Sato; Yuuji
Patent Applications and Registrations
Patent applications and USPTO patent grants for Sato; Yuuji.The latest application filed is for "sputtering target material".
- Sato; Yuuji - Waki JP
- Sato; Yuuji - Iwaki-shi JP
- Sato; Yuuji - Iwaki JP
| Patent | Date |
|---|---|
| Sputtering target material Grant 11,427,888 - Mori , et al. August 30, 2 | 2022-08-30 |
| Sputtering Target Material App 20210010105 - Mori; Satoru ; et al. | 2021-01-14 |
| High purity copper sputtering target material Grant 10,889,889 - Mori , et al. January 12, 2 | 2021-01-12 |
| High Purity Copper Sputtering Target Material App 20180237901 - Mori; Satoru ; et al. | 2018-08-23 |
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