Schadt, Frank L. III

Patent Applications and Registrations

Patent applications and USPTO patent grants for Schadt, Frank L. III.The latest application filed is for "photoresists, fluoropolymers and processes for 157 nm microlithography".

Company Profile

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Schadt, Frank L. III - Wilmington DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photoresists, fluoropolymers and processes for 157 nm microlithography App 20050239984 - Feiring, Andrew E. ; et al.	2005-10-27
Protecting groups in polymers, photoresists and processes for microlithography App 20050191579 - Feiring, Andrew E. ; et al.	2005-09-01
Fluorinated polymers having ester groups and photoresists for microlithography App 20040180287 - Feiring, Andrew E ; et al.	2004-09-16
Polymers blends and their use in photoresist compositions for microlithography App 20040137360 - Berger, Larry L ; et al.	2004-07-15
Photoacid generators in photoresist compositions for microlithography App 20040106062 - Petrov, Viacheslav Alexandrovich ; et al.	2004-06-03
Polycyclic fluorine-containing polymers and photoresists for microlithography App 20040092686 - Feiring, Andrew E ; et al.	2004-05-13
Multilayer elements containing photoresist compositions and their use in microlithography App 20040038151 - Berger, Larry L ; et al.	2004-02-26
Protecting groups in polymers, photoresists and processes for microlithography App 20040023157 - Feiring, Adrew E ; et al.	2004-02-05
Photoresists, polymers and processes for microlithography App 20040023150 - Feiring, Andrew E. ; et al.	2004-02-05

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