loadpatents
name:-0.01163911819458
name:-0.0060069561004639
name:-0.00042486190795898
Sasaki; Shiho Patent Filings

Sasaki; Shiho

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sasaki; Shiho.The latest application filed is for "gradated photomask and its fabrication process".

Company Profile
0.4.7
  • Sasaki; Shiho - Tokyo JP
  • Sasaki; Shiho - Sakado JP
  • Sasaki, Shiho - Sakado-shi JP
  • Sasaki, Shiho - Tokyo-to JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Gradated photomask and its fabrication process
Grant 8,124,301 - Fujikawa , et al. February 28, 2
2012-02-28
Gradated Photomask And Its Fabrication Process
App 20090220867 - Fujikawa; Junji ;   et al.
2009-09-03
Euv Exposure Mask Blanks And Their Fabrication Process, And Euv Exposure Mask
App 20070015065 - ABE; Tsukasa ;   et al.
2007-01-18
Post exposure modification of critical dimensions in mask fabrication
Grant 7,045,259 - Ohfuji , et al. May 16, 2
2006-05-16
Post exposure modification of critical dimensions in mask fabrication
Grant 7,045,260 - Ohfuji , et al. May 16, 2
2006-05-16
Post exposure modification of critical dimensions in mask fabrication
App 20040197713 - Ohfuji, Takeshi ;   et al.
2004-10-07
Post exposure modification of critical dimensions in mask fabrication
Grant 6,801,295 - Inomata , et al. October 5, 2
2004-10-05
Method for manufacturing resist pattern
App 20030194619 - Sasaki, Shiho ;   et al.
2003-10-16
Manufacturing method of photomask
App 20030143472 - Koizumi, Yasuhiro ;   et al.
2003-07-31
Post exposure modification of critical dimensions in mask fabrication
App 20030059719 - Ohfuji, Takeshi ;   et al.
2003-03-27
Post exposure modification of critical dimensions in mask fabrication
App 20030059688 - Inomata, Hiroyuki ;   et al.
2003-03-27

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