Sauerhoefer; Alexander

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sauerhoefer; Alexander.The latest application filed is for "optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus".

Company Profile

0.8.5

Sauerhoefer; Alexander - Hamburg DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus Grant 9,639,007 - Laufer , et al. May 2, 2	2017-05-02
Optical Arrangement In An Optical System, In Particular In A Microlithographic Projection Exposure Apparatus App 20150346612 - Laufer; Timo ; et al.	2015-12-03
Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus Grant 9,134,504 - Laufer , et al. September 15, 2	2015-09-15
Optical element and method Grant 8,891,172 - Eva , et al. November 18, 2	2014-11-18
Optical element and method Grant 8,508,854 - Eva , et al. August 13, 2	2013-08-13
Optical correction device Grant 8,325,322 - Hauf , et al. December 4, 2	2012-12-04
Optical Arrangement In An Optical System, In Particular In A Microlithographic Projection Exposure Apparatus App 20120154772 - Laufer; Timo ; et al.	2012-06-21
Optical Element And Method App 20110080569 - Eva; Eric ; et al.	2011-04-07
Optical Correction Device App 20100201958 - Hauf; Markus ; et al.	2010-08-12
Optical Element And Method App 20090257032 - Eva; Eric ; et al.	2009-10-15

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