Patent | Date |
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Phase change memory cell with a wrap around and ring type of electrode contact and a projection liner Grant 11,456,415 - Ok , et al. September 27, 2 | 2022-09-27 |
Phase Change Memory Cell With A Wrap Around And Ring Type Of Electrode Contact And A Projection Liner App 20220181546 - Ok; Injo ;   et al. | 2022-06-09 |
Approach to bottom dielectric isolation for vertical transport fin field effect transistors Grant 11,302,797 - Bi , et al. April 12, 2 | 2022-04-12 |
Phase change memory device Grant 11,264,569 - Ok , et al. March 1, 2 | 2022-03-01 |
Metal Via Structure App 20220005762 - Mignot; Yann ;   et al. | 2022-01-06 |
Contacts And Liners Having Multi-segmented Protective Caps App 20210351073 - Fullam; Jennifer ;   et al. | 2021-11-11 |
Contacts and liners having multi-segmented protective caps Grant 11,171,051 - Fullam , et al. November 9, 2 | 2021-11-09 |
Metal via structure Grant 11,152,298 - Mignot , et al. October 19, 2 | 2021-10-19 |
Uniform work function metal recess for vertical transistor complementary metal oxide semiconductor technology Grant 11,133,308 - Xie , et al. September 28, 2 | 2021-09-28 |
Self-aligned gate and junction for VTFET Grant 11,075,280 - Liu , et al. July 27, 2 | 2021-07-27 |
Svia using a single damascene interconnect Grant 11,037,822 - Mignot , et al. June 15, 2 | 2021-06-15 |
Phase Change Memory Device App 20210135104 - Ok; Injo ;   et al. | 2021-05-06 |
Removal of trilayer resist without damage to underlying structure Grant 10,957,536 - Sankarapandian , et al. March 23, 2 | 2021-03-23 |
Transistor having straight bottom spacers Grant 10,943,992 - Cheng , et al. March 9, 2 | 2021-03-09 |
Nanosheet eDRAM Grant 10,937,789 - Reznicek , et al. March 2, 2 | 2021-03-02 |
Silicon residue removal in nanosheet transistors Grant 10,896,816 - Bi , et al. January 19, 2 | 2021-01-19 |
Controlling via critical dimension with a titanium nitride hard mask Grant 10,886,197 - Mignot , et al. January 5, 2 | 2021-01-05 |
Metal Via Structure App 20200388567 - Mignot; Yann ;   et al. | 2020-12-10 |
Approach to bottom dielectric isolation for vertical transport fin field effect transistors Grant 10,840,354 - Bi , et al. November 17, 2 | 2020-11-17 |
Transistor Having Straight Bottom Spacers App 20200357894 - Cheng; Kangguo ;   et al. | 2020-11-12 |
Svia Using A Single Damascene Interconnect App 20200357692 - Mignot; Yann ;   et al. | 2020-11-12 |
Uniform Work Function Metal Recess For Vertical Transistor Complementary Metal Oxide Semiconductor Technology App 20200350313 - XIE; RUILONG ;   et al. | 2020-11-05 |
Single trench damascene interconnect using TiN HMO Grant 10,825,720 - Mignot , et al. November 3, 2 | 2020-11-03 |
Self-Aligned Gate and Junction for VTFET App 20200335601 - Liu; Zuoguang ;   et al. | 2020-10-22 |
Enabling Residue Free Gap Fill Between Nanosheets App 20200279956 - SESHADRI; Indira ;   et al. | 2020-09-03 |
Crossbar reinforced semiconductor fins having reduced wiggling Grant 10,755,963 - Cheng , et al. A | 2020-08-25 |
Highly selective dry etch process for vertical FET STI recess Grant 10,734,245 - Bi , et al. | 2020-08-04 |
Vertical field-effect-transistors having a silicon oxide layer with controlled thickness Grant 10,707,326 - Liu , et al. | 2020-07-07 |
Method to recess cobalt for gate metal application Grant 10,707,132 - Jacobi , et al. | 2020-07-07 |
Approach To Bottom Dielectric Isolation For Vertical Transport Fin Field Effect Transistors App 20200212202 - Bi; Zhenxing ;   et al. | 2020-07-02 |
Protection of high-K dielectric during reliability anneal on nanosheet structures Grant 10,692,985 - Loubet , et al. | 2020-06-23 |
