Sato; Tatsuya E.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sato; Tatsuya E..The latest application filed is for "methods of atomic layer deposition".

Company Profile

5.11.15

Sato; Tatsuya E. - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Amorphous silicon doped yttrium oxide films and methods of formation Grant 11,370,669 - Sato , et al. June 28, 2	2022-06-28
Methods Of Atomic Layer Deposition App 20220081769 - Chaney; Kendrick H. ; et al.	2022-03-17
Apparatus and methods for depositing ALD films with enhanced chemical exchange Grant 11,015,246 - Sato May 25, 2	2021-05-25
Thermal Ald Of Metal Oxide Using Issg App 20210002765 - Sato; Tatsuya E.	2021-01-07
Treatments to enhance material structures Grant 10,872,763 - Chu , et al. December 22, 2	2020-12-22
Treatments To Enhance Material Structures App 20200350157 - Chu; David ; et al.	2020-11-05
Methods For Metal Oxide Post-Treatment App 20200165725 - Sato; Tatsuya E. ; et al.	2020-05-28
Gap-Fill With Aluminum-Containing Films App 20200095674 - Saly; Mark ; et al.	2020-03-26
Amorphous Silicon Doped Yttrium Oxide Films And Methods of Formation App 20190221426 - Sato; Tatsuya E. ; et al.	2019-07-18
Method Of Fabricating Air-gap Spacer For N7/n5 Finfet And Beyond App 20180122945 - CHANG; Chih-Yang ; et al.	2018-05-03
Method of fabricating air-gap spacer for N7/N5 finFET and beyond Grant 9,960,275 - Chang , et al. May 1, 2	2018-05-01
Apparatus And Methods For Depositing ALD Films With Enhanced Chemical Exchange App 20170321325 - Sato; Tatsuya E.	2017-11-09
Atomic layer deposition of films using spatially separated injector chamber Grant 9,698,009 - Sato , et al. July 4, 2	2017-07-04
Injector For Spatially Separated Atomic Layer Deposition Chamber App 20160215392 - Yudovsky; Joseph ; et al.	2016-07-28
Atomic Layer Deposition Of Films Using Spatially Separated Injector Chamber App 20160217999 - Sato; Tatsuya E. ; et al.	2016-07-28
In situ vapor phase surface activation of SiO.sub.2 Grant 8,778,816 - Sato , et al. July 15, 2	2014-07-15
Methods for manufacturing high dielectric constant films Grant 8,633,119 - Sato , et al. January 21, 2	2014-01-21
Methods for manufacturing high dielectric constant films Grant 8,633,114 - Sato , et al. January 21, 2	2014-01-21
Methods For Manufacturing High Dielectric Constant Films App 20120289063 - Sato; Tatsuya E. ; et al.	2012-11-15
Methods for Manufacturing High Dielectric Constant Films App 20120289052 - SATO; TATSUYA E. ; et al.	2012-11-15
Dry Chemical Cleaning For Semiconductor Processing App 20120220116 - Noori; Atif ; et al.	2012-08-30
In-Situ Hydroxylation System App 20120201959 - Choi; Kenric ; et al.	2012-08-09
In Situ Vapor Phase Surface Activation Of SiO2 App 20120202357 - Sato; Tatsuya E. ; et al.	2012-08-09

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.