Sapre; Kedar

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sapre; Kedar.The latest application filed is for "interactive training of a machine learning model for tissue segmentation".

Company Profile

3.13.19

Sapre; Kedar - San Jose CA
- San Jose CA US
Sapre; Kedar - US
Sapre; Kedar - Mountain View CA US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Interactive Training Of A Machine Learning Model For Tissue Segmentation App 20220261992 - Jha; Sumit Kumar ; et al.	2022-08-18
Interactive training of a machine learning model for tissue segmentation Grant 11,321,839 - Jha , et al. May 3, 2	2022-05-03
Interactive Training Of A Machine Learning Model For Tissue Segmentation App 20210090251 - Jha; Sumit Kumar ; et al.	2021-03-25
Intrench profile Grant 9,012,302 - Sapre , et al. April 21, 2	2015-04-21
Intrench Profile App 20150031211 - Sapre; Kedar ; et al.	2015-01-29
Intrench profile Grant 8,927,390 - Sapre , et al. January 6, 2	2015-01-06
Tungsten Deposition Sequence App 20140273451 - Wang; Benjamin C. ; et al.	2014-09-18
Double patterning etching process Grant 8,759,223 - Sapre , et al. June 24, 2	2014-06-24
Liner property improvement Grant 08617989 -	2013-12-31
Liner property improvement Grant 8,617,989 - Sapre , et al. December 31, 2	2013-12-31
Intrench Profile App 20130260533 - Sapre; Kedar ; et al.	2013-10-03
Insensitive Dry Removal Process For Semiconductor Integration App 20130260564 - Sapre; Kedar ; et al.	2013-10-03
Pretreatment And Improved Dielectric Coverage App 20130252440 - Luo; Lei ; et al.	2013-09-26
Liner Property Improvement App 20130102149 - Sapre; Kedar ; et al.	2013-04-25
Conformality of oxide layers along sidewalls of deep vias Grant 8,404,583 - Hua , et al. March 26, 2	2013-03-26
Double Patterning Etching Process App 20130048605 - SAPRE; Kedar ; et al.	2013-02-28
Reduced pattern loading using bis(diethylamino)silane (C.sub.8H.sub.22N.sub.2Si) as silicon precursor Grant 8,236,708 - Kweskin , et al. August 7, 2	2012-08-07
Silicon-selective dry etch for carbon-containing films Grant 8,211,808 - Sapre , et al. July 3, 2	2012-07-03
Self Aligned Triple Patterning App 20120085733 - Mebarki; Bencherki ; et al.	2012-04-12
Methods For Forming Low Moisture Dielectric Films App 20120058281 - Hua; Zhong Qiang ; et al.	2012-03-08
REDUCED PATTERN LOADING USING BIS(DIETHYLAMINO)SILANE (C8H22N2Si) AS SILICON PRECURSOR App 20110223774 - Kweskin; Sasha ; et al.	2011-09-15
Conformality Of Oxide Layers Along Sidewalls Of Deep Vias App 20110223760 - Hua; Zhong Qiang ; et al.	2011-09-15
Silicon-ozone CVD with reduced pattern loading using incubation period deposition Grant 7,994,019 - Kweskin , et al. August 9, 2	2011-08-09
Silicon-selective Dry Etch For Carbon-containing Films App 20110053380 - Sapre; Kedar ; et al.	2011-03-03
Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen Grant 7,825,038 - Ingle , et al. November 2, 2	2010-11-02
Chemical Vapor Deposition Of High Quality Flow-like Silicon Dioxide Using A Silicon Containing Precursor And Atomic Oxygen App 20090031953 - Ingle; Nitin K. ; et al.	2009-02-05
Oxygen Sacvd To Form Sacrifical Oxide Liners In Substrate Gaps App 20080311753 - Zheng; Yi ; et al.	2008-12-18
Chemical Vapor Deposition Of High Quality Flow-like Silicon Dioxide Using A Silicon Containing Precursor And Atomic Oxygen App 20070281496 - Ingle; Nitin K. ; et al.	2007-12-06

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.