Controlling Via Critical Dimension With A Titanium Nitride Hard Mask App 20200194343 - Mignot; Yann ;   et al. | 2020-06-18 |
Vertical transistors with improved top source/drain junctions Grant 10,680,081 - Cheng , et al. | 2020-06-09 |
Enabling residue free gap fill between nanosheets Grant 10,658,521 - Seshadri , et al. | 2020-05-19 |
Crossbar Reinforced Semiconductor Fins Having Reduced Wiggling App 20200135539 - Cheng; Kangguo ;   et al. | 2020-04-30 |
Highly Selective Dry Etch Process for Vertical FET STI Recess App 20200126805 - Bi; Zhenxing ;   et al. | 2020-04-23 |
Approach to bottom dielectric isolation for vertical transport fin field effect transistors Grant 10,629,702 - Bi , et al. | 2020-04-21 |
Method to recess cobalt for gate metal application Grant 10,615,078 - Jacobi , et al. | 2020-04-07 |
Controlling via critical dimension during fabrication of a semiconductor wafer Grant 10,607,922 - Mignot , et al. | 2020-03-31 |
Removal Of Trilayer Resist Without Damage To Underlying Structure App 20200066519 - Sankarapandian; Muthumanickam ;   et al. | 2020-02-27 |
Single Trench Damascene Interconnect Using TiN HMO App 20200066575 - Mignot; Yann ;   et al. | 2020-02-27 |
Method to recess cobalt for gate metal application Grant 10,546,785 - Jacobi , et al. Ja | 2020-01-28 |
Method To Recess Cobalt For Gate Metal Application App 20190385913 - Jacobi; Georges ;   et al. | 2019-12-19 |
Method To Recess Cobalt For Gate Metal Application App 20190385912 - Jacobi; Georges ;   et al. | 2019-12-19 |
NANOSHEET eDRAM App 20190378842 - Reznicek; Alexander ;   et al. | 2019-12-12 |
Enabling Residue Free Gap Fill Between Nanosheets App 20190355851 - SESHADRI; Indira ;   et al. | 2019-11-21 |
Methods of forming merged source/drain regions on integrated circuit products Grant 10,475,904 - Niimi , et al. Nov | 2019-11-12 |
Wafer element with an adjusted print resolution assist feature Grant 10,395,938 - Mignot , et al. A | 2019-08-27 |
Wafer element with an adjusted print resolution assist feature Grant 10,395,936 - Mignot , et al. A | 2019-08-27 |
Vertical transistors with improved top source/drain junctions Grant 10,396,208 - Cheng , et al. A | 2019-08-27 |
Undercut control in isotropic wet etch processes Grant 10,374,034 - Liu , et al. | 2019-08-06 |
Methods Of Forming Merged Source/drain Regions On Integrated Circuit Products App 20190214484 - Niimi; Hiroaki ;   et al. | 2019-07-11 |
Vertical Field-effect-transistors Having A Silicon Oxide Layer With Controlled Thickness App 20190189775 - LIU; Chi-Chun ;   et al. | 2019-06-20 |
Protection Of High-k Dielectric During Reliability Anneal On Nanosheet Structures App 20190189766 - Loubet; Nicolas J. ;   et al. | 2019-06-20 |
Protection of high-K dielectric during reliability anneal on nanosheet structures Grant 10,304,936 - Loubet , et al. | 2019-05-28 |
Vertical Field-effect-transistors Having A Silicon Oxide Layer With Controlled Thickness App 20190109212 - LIU; Chi-Chun ;   et al. | 2019-04-11 |
Dual work function CMOS devices Grant 10,256,161 - Jagannathan , et al. | 2019-04-09 |
Vertical field-effect-transistors having a silicon oxide layer with controlled thickness Grant 10,256,320 - Liu , et al. | 2019-04-09 |
Silicon Residue Removal In Nanosheet Transistors App 20190096669 - Bi; Zhenxing ;   et al. | 2019-03-28 |
Integrating and isolating NFET and PFET nanosheet transistors on a substrate Grant 10,242,920 - Guillorn , et al. | 2019-03-26 |
Wafer Element With An Adjusted Print Resolution Assist Feature App 20190019686 - MIGNOT; YANN A. ;   et al. | 2019-01-17 |
Wafer element with an adjusted print resolution assist feature Grant 10,170,326 - Mignot , et al. J | 2019-01-01 |
