Satoh; Ichiju
Patent Applications and Registrations
Patent applications and USPTO patent grants for Satoh; Ichiju.The latest application filed is for "substrate rotation device, substrate cleaning device, substrate processing device, and control method for substrate rotation dev".
- Satoh; Ichiju - Tokyo JP
- Satoh; Ichiju - Kanagawa-ken JP
- Satoh; Ichiju - Fujisawa JP
- Satoh; Ichiju - Fujisawa-shi Kanagawa 251-8502 JP
| Patent | Date |
|---|---|
| Substrate Rotation Device, Substrate Cleaning Device, Substrate Processing Device, And Control Method For Substrate Rotation Dev App 20200047310 - Satoh; Ichiju ; et al. | 2020-02-13 |
| Vibration isolation system for a vacuum chamber App 20060042059 - Satoh; Ichiju ; et al. | 2006-03-02 |
| Polishing apparatus including attitude controller for turntable and/or wafer carrier Grant 6,354,907 - Satoh , et al. March 12, 2 | 2002-03-12 |
| Damper device and turbomolecular pump with damper device Grant 6,213,737 - Murakami , et al. April 10, 2 | 2001-04-10 |
| Filter circuit Grant 6,212,540 - Murakami , et al. April 3, 2 | 2001-04-03 |
| Polishing apparatus Grant 5,951,368 - Watanabe , et al. September 14, 1 | 1999-09-14 |
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