| Patent | Date |
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Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20210313467 - SAYAMA; Hirokazu ; et al. | 2021-10-07 |
Semiconductor Device And Method Of Manufacturing The Same
App 20210249353 - SAYAMA; Hirokazu ; et al. | 2021-08-12 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The
App 20200227557 - SAYAMA; Hirokazu ; et al. | 2020-07-16 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20180069119 - SAYAMA; Hirokazu ; et al. | 2018-03-08 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 9,847,417 - Sayama , et al. December 19, 2 | 2017-12-19 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20170104099 - SAYAMA; Hirokazu ; et al. | 2017-04-13 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 9,614,081 - Sayama , et al. April 4, 2 | 2017-04-04 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20160315192 - SAYAMA; Hirokazu ; et al. | 2016-10-27 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 9,412,867 - Sayama , et al. August 9, 2 | 2016-08-09 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 9,349,816 - Ota , et al. May 24, 2 | 2016-05-24 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20160056289 - SAYAMA; Hirokazu ; et al. | 2016-02-25 |
Method Of Manufacturing Semiconductor Device With Offset Sidewall Structure
App 20160056254 - OTA; Kazunobu ; et al. | 2016-02-25 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 9,214,464 - Ota , et al. December 15, 2 | 2015-12-15 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 9,209,191 - Sayama , et al. December 8, 2 | 2015-12-08 |
Semiconductor Device Including A High Voltage P-channel Transistor And Method For Manufacturing The Same
App 20150340287 - SAYAMA; Hirokazu | 2015-11-26 |
Semiconductor Device And Method For Producing The Same
App 20150325486 - SAYAMA; Hirokazu | 2015-11-12 |
Semiconductor device including a high voltage P-channel transistor and method for manufacturing the same
Grant 9,129,841 - Sayama September 8, 2 | 2015-09-08 |
Semiconductor device and method for producing the same
Grant 9,112,013 - Sayama August 18, 2 | 2015-08-18 |
Method Of Manufacturing Semiconductor Device With Offset Sidewall Structure
App 20150194428 - OTA; Kazunobu ; et al. | 2015-07-09 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 8,987,081 - Ota , et al. March 24, 2 | 2015-03-24 |
Method Of Manufacturing Semiconductor Device With Offset Sidewall Structure
App 20140377920 - OTA; Kazunobu ; et al. | 2014-12-25 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20140322878 - SAYAMA; Hirokazu ; et al. | 2014-10-30 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 8,859,360 - Ota , et al. October 14, 2 | 2014-10-14 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 8,809,186 - Sayama , et al. August 19, 2 | 2014-08-19 |
Semiconductor device
Grant 8,742,497 - Sayama June 3, 2 | 2014-06-03 |
Method Of Manufacturing Semiconductor Device With Offset Sidewall Structure
App 20140113418 - Ota; Kazunobu ; et al. | 2014-04-24 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 8,642,418 - Ota , et al. February 4, 2 | 2014-02-04 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20140024194 - SAYAMA; Hirokazu ; et al. | 2014-01-23 |
Method Of Manufacturing Semiconductor Device With Offset Sidewall Structure
App 20130330890 - OTA; Kazunobu ; et al. | 2013-12-12 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 8,586,475 - Sayama , et al. November 19, 2 | 2013-11-19 |
Semiconductor Device
App 20130277738 - SAYAMA; Hirokazu | 2013-10-24 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 8,541,272 - Ota , et al. September 24, 2 | 2013-09-24 |
Semiconductor Device And Method For Producing The Same
App 20130234258 - SAYAMA; Hirokazu | 2013-09-12 |
Method Of Manufacturing Semiconductor Device With Offset Sidewall Structure
App 20130203223 - OTA; Kazunobu ; et al. | 2013-08-08 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20130130457 - SAYAMA; Hirokazu ; et al. | 2013-05-23 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 8,415,213 - Ota , et al. April 9, 2 | 2013-04-09 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 8,372,747 - Sayama , et al. February 12, 2 | 2013-02-12 |
Semiconductor Device And Method For Manufacturing The Same
App 20120153388 - SAYAMA; Hirokazu | 2012-06-21 |
Method Of Manufacturing Semiconductor Device With Offset Sidewall Structure
App 20110275185 - OTA; Kazunobu ; et al. | 2011-11-10 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20110207312 - Sayama; Hirokazu ; et al. | 2011-08-25 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 7,998,802 - Ota , et al. August 16, 2 | 2011-08-16 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 7,960,281 - Sayama , et al. June 14, 2 | 2011-06-14 |
Method Of Manufacturing Semiconductor Device With Offset Sidewall Structure