Integrating And Isolating Nfet And Pfet Nanosheet Transistors On A Substrate App 20180374761 - Guillorn; Michael A. ;   et al. | 2018-12-27 |
Wafer Element With An Adjusted Print Resolution Assist Feature App 20180308703 - MIGNOT; YANN A. ;   et al. | 2018-10-25 |
Wafer Element With An Adjusted Print Resolution Assist Feature App 20180308704 - MIGNOT; YANN A. ;   et al. | 2018-10-25 |
Removal Of Trilayer Resist Without Damage To Underlying Structure App 20180286680 - Sankarapandian; Muthumanickam ;   et al. | 2018-10-04 |
Method To Recess Cobalt For Gate Metal Application App 20180261507 - Jacobi; Georges ;   et al. | 2018-09-13 |
Integrating and isolating nFET and pFET nanosheet transistors on a substrate Grant 10,074,575 - Guillorn , et al. September 11, 2 | 2018-09-11 |
Removal Of Trilayer Resist Without Damage To Underlying Structure App 20180233360 - Sankarapandian; Muthumanickam ;   et al. | 2018-08-16 |
Removal of trilayer resist without damage to underlying structure Grant 10,049,876 - Sankarapandian , et al. August 14, 2 | 2018-08-14 |
Approach To Bottom Dielectric Isolation For Vertical Transport Fin Field Effect Transistors App 20180226491 - Bi; Zhenxing ;   et al. | 2018-08-09 |
Approach To Bottom Dielectric Isolation For Vertical Transport Fin Field Effect Transistors App 20180226489 - Bi; Zhenxing ;   et al. | 2018-08-09 |
Vertical Transistors With Improved Top Source/drain Junctions App 20180204951 - Cheng; Kangguo ;   et al. | 2018-07-19 |
Vertical Transistors With Improved Top Source/drain Junctions App 20180204950 - Cheng; Kangguo ;   et al. | 2018-07-19 |
Solution based etching of titanium carbide and titanium nitride structures Grant 9,831,100 - Foster , et al. November 28, 2 | 2017-11-28 |
Protection Of High-k Dielectric During Reliability Anneal On Nanosheet Structures App 20170323949 - Loubet; Nicolas J. ;   et al. | 2017-11-09 |
Dual Work Function Cmos Devices App 20170236759 - Jagannathan; Hemanth ;   et al. | 2017-08-17 |
Channel protection during fin fabrication Grant 9,496,371 - Arndt , et al. November 15, 2 | 2016-11-15 |
Particle removal with minimal etching of silicon-germanium App 20160181087 - Foster; John ;   et al. | 2016-06-23 |
Spacer replacement for replacement metal gate semiconductor devices Grant 9,373,697 - Mehta , et al. June 21, 2 | 2016-06-21 |
Dual hard mask lithography process Grant 9,373,580 - Arnold , et al. June 21, 2 | 2016-06-21 |
Method for single fin cuts using selective ion implants Grant 9,287,130 - Cai , et al. March 15, 2 | 2016-03-15 |
Solution Based Etching of Titanium Carbide and Titanium Nitride Structures App 20150371872 - Foster; John ;   et al. | 2015-12-24 |
Spacer replacement for replacement metal gate semiconductor devices Grant 9,171,927 - Mehta , et al. October 27, 2 | 2015-10-27 |
Selective Etch Chemistry For Gate Electrode Materials App 20150275376 - Fitzsimmons; John A. ;   et al. | 2015-10-01 |
Hardmask Faceting For Enhancing Metal Fill In Trenches App 20150221547 - Arnold; John C. ;   et al. | 2015-08-06 |
Selective etch chemistry for gate electrode materials Grant 9,070,625 - Fitzsimmons , et al. June 30, 2 | 2015-06-30 |
Improved SiCOH Hardmask with Graded Transition Layers App 20150028491 - ANGYAL; MATTHEW S. ;   et al. | 2015-01-29 |
Spacer Replacement For Replacement Metal Gate Semiconductor Devices App 20150024568 - Mehta; Sanjay C. ;   et al. | 2015-01-22 |
SiCOH hardmask with graded transition layers Grant 8,927,442 - Angyal , et al. January 6, 2 | 2015-01-06 |
Dual hard mask lithography process Grant 8,916,337 - Arnold , et al. December 23, 2 | 2014-12-23 |
Titanium-Nitride Removal App 20140312265 - Chen; Shyng-Tsong ;   et al. | 2014-10-23 |
