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Method Of Preparing Encapsulated Pigment Dispersions With Two Encapsulation Steps App 20140243449 - Lee; Hee Hyun ;   et al. | 2014-08-28 |
Branched copolymer/anthranilic diamide compositions for propagule coating Grant 8,652,998 - Tam , et al. February 18, 2 | 2014-02-18 |
Method for membrane protection during reactive ion/plasma etching processing for via or cavity formation in semiconductor manufacture Grant 8,431,491 - Balut , et al. April 30, 2 | 2013-04-30 |
Screen-printable encapsulants based on soluble polybenzoxazoles Grant 8,270,145 - Dueber , et al. September 18, 2 | 2012-09-18 |
Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers Grant 8,048,604 - Junk , et al. November 1, 2 | 2011-11-01 |
Hydrofluoroalkanesulfonic Acids and Salts from Fluorovinyl Ethers App 20110039203 - JUNK; CHRISTOPHER P. ;   et al. | 2011-02-17 |
Photoresist compositions and processes for preparing the same Grant 7,834,113 - Sounik , et al. November 16, 2 | 2010-11-16 |
Hydrofluoroalkanesulfonic acids from fluorovinyl ethers Grant 7,834,209 - Junk , et al. November 16, 2 | 2010-11-16 |
Method For Membrane Protection During Reactive Ion/plasma Etching Processing For Via Or Cavity Formation In Semiconductor Manufacture App 20100112820 - BALUT; CHESTER E. ;   et al. | 2010-05-06 |
Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography Grant 7,696,292 - Farnham , et al. April 13, 2 | 2010-04-13 |
Screen-printable Encapsulants Based On Soluble Polybenzoxazoles App 20090141425 - Dueber; Thomas Eugene ;   et al. | 2009-06-04 |
Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers Grant 7,507,522 - Crawford , et al. March 24, 2 | 2009-03-24 |
Low-polydispersity photoimageable polymers and photoresists and processes for microlithography Grant 7,408,013 - Feiring , et al. August 5, 2 | 2008-08-05 |
Photoresists and processes for microlithography Grant 7,261,993 - Schadt, III , et al. August 28, 2 | 2007-08-28 |
Fluorinated polymers, photoresists and processes for microlithography Grant 7,217,495 - Feiring , et al. May 15, 2 | 2007-05-15 |
Photoresists with hydroxylated, photoacid-cleavable groups Grant 7,022,457 - Farnham , et al. April 4, 2 | 2006-04-04 |
Compositions for microlithography Grant 6,974,657 - Berger , et al. December 13, 2 | 2005-12-13 |
Polymers for photoresist compositions for microlithography Grant 6,951,705 - Fryd , et al. October 4, 2 | 2005-10-04 |
Photoresists and processes for microlithography Grant 6,884,562 - Schadt, III , et al. April 26, 2 | 2005-04-26 |
Preparation and use of EXO-2-fluoroalkyl(bicyclo[2.2.1] hept-5-enes) Grant 6,875,555 - Feiring , et al. April 5, 2 | 2005-04-05 |
Copolymers for photoresists and processes therefor Grant 6,872,503 - Wheland , et al. March 29, 2 | 2005-03-29 |
Fluorinated polymers, photoresists and processes for microlithography Grant 6,790,587 - Feiring , et al. September 14, 2 | 2004-09-14 |
Polymers for photoresist compositions for microlithography App 20030211417 - Fryd, Michael ;   et al. | 2003-11-13 |
Flexible, flame-retardant, aqueous-processable photoimageable composition for coating flexible printed circuits Grant 6,218,074 - Dueber , et al. April 17, 2 | 2001-04-17 |
Flexible, aqueous processable, photoimageable permanent coatings for printed circuits Grant 5,728,505 - Dueber , et al. March 17, 1 | 1998-03-17 |
Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits Grant 5,643,657 - Dueber , et al. July 1, 1 | 1997-07-01 |