Schadt, III; Frank L.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Schadt, III; Frank L..The latest application filed is for "fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography".

Company Profile

0.12.6

Schadt, III; Frank L. - Wilmington DE
Schadt, III; Frank L - Wilmington DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography Grant 7,326,796 - Feiring , et al. February 5, 2	2008-02-05
Fluorinated polymers useful as photoresists, and processes for microlithography Grant 7,312,287 - Feiring , et al. December 25, 2	2007-12-25
Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography Grant 7,264,914 - Feiring , et al. September 4, 2	2007-09-04
Multilayer elements containing photoresist compositions and their use in microlithography Grant 7,205,086 - Berger , et al. April 17, 2	2007-04-17
Protecting groups in polymers, photoresists and processes for microlithography Grant 7,166,416 - Feiring , et al. January 23, 2	2007-01-23
Dissolution inhibitors in photoresist compositions for microlithography Grant 7,108,953 - Berger , et al. September 19, 2	2006-09-19
Fluorinated polymers useful as photoresists, and processes for microlithography App 20060166129 - Feiring; Andrew Edward ; et al.	2006-07-27
Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography App 20060167284 - Feiring; Andrew E. ; et al.	2006-07-27
Polymers blends and their use in photoresist compositions for microlithography Grant 7,045,268 - Berger , et al. May 16, 2	2006-05-16
Fluorinated copolymers for microlithography Grant 7,019,092 - Feiring , et al. March 28, 2	2006-03-28
Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography App 20050277052 - Feiring, Andrew E. ; et al.	2005-12-15
Dissolution inhibitors in photoresist compositions for microlithography App 20050260519 - Berger, Larry L. ; et al.	2005-11-24
Protecting groups in polymers, photoresists and processes for microlithography Grant 6,899,995 - Feiring , et al. May 31, 2	2005-05-31
Bases and surfactants and their use in photoresist compositions for microlithography App 20050100814 - Berger, Larry L. ; et al.	2005-05-12
Fluorinated polymers having ester groups and photoresists for microlithography Grant 6,884,564 - Feiring , et al. April 26, 2	2005-04-26
Photoresists, polymers and processes for microlithography Grant 6,849,377 - Feiring , et al. February 1, 2	2005-02-01
Compositions for microlithography App 20040033436 - Berger, Larry L. ; et al.	2004-02-19
Photographic element in which the antistatic layer is interlinked in the base Grant 4,225,665 - Schadt, III September 30, 1	1980-09-30

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