| Patent | Date |
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Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing
Grant 10,879,044 - Wang , et al. December 29, 2 | 2020-12-29 |
Gas plenum arrangement for improving etch non-uniformity in transformer-coupled plasma systems
Grant 10,431,426 - Kamp , et al. O | 2019-10-01 |
Cycle-averaged frequency tuning for low power voltage mode operation
Grant 10,347,464 - Sato July 9, 2 | 2019-07-09 |
Systems and methods for reversing RF current polarity at one output of a multiple output RF matching network
Grant 10,332,725 - Sato , et al. | 2019-06-25 |
Systems and methods for calibrating conversion models and performing position conversions of variable capacitors in match networks of plasma processing systems
Grant 10,297,422 - Sato | 2019-05-21 |
Auxiliary Circuit In Rf Matching Network For Frequency Tuning Assisted Dual-level Pulsing
App 20180294566 - Wang; Yuhou ; et al. | 2018-10-11 |
Systems And Methods For Calibrating Conversion Models And Performing Position Conversions Of Variable Capacitors In Match Networks Of Plasma Processing Systems
App 20170125218 - Sato; Arthur H. | 2017-05-04 |
Cycle-averaged Frequency Tuning For Low Power Voltage Mode Operation
App 20170076916 - Sato; Arthur H. | 2017-03-16 |
Gas Plenum Arrangement For Improving Etch Non-uniformity In Transformer-coupled Plasma Systems
App 20170032931 - KAMP; Tom ; et al. | 2017-02-02 |
Systems And Methods For Reversing Rf Current Polarity At One Output Of A Multpile Output Rf Matching Network
App 20160293382 - Sato; Arthur H. ; et al. | 2016-10-06 |
Electrode for use in measuring dielectric properties of parts
Grant 9,322,795 - Kim , et al. April 26, 2 | 2016-04-26 |
Methods for automatically determining capacitor values and systems thereof
Grant 8,828,259 - Sato September 9, 2 | 2014-09-09 |
Synchronized and shortened master-slave RF pulsing in a plasma processing chamber
Grant 8,692,467 - Benjamin , et al. April 8, 2 | 2014-04-08 |
Electrode for Use in Measuring Dielectric Properties of Parts
App 20130241581 - Kim; Jaehyun ; et al. | 2013-09-19 |
Electrode for use in measuring dielectric properties of parts
Grant 8,519,724 - Kim , et al. August 27, 2 | 2013-08-27 |
Synchronized And Shortened Master-slave Rf Pulsing In A Plasma Processing Chamber
App 20130009545 - Benjamin; Neil Martin Paul ; et al. | 2013-01-10 |
Methods For Automatically Determining Capacitor Values And Systems Thereof
App 20130008871 - Sato; Arthur H. | 2013-01-10 |
Apparatus for measuring dielectric properties of parts
Grant 8,269,510 - Kim , et al. September 18, 2 | 2012-09-18 |
Methods for measuring dielectric properties of parts
Grant 7,973,539 - Kim , et al. July 5, 2 | 2011-07-05 |
Methods For Measuring Dielectric Properties Of Parts
App 20110140715 - Kim; Jaehyun ; et al. | 2011-06-16 |
Methods for measuring dielectric properties of parts
Grant 7,911,213 - Kim , et al. March 22, 2 | 2011-03-22 |
Methods for characterizing dielectric properties of parts
Grant 7,777,500 - Kim , et al. August 17, 2 | 2010-08-17 |
Methods for Measuring Dielectric Properties of Parts
App 20100079152 - Kim; Jaehyun ; et al. | 2010-04-01 |
Apparatus for Measuring Dielectric Properties of Parts
App 20090091340 - Kim; Jaehyun ; et al. | 2009-04-09 |
Methods for Characterizing Dielectric Properties of Parts
App 20090091335 - Kim; Jaehyun ; et al. | 2009-04-09 |
Electrode for Use in Measuring Dielectric Properties of Parts
App 20090091341 - Kim; Jaehyun ; et al. | 2009-04-09 |
Method of eliminating notching when anisotropically etching small linewidth openings in silicon on insulator
App 20030003748 - Khan, Anisul ; et al. | 2003-01-02 |
Pulsed RF power delivery for plasma processing
Grant 6,472,822 - Chen , et al. October 29, 2 | 2002-10-29 |
Plasma reactor with dynamic RF inductive and capacitive coupling control
Grant 6,447,636 - Qian , et al. September 10, 2 | 2002-09-10 |
Plasma reactor inductive coil antenna with flat surface facing the plasma
Grant 6,401,652 - Mohn , et al. June 11, 2 | 2002-06-11 |
Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal
Grant 6,297,468 - Qian , et al. October 2, 2 | 2001-10-02 |
Plasma reactor with coil antenna of interleaved conductors
App 20010004000 - Qian, Xue-Yu ; et al. | 2001-06-21 |
Plasma reactor with coil antenna of plural helical conductors with equally spaced ends
App 20010001201 - Qian, Xue-Yu ; et al. | 2001-05-17 |
Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions
App 20010000898 - Qian, Xue-Yu ; et al. | 2001-05-10 |
Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry
App 20010000604 - Qian, Xue-Yu ; et al. | 2001-05-03 |
Inductively coupled plasma reactor with an inductive coil antenna having independent loops
Grant 6,016,131 - Sato , et al. January 18, 2 | 2000-01-18 |
Inductively coupled plasma reactor with an inductive coil antenna having independent loops
Grant 5,907,221 - Sato , et al. May 25, 1 | 1999-05-25 |
Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same
Grant 5,801,386 - Todorov , et al. September 1, 1 | 1998-09-01 |
Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling
Grant 5,683,539 - Qian , et al. November 4, 1 | 1997-11-04 |
Plasma reactor with a segmented balanced electrode for sputtering process materials from a target surface
Grant 5,565,074 - Qian , et al. October 15, 1 | 1996-10-15 |
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