 - SOMERVELL; Mark H. ; et al. | 2015-05-07 |
Line pattern collapse mitigation through gap-fill material application
Grant 8,795,952 - Somervell , et al. August 5, 2 | 2014-08-05 |
Dual tone development with a photo-activated acid enhancement component in lithographic applications
Grant 8,574,810 - Fonseca , et al. November 5, 2 | 2013-11-05 |
Flood exposure process for dual tone development in lithographic applications
Grant 8,568,964 - Fonseca , et al. October 29, 2 | 2013-10-29 |
Substrate treatment to reduce pattern roughness
Grant 8,449,293 - Rathsack , et al. May 28, 2 | 2013-05-28 |
Electrostatic post exposure bake apparatus and method
Grant 8,288,174 - Rathsack , et al. October 16, 2 | 2012-10-16 |
Method for creating gray-scale features for dual tone development processes
Grant 8,283,111 - Fonseca , et al. October 9, 2 | 2012-10-09 |
Electrostatic Post Exposure Bake Apparatus And Method
App 20120244645 - Rathsack; Benjamen M. ; et al. | 2012-09-27 |
Method of process optimization for dual tone development
Grant 8,257,911 - Gronheid , et al. September 4, 2 | 2012-09-04 |
Dual tone development processes
Grant 8,197,996 - Fonseca , et al. June 12, 2 | 2012-06-12 |
Variable resist protecting groups
Grant 8,129,080 - Fonseca , et al. March 6, 2 | 2012-03-06 |
Method For Forming A Self-aligned Double Pattern
App 20120045721 - Printz; Wallace P. ; et al. | 2012-02-23 |
Technique To Form A Self-aligned Double Pattern
App 20120045722 - Printz; Wallace P. ; et al. | 2012-02-23 |
Using electric-field directed post-exposure bake for double-patterning (D-P)
Grant 8,097,402 - Scheer , et al. January 17, 2 | 2012-01-17 |
Substrate Treatment To Reduce Pattern Roughness
App 20110269078 - Rathsack; Benjamin M. ; et al. | 2011-11-03 |
Line Pattern Collapse Mitigation Through Gap-fill Material Application
App 20110205505 - SOMERVELL; Mark H. ; et al. | 2011-08-25 |
Method for patterning a semiconductor wafer
Grant 8,003,305 - Scheer , et al. August 23, 2 | 2011-08-23 |
Dual tone development with plural photo-acid generators in lithographic applications
Grant 7,829,269 - Fonseca , et al. November 9, 2 | 2010-11-09 |
Dual tone development with plural photo-acid generators in lithographic applications
App 20100273111 - FONSECA; Carlos A. ; et al. | 2010-10-28 |
Flood exposure process for dual tone development in lithographic applications
App 20100273099 - FONSECA; Carlos A. ; et al. | 2010-10-28 |
Dual tone development with a photo-activated acid enhancement component in lithographic applications
App 20100273107 - FONSECA; Carlos A. ; et al. | 2010-10-28 |
Using Electric-Field Directed Post-Exposure Bake for Double-Patterning (D-P)
App 20100248152 - Scheer; Steven ; et al. | 2010-09-30 |
Dual Tone Development Processes
App 20100119960 - Fonseca; Carlos A. ; et al. | 2010-05-13 |
Variable Resist Protecting Groups
App 20100075238 - Fonseca; Carlos A. ; et al. | 2010-03-25 |
Method For Creating Gray-scale Features For Dual Tone Development Processes
App 20100068654 - Fonseca; Carlos A. ; et al. | 2010-03-18 |
Method Of Process Optimization For Dual Tone Development
App 20100055625 - Gronheid; Roel ; et al. | 2010-03-04 |
Method Of Patterning A Substrate Using Dual Tone Development
App 20100055624 - Gronheid; Roel ; et al. | 2010-03-04 |
Enhanced process yield using a hot-spot library
Grant 7,673,278 - Rathsack , et al. March 2, 2 | 2010-03-02 |
Method for Patterning a Semiconductor Wafer
App 20090220893 - Scheer; Steven ; et al. | 2009-09-03 |
Enhanced Process Yield Using a Hot-Spot Library
App 20090144691 - Rathsack; Benjamen M. ; et al. | 2009-06-04 |
Method of real time dynamic CD control
Grant 7,483,804 - Scheer January 27, 2 | 2009-01-27 |
Optimized characterization of wafers structures for optical metrology
Grant 7,444,196 - Scheer , et al. October 28, 2 | 2008-10-28 |
Methods And Heat Treatment Apparatus For Uniformly Heating A Substrate During A Bake Process
App 20080237214 - Scheer; Steven ; et al. | 2008-10-02 |
Vacuum Assist Method And System For Reducing Intermixing Of Lithography Layers
App 20080241400 - Scheer; Steven ; et al. | 2008-10-02 |
Method Of Real Time Dynamic Cd Control
App 20080079934 - Scheer; Steven | 2008-04-03 |
Optimized characterization of wafers structures for optical metrology
App 20070250200 - Scheer; Steven ; et al. | 2007-10-25 |
System and method for semiconductor device fabrication using modeling
App 20070226674 - Haffner; Henning ; et al. | 2007-09-27 |
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