DSA grapho-epitaxy process with etch stop material Grant 8,859,433 - Abdallah , et al. October 14, 2 | 2014-10-14 |
Self-aligned contacts Grant 8,853,076 - Fan , et al. October 7, 2 | 2014-10-07 |
Spacer Replacement For Replacement Metal Gate Semiconductor Devices App 20140295637 - Mehta; Sanjay C. ;   et al. | 2014-10-02 |
Titanium-nitride removal Grant 8,835,326 - Fitzsimmons , et al. September 16, 2 | 2014-09-16 |
Dsa Grapho-epitaxy Process With Etch Stop Material App 20140256145 - ABDALLAH; JASSEM A. ;   et al. | 2014-09-11 |
Dual Hard Mask Lithography Process App 20140110846 - Arnold; John C. ;   et al. | 2014-04-24 |
Self-aligned Contacts App 20140070282 - Fan; Su Chen ;   et al. | 2014-03-13 |
Dual Hard Mask Lithography Process App 20130216776 - Arnold; John C. ;   et al. | 2013-08-22 |
Titanium Nitride Removal App 20130200040 - Fitzsimmons; John A. ;   et al. | 2013-08-08 |
Selective Etch Chemistry For Gate Electrode Materials App 20130203231 - Fitzsimmons; John A. ;   et al. | 2013-08-08 |
Selectively coated self-aligned mask Grant 8,491,987 - Colburn , et al. July 23, 2 | 2013-07-23 |
Methods to mitigate plasma damage in organosilicate dielectrics Grant 8,481,423 - Arnold , et al. July 9, 2 | 2013-07-09 |
Titanium-Nitride Removal App 20130171829 - Fitzsimmons; John A. ;   et al. | 2013-07-04 |
Methods to mitigate plasma damage in organosilicate dielectrics Grant 8,470,706 - Arnold , et al. June 25, 2 | 2013-06-25 |
Protection of intermetal dielectric layers in multilevel wiring structures App 20130056874 - Darnon; Maxime ;   et al. | 2013-03-07 |
Methods To Mitigate Plasma Damage In Organosilicate Dielectrics App 20120329269 - Arnold; John C. ;   et al. | 2012-12-27 |
Methods to mitigate plasma damage in organosilicate dielectrics using a protective sidewall spacer Grant 8,129,843 - Arnold , et al. March 6, 2 | 2012-03-06 |
Method for producing self-aligned mask, articles produced by same and composition for same Grant 8,119,322 - Brunner , et al. February 21, 2 | 2012-02-21 |
Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same Grant 7,948,051 - Colburn , et al. May 24, 2 | 2011-05-24 |
Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures Grant 7,931,829 - Dubois , et al. April 26, 2 | 2011-04-26 |
Polycarbosilane buried etch stops in interconnect structures Grant 7,879,717 - Huang , et al. February 1, 2 | 2011-02-01 |
Methods To Mitigate Plasma Damage In Organosilicate Dielectrics Using A Protective Sidewall Spacer App 20100320617 - Arnold; John C. ;   et al. | 2010-12-23 |
Layer transfer process and functionally enhanced integrated circuits produced thereby Grant 7,855,101 - Furman , et al. December 21, 2 | 2010-12-21 |
Low-k Interlevel Dielectric Materials And Method Of Forming Low-k Interlevel Dielectric Layers And Structures App 20100311895 - Dubois; Geraud Jean-Michel ;   et al. | 2010-12-09 |
Surface treatment for selective metal cap applications Grant 7,830,010 - Yang , et al. November 9, 2 | 2010-11-09 |
Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures Grant 7,820,242 - Dubois , et al. October 26, 2 | 2010-10-26 |
Methods to mitigate plasma damage in organosilicate dielectrics using a protective sidewall spacer Grant 7,781,332 - Arnold , et al. August 24, 2 | 2010-08-24 |
Treatment of plasma damaged layer for critical dimension retention, pore sealing and repair Grant 7,750,479 - Purushothaman , et al. July 6, 2 | 2010-07-06 |
Layer Transfer Process And Functionally Enhanced Integrated Circuits Produced Thereby App 20100081232 - Furman; Bruce K. ;   et al. | 2010-04-01 |
Surface Treatment For Selective Metal Cap Applications App 20090250815 - YANG; CHIH-CHAO ;   et al. | 2009-10-08 |
Methods To Mitigate Plasma Damage In Organosilicate Dielectrics App 20090075472 - Arnold; John C. ;   et al. | 2009-03-19 |