App 20090253235 - Ota; Kazunobu ; et al. | 2009-10-08 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 7,563,663 - Ota , et al. July 21, 2 | 2009-07-21 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 7,531,402 - Ota , et al. May 12, 2 | 2009-05-12 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20090081843 - SAYAMA; Hirokazu ; et al. | 2009-03-26 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 7,470,618 - Sayama , et al. December 30, 2 | 2008-12-30 |
Method Of Manufacturing Semiconductor Device With Offset Sidewall Structure
App 20070207578 - OTA; Kazunobu ; et al. | 2007-09-06 |
Method Of Manufacturing Semiconductor Device With Offset Sidewall Structure
App 20070202634 - OTA; Kazunobu ; et al. | 2007-08-30 |
Semiconductor Device Including Gate Electrode For Applying Tensile Stress To Silicon Substrate, And Method Of Manufacturing The Same
App 20070128816 - SAYAMA; Hirokazu ; et al. | 2007-06-07 |
Method of manufacturing semiconductor device with offset sidewall structure
Grant 7,220,637 - Ota , et al. May 22, 2 | 2007-05-22 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 7,183,204 - Sayama , et al. February 27, 2 | 2007-02-27 |
Semiconductor device and method of manufacturing same
App 20060273394 - Matsumoto; Takuji ; et al. | 2006-12-07 |
Semiconductor device and method of manufacturing same
Grant 7,109,553 - Matsumoto , et al. September 19, 2 | 2006-09-19 |
Method of manufacturing semiconductor device
Grant 7,015,107 - Sugihara , et al. March 21, 2 | 2006-03-21 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
App 20050202603 - Sayama, Hirokazu ; et al. | 2005-09-15 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
Grant 6,906,393 - Sayama , et al. June 14, 2 | 2005-06-14 |
Manufacturing method of semiconductor device
Grant 6,872,642 - Oda , et al. March 29, 2 | 2005-03-29 |
Method of manufacturing semiconductor device having gate electrode with expanded upper portion
Grant 6,835,610 - Sayama , et al. December 28, 2 | 2004-12-28 |
Semiconductor device and method of manufacturing same
App 20040222465 - Matsumoto, Takuji ; et al. | 2004-11-11 |
Semiconductor device having offset insulation film formed on insulation film, and method of manufacturing the same
Grant 6,806,537 - Matsumoto , et al. October 19, 2 | 2004-10-19 |
Manufacturing method of semiconductor device
App 20040101999 - Oda, Hidekazu ; et al. | 2004-05-27 |
Semiconductor device and manufacturing method thereof
Grant 6,740,939 - Sayama , et al. May 25, 2 | 2004-05-25 |
Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
App 20040097030 - Sayama, Hirokazu ; et al. | 2004-05-20 |
Method of manufacturing semiconductor device having gate electrode with expanded upper portion
App 20040043549 - Sayama, Hirokazu ; et al. | 2004-03-04 |
Method of manufacturing semiconductor device
Grant 6,670,277 - Sayama , et al. December 30, 2 | 2003-12-30 |
Method of manufacturing semiconductor device
Grant 6,667,206 - Sayama December 23, 2 | 2003-12-23 |
Method of manufacturing semiconductor device
App 20030170958 - Sugihara, Kohei ; et al. | 2003-09-11 |
Semiconductor device, method of manufacturing the same and exposure mask for implantation
Grant 6,600,180 - Ueno , et al. July 29, 2 | 2003-07-29 |
Semiconductor device
Grant 6,600,195 - Nishida , et al. July 29, 2 | 2003-07-29 |
Method of manufacturing semiconductor device with offset sidewall structure
App 20030059983 - Ota, Kazunobu ; et al. | 2003-03-27 |
Semiconductor device and method of manufacturing same
App 20030025135 - Matsumoto, Takuji ; et al. | 2003-02-06 |
Semiconductor device and manufacturing method thereof
App 20020164858 - Sayama, Hirokazu ; et al. | 2002-11-07 |
Method of manufacturing semiconductor device
App 20020160613 - Sayama, Hirokazu ; et al. | 2002-10-31 |
Semiconductor device and manufacturing method thereof
App 20020047163 - Sayama, Hirokazu ; et al. | 2002-04-25 |
Method of manufacturing semiconductor device
App 20020031883 - Sayama, Hirokazu | 2002-03-14 |
Method of manufacturing semiconductor device
Grant 6,344,388 - Oishi , et al. February 5, 2 | 2002-02-05 |
Semiconductor Device And Method Of Manufacturing Seciconductor Device
App 20020006706 - NISHIDA, YUKIO ; et al. | 2002-01-17 |
Semiconductor device manufacturing method
Grant 6,335,252 - Oishi , et al. January 1, 2 | 2002-01-01 |
Semiconductor device and manufacturing method thereof
Grant 6,281,558 - Sayama , et al. August 28, 2 | 2001-08-28 |
Semiconductor device and method of manufacturing the same
Grant 6,218,262 - Kuroi , et al. April 17, 2 | 2001-04-17 |
Semiconductor device and method of fabricating thereof
Grant 6,017,800 - Sayama , et al. January 25, 2 | 2000-01-25 |
Semiconductor device and method of manufacturing the same
Grant 5,889,335 - Kuroi , et al. March 30, 1 | 1999-03-30 |
Complementary MOS field effect transistor with tunnel effect means
Grant 5,744,845 - Sayama , et al. April 28, 1 | 1998-04-28 |
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