Sawano; Atsushi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sawano; Atsushi.The latest application filed is for "material for forming protective film and method for forming photoresist pattern".

Company Profile

0.9.12

Sawano; Atsushi - Kanagawa N/A JP
Sawano; Atsushi - Kawasaki JP
SAWANO; Atsushi - Kawasaki-shi JP
Sawano; Atsushi - Kanagawa-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition for antireflection film formation and method for resist pattern formation using the composition Grant 8,455,182 - Sawano , et al. June 4, 2	2013-06-04
Detergent for lithography and method of forming resist pattern with the same Grant 8,367,312 - Sawada , et al. February 5, 2	2013-02-05
Application liquid and method for formation of a silica-based coating film using the application liquid Grant 8,323,745 - Yamadaya , et al. December 4, 2	2012-12-04
Anti-reflection film forming material, and method for forming resist pattern using the same Grant 8,216,775 - Shirai , et al. July 10, 2	2012-07-10
Composition for formation of anti-reflection film, and method for formation of resist pattern using the same Grant 8,158,328 - Sawano , et al. April 17, 2	2012-04-17
Material For Forming Protective Film And Method For Forming Photoresist Pattern App 20110065053 - YOSHIDA; Masaaki ; et al.	2011-03-17
Application Liquid And Method For Formation Of A Silica-based Coating Film Using The Application Liquid App 20100247799 - YAMADAYA; Tokunori ; et al.	2010-09-30
Composition For Antireflection Film Formation And Method Of Forming Resist Pattern With The Same App 20100104978 - Sawano; Atsushi ; et al.	2010-04-29
Composition For Antireflection Film Formation And Method For Resist Pattern Formation Using The Composition App 20100104987 - Sawano; Atsushi ; et al.	2010-04-29
Coating Formation Agent For Pattern Micro-fabrication, And Micropattern Formation Method Using The Same App 20100090372 - Ishikawa; Kiyoshi ; et al.	2010-04-15
Anti-reflection film forming material, and method for forming resist pattern using the same App 20090253077 - Shirai; Yuriko ; et al.	2009-10-08
Detergent For Lithography And Method Of Forming Resist Pattern With The Same App 20090004608 - Sawada; Yoshihiro ; et al.	2009-01-01
Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio Grant 6,884,566 - Nakamura , et al. April 26, 2	2005-04-26
Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio App 20040096772 - Nakamura, Tsuyoshi ; et al.	2004-05-20
Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio App 20030186171 - Nakamura, Tsuyoshi ; et al.	2003-10-02
Positive photoresist composition App 20020061458 - Hidesaka, Shinichi ; et al.	2002-05-23
Novel copolymer, photoresist composition , and process for forming resist pattern with high aspect ratio App 20020031720 - Nakamura, Tsuyoshi ; et al.	2002-03-14
Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio App 20020031719 - Nakamura, Tsuyoshi ; et al.	2002-03-14
Positive photoresist compositions and multilayer resist materials using the same Grant 5,728,504 - Hosoda , et al. March 17, 1	1998-03-17

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