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Dispositioning defects detected on extreme ultraviolet photomasks
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Dispositioning Defects Detected On Extreme Ultraviolet Photomasks
App 20200096862 - Tolani; Vikram ; et al. | 2020-03-26 |
Technique for repairing a reflective photo-mask
Grant 9,696,619 - Satake , et al. July 4, 2 | 2017-07-04 |
Film-growth model using level sets
Grant 9,547,233 - Peng , et al. January 17, 2 | 2017-01-17 |
Technique for repairing an EUV photo-mask
Grant 9,494,854 - Satake , et al. November 15, 2 | 2016-11-15 |
Technique For Repairing A Reflective Photo-mask
App 20150185601 - Satake; Masaki ; et al. | 2015-07-02 |
Technique for repairing a reflective photo-mask
Grant 9,005,852 - Satake , et al. April 14, 2 | 2015-04-14 |
Technique for Repairing an EUV Photo-Mask
App 20140272676 - Satake; Masaki ; et al. | 2014-09-18 |
Film-Growth Model Using Level Sets
App 20140278231 - Peng; Daniel Ping ; et al. | 2014-09-18 |
Technique for Repairing a Reflective Photo-Mask
App 20140072903 - Satake; Masaki ; et al. | 2014-03-13 |
Mask pattern correcting method
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Projection exposure method
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Pattern prediction method, pattern correction method, semiconductor device, and recording medium
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Lithography simulation method, method of manufacturing a semiconductor device and program
Grant 7,870,532 - Satake January 11, 2 | 2011-01-11 |
Creating method of simulation model, manufacturing method of photo mask, manufacturing method of semiconductor device, and recording medium
Grant 7,840,390 - Satake , et al. November 23, 2 | 2010-11-23 |
Lithography simulation method, program and semiconductor device manufacturing method
Grant 7,831,953 - Satake , et al. November 9, 2 | 2010-11-09 |
Lithography simulation method, photomask manufacturing method, semiconductor device manufacturing method, and recording medium
Grant 7,784,017 - Satake , et al. August 24, 2 | 2010-08-24 |
Feature-quantity Extracting Method, Designed-circuit-pattern Verifying Method, And Computer Program Product
App 20100166289 - SATAKE; Masaki ; et al. | 2010-07-01 |
Process Model Evaluation Method, Process Model Generation Method And Process Model Evaluation Program
App 20100081295 - TAKAHASHI; Masanori ; et al. | 2010-04-01 |
Projection Exposure Method
App 20090244504 - Kitamura; Yosuke ; et al. | 2009-10-01 |
Pattern Prediction Method, Pattern Correction Method, Method Of Fabricating Semiconductor Device, And Recording Medium
App 20090233193 - TANAKA; Satoshi ; et al. | 2009-09-17 |
Mask Pattern Correcting Method
App 20080301621 - FUKUHARA; Kazuya ; et al. | 2008-12-04 |
Lithography Simulation Method, Method Of Manufacturing A Semiconductor Device And Program
App 20080220376 - Satake; Masaki | 2008-09-11 |
Simulation model making method
App 20080134131 - Asano; Masafumi ; et al. | 2008-06-05 |
Creating method of simulation model, manufacturing method of photo mask, manufacturing method of semiconductor device, and recording medium
App 20080004852 - Satake; Masaki ; et al. | 2008-01-03 |
Lithography simulation method, program and semiconductor device manufacturing method
App 20070277146 - Satake; Masaki ; et al. | 2007-11-29 |
Lithography simulation method, photomask manufacturing method, semiconductor device manufacturing method, and recording medium
App 20070245292 - Satake; Masaki ; et al. | 2007-10-18 |
Method for fabricating a silicon nanocrystal, silicon nanocrystal, method for fabricating a floating gate type memory capacitor structure, and floating gate type memory capacitor structure
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Magnetic recording medium comprising ferromagnetic powder and a specified polyurethane resin
Grant 5,702,821 - Murayama , et al. December 30, 1 | 1997-12-30 |
Magnetic recording medium having a magnetic layer containing ferromagnetic powder and a polyurethane resin obtained from a polyolefin polyol or a polybutadiene polyol
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