Methods To Mitigate Plasma Damage In Organosilicate Dielectrics Using A Protective Sidewall Spacer App 20090072401 - Arnold; John C. ;   et al. | 2009-03-19 |
Conductive Element Forming Using Sacrificial Layer Patterned To Form Dielectric Layer App 20090032491 - Basker; Veeraraghavan S. ;   et al. | 2009-02-05 |
Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same Grant 7,485,341 - Colburn , et al. February 3, 2 | 2009-02-03 |
Method of forming low-K interlevel dielectric layers and structures Grant 7,459,183 - Dubois , et al. December 2, 2 | 2008-12-02 |
Layer Transfer Process and Functionally Enhanced Integrated Circuits Products Thereby App 20080277778 - Furman; Bruce K. ;   et al. | 2008-11-13 |
Nonlithographic Method to Produce Self-Aligned Mask, Articles Produced by Same and Compositions for Same App 20080265415 - Colburn; Matthew E. ;   et al. | 2008-10-30 |
Nonlithographic Method to Produce Self-Aligned Mask, Articles Produced by Same and Compositions for Same App 20080265382 - Colburn; Matthew E. ;   et al. | 2008-10-30 |
Polycarbosilane Buried Etch Stops In Interconnect Structures App 20080254612 - Huang; Elbert E. ;   et al. | 2008-10-16 |
Method For Producing Self-aligned Mask, Articles Produced By Same And Composition For Same App 20080220615 - Brunner; Timothy A. ;   et al. | 2008-09-11 |
Low-k Interlevel Dielectric Materials And Method Of Forming Low-k Interlevel Dielectric Layers And Structures App 20080171136 - Dubois; Geraud Jean-Michel ;   et al. | 2008-07-17 |
Polycarbosilane buried etch stops in interconnect structures Grant 7,396,758 - Huang , et al. July 8, 2 | 2008-07-08 |
Method for producing self-aligned mask, articles produced by same and composition for same Grant 7,378,738 - Brunner , et al. May 27, 2 | 2008-05-27 |
Treatment Of Plasma Damaged Layer For Critical Dimension Retention, Pore Sealing And Repair App 20080042283 - Purushothaman; Sampath ;   et al. | 2008-02-21 |
Polycarbosilane Buried Etch Stops In Interconnect Structures App 20070111509 - Huang; Elbert E. ;   et al. | 2007-05-17 |
Polycarbosilane buried etch stops in interconnect structures Grant 7,187,081 - Huang , et al. March 6, 2 | 2007-03-06 |
Low-K interlevel dielectric materials and method of forming low-K interlevel dielectric layers and structures App 20070023870 - Dubois; Geraud Jean-Michel ;   et al. | 2007-02-01 |
Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same App 20050233597 - Colburn, Matthew E. ;   et al. | 2005-10-20 |
Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same Grant 6,911,400 - Colburn , et al. June 28, 2 | 2005-06-28 |
Method for producing self-aligned mask, articles produced by same and composition for same App 20050045997 - Brunner, Timothy A. ;   et al. | 2005-03-03 |
Composition and method to achieve reduced thermal expansion in polyarylene networks Grant 6,818,285 - Hedrick , et al. November 16, 2 | 2004-11-16 |
Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same App 20040213971 - Colburn, Matthew E. ;   et al. | 2004-10-28 |
Polycarbosilane buried etch stops in interconnect structures App 20040147111 - Huang, Elbert E. ;   et al. | 2004-07-29 |
Composition and method to achieve reduced thermal expansion in polyarylene networks App 20040126586 - Hedrick, Jeffrey C. ;   et al. | 2004-07-01 |
Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same App 20040087177 - Colburn, Matthew E. ;   et al. | 2004-05-06 |
Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same App 20040087176 - Colburn, Matthew E. ;   et al. | 2004-05-06 |
Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same Grant 6,641,899 - Colburn , et al. November 4, 2 | 2003-11-